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Journal of physics. D, applied physics, v.34 no.3, 2001년, pp.326 - 329
Bektursunova, Rimma M (Department of Physics, The Middle East Technical University, Ankara 06531, Turkey) , Demokan, Ordal (Department of Physics, The Middle East Technical University, Ankara 06531, Turkey)
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A perturbation model has been developed to describe the evolution of an expanding plasma sheath around a cathode after a high-voltage negative pulse is applied to the cathode, simulating the conditions in devices such as those used for plasma source ion implantation. The set of governing equations c...
Conrad J R
Malik, Shamim M.. Overview of plasma source ion implantation research at University of Wisconsin-Madison. Journal of vacuum science & technology. processing, measurement, and phenomena : an official journal of the American Vacuum Society. B, Microelectronics and nanometer structures, vol.12, no.2, 843-.
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Malik, Shamim M., Fetherston, R. P., Conrad, J. R.. Development of an energetic ion assisted mixing and deposition process for TiNx and diamondlike carbon films, using a co-axial geometry in plasma source ion implantation. Journal of vacuum science & technology. A, Vacuum, surfaces, and films, vol.15, no.6, 2875-2879.
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Bektursunova, Rimma M., Graham, William G.. Asymptotic layer-type model of high pressure direct current glow discharge in electronegative gases. Journal of applied physics, vol.88, no.4, 1760-1764.
Bektursunova, Rimma M.. Asymptotic theory of spherical electrostatic probes in large Debye length plasmas containing negative ions. Physics of plasmas, vol.6, no.12, 4773-4777.
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