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[해외논문] Extreme-Pressure Imprint Lithography for Heat and Ultraviolet-Free Direct Patterning of Rigid Nanoscale Features

ACS nano, v.15 no.6, 2021년, pp.10464 - 10471  

Park, Woon Ik (Electronic Convergence Materials Division , Korea Institute of Ceramic Engineering & Technology (KICET) , 101 Soho-ro , Jinju 52851 , Republic of Korea) ,  Park, Tae Wan (Electronic Convergence Materials Division , Korea Institute of Ceramic Engineering & Technology (KICET) , 101 Soho-ro , Jinju 52851 , Republic of Korea) ,  Choi, Young Joong (Department of Mechanical Engineering , Korea Advanced Institute of Science and Technology (KAIST) , 291 Daehak-ro, Yuseong-gu , Daejeon 34141 , Republic of Korea) ,  Lee, Sangryun (Department of Mechanical Engineering , Korea Advanced Institute of Science and Technology (KAIST) , 291 Daehak-ro, Yuseong-gu , Daejeon 34141 , Republic of Korea) ,  Ryu, Seunghwa (Department of Mechanical Engineering , University of Michigan , Ann Arbor , Michigan 48109 , United States) ,  Liang, Xiaogan (Department of Materials Science and Engineering , Korea Advanced Inst) ,  Jung, Yeon Sik

Abstract AI-Helper 아이콘AI-Helper

Nanoimprint lithography (NIL) is typically performed by filling up of molds by heated polymers or UV-curable liquid resists, inevitably requiring subsequent pattern-transfer processes. Although direct NIL techniques have been suggested alternatively, they usually require precursors or ink-type resis...

Keyword

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