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NTIS 바로가기IEEE transactions on plasma science, v.48 no.4 pt.2, 2020년, pp.921 - 929
Kim, Jihun (KyungWon Tech, Seongnam, South Korea) , Sohn, Ilyoup (Korea Institute of Science and Technology Information, University of Science and Technology, Daejeon, South Korea)
A simplified numerical model to simulate plasma occurring in a magnetron sputtering device is presented. Motions and collisions of charged gas particles are modeled by the direct simulation Monte Carlo (DSMC) method on an adaptive Cartesian mesh structure. An electromagnetic (EM) field equation is s...
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