[논문]Effect of Insertion of Dielectric Layer on the Performance of Hafnia Ferroelectric Devices

Hwang, Junghyeon; Goh, Youngin; Jeon, Sanghun

doi:10.1109/ted.2020.3043728

[해외논문] Effect of Insertion of Dielectric Layer on the Performance of Hafnia Ferroelectric Devices

IEEE transactions on electron devices, v.68 no.2, 2021년, pp.841 - 845

Hwang, Junghyeon (Korea Advanced Institute of Science and Technology (KAIST), School of Electrical Engineering, Daejeon, South Korea) , Goh, Youngin (Korea Advanced Institute of Science and Technology (KAIST), School of Electrical Engineering, Daejeon, South Korea) , Jeon, Sanghun (Korea Advanced Institute of Science and Technology (KAIST), School of Electrical Engineering, Daejeon, South Korea)

Abstract ▼ AI-Helper

Hafnia-based ferroelectric (FE) devices have attracted significant attention as nonvolatile memory devices due to their compatibility with complementary metal–oxide–semiconductor processes. Among them, the FE tunnel junction (FTJ) has been considered as the next-generation of nonvolatile memory devices owing to its neuromorphic characteristics and nondestructive read operation as well as the high-density integration. However, degradation of ferroelectricity in a thin hafnia film causes a reduced tunneling electroresistance (TER) ratio. In this work, we inserted a TiO2 layer into the metal–FE–metal capacitor to provide an asymmetric structure for FTJ operations and recorded the enhanced remnant polarization with enhanced ferroelectricity. In this study, a high $2{P}_{r}$ value of $44.4~\mu \text{C}$/cm2 and a notable TER ratio of 11.6 were observed for 6-nm thick hafnia films with 1-nm thick TiO2 films.

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DOI : 10.1109/TED.2020.3043728
IEEE : 저널 > 논문

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