최소 단어 이상 선택하여야 합니다.
최대 10 단어까지만 선택 가능합니다.
다음과 같은 기능을 한번의 로그인으로 사용 할 수 있습니다.
NTIS 바로가기IEEE electron device letters : a publication of the IEEE Electron Devices Society, v.42 no.3, 2021년, pp.331 - 334
Das, Dipjyoti (Korea Advanced Institute of Science and Technology (KAIST), School of Electrical Engineering, Daejeon, South Korea) , Gaddam, Venkateswarlu (Korea Advanced Institute of Science and Technology (KAIST), School of Electrical Engineering, Daejeon, South Korea) , Jeon, Sanghun (Korea Advanced Institute of Science and Technology (KAIST), School of Electrical Engineering, Daejeon, South Korea)
In this letter, we demonstrate an effective way to enrich the performance of HfxZr1–x O2 (HZO) energy storage capacitors (ESCs) by inserting Al2O3 dielectric interlayer (DIL) in the middle of HZO in TiN/HZO/TiN structure. The impact of DIL (1 Å, 5 Å and 10 Å) is investiga...
Lomenzo, Patrick D., Chung, Ching-Chang, Zhou, Chuanzhen, Jones, Jacob L., Nishida, Toshikazu. Doped Hf0.5Zr0.5O2 for high efficiency integrated supercapacitors. Applied physics letters, vol.110, no.23, 232904-.
Park, Min Hyuk, Schenk, Tony, Hoffmann, Michael, Knebel, Steve, Gärtner, Jan, Mikolajick, Thomas, Schroeder, Uwe. Effect of acceptor doping on phase transitions of HfO2 thin films for energy-related applications. Nano energy, vol.36, 381-389.
Kim, Keum Do, Lee, Young Hwan, Gwon, Taehong, Kim, Yu Jin, Kim, Han Joon, Moon, Taehwan, Hyun, Seung Dam, Park, Hyeon Woo, Park, Min Hyuk, Hwang, Cheol Seong. Scale-up and optimization of HfO2-ZrO2 solid solution thin films for the electrostatic supercapacitors. Nano energy, vol.39, 390-399.
Silva, José P. B., Silva, João M. B., Oliveira, Marcelo J. S., Weingärtner, Tobias, Sekhar, Koppole C., Pereira, Mário, Gomes, Maria J. M.. High‐Performance Ferroelectric–Dielectric Multilayered Thin Films for Energy Storage Capacitors. Advanced functional materials, vol.29, no.6, 1807196-.
Kozodaev, Maxim G., Chernikova, Anna G., Khakimov, Roman R., Park, Min Hyuk, Markeev, Andrey M., Hwang, Cheol Seong. La-doped Hf0.5Zr0.5O2 thin films for high-efficiency electrostatic supercapacitors. Applied physics letters, vol.113, no.12, 123902-.
Gaddam, Vekateswarlu, Das, Dipjyoti, Jeon, Sanghun. Insertion of HfO2 Seed/Dielectric Layer to the Ferroelectric HZO Films for Heightened Remanent Polarization in MFM Capacitors. IEEE transactions on electron devices, vol.67, no.2, 745-750.
Ko, Eunah, Shin, Jaemin, Shin, Changhwan. Steep switching devices for low power applications: negative differential capacitance/resistance field effect transistors. Nano convergence, vol.5, no.1, 2-.
Das, Dipjyoti, Kim, Taeho, Gaddam, Venkateswarlu, Shin, Changhwan, Jeon, Sanghun. Trade-off between interfacial charge and negative capacitance effects in the Hf-Zr-Al-O/Hf0.5Zr0.5O2 bilayer system. Solid-state electronics, vol.174, 107914-.
Yoon, Chankeun, Moon, Seungjun, Shin, Changhwan. Study of a hysteresis window of FinFET and fully-depleted silicon-on-insulator (FDSOI) MOSFET with ferroelectric capacitor. Nano convergence, vol.7, 19-.
Hwang, Junghyeon, Goh, Youngin, Jeon, Sanghun. Effect of Forming Gas High-Pressure Annealing on Metal-Ferroelectric-Semiconductor Hafnia Ferroelectric Tunnel Junction. IEEE electron device letters : a publication of the IEEE Electron Devices Society, vol.41, no.8, 1193-1196.
Hwang, Junghyeon, Goh, Youngin, Jeon, Sanghun. Effect of Insertion of Dielectric Layer on the Performance of Hafnia Ferroelectric Devices. IEEE transactions on electron devices, vol.68, no.2, 841-845.
Goh, Youngin, Jeon, Sanghun. Enhanced tunneling electroresistance effects in HfZrO-based ferroelectric tunnel junctions by high-pressure nitrogen annealing. Applied physics letters, vol.113, no.5, 052905-.
Jeon, Sanghun. (Invited) Hafnia Ferroelectric Device for Semiconductor, Sensor, and Display Applications. ECS transactions, vol.98, no.7, 219-223.
Lee, Yongsun, Goh, Youngin, Hwang, Junghyeon, Das, Dipjyoti, Jeon, Sanghun. The Influence of Top and Bottom Metal Electrodes on Ferroelectricity of Hafnia. IEEE transactions on electron devices, vol.68, no.2, 523-528.
Das, Dipjyoti, Jeon, Sanghun. High-k HfxZr1-xO₂ Ferroelectric Insulator by Utilizing High Pressure Anneal. IEEE transactions on electron devices, vol.67, no.6, 2489-2494.
Ali, Faizan, Zhou, Dayu, Ali, Mohsin, Ali, Hafiz Waqas, Daaim, Muhammad, Khan, Sheeraz, Hussain, Muhammad Muzammal, Sun, Nana. Recent Progress on Energy-Related Applications of HfO2-Based Ferroelectric and Antiferroelectric Materials. Acs applied electronic materials, vol.2, no.8, 2301-2317.
Chen, Shengchen, Wang, Xiucai, Yang, Tongqing, Wang, Jinfei. Composition-dependent dielectric properties and energy storage performance of (Pb,La)(Zr,Sn,Ti)O3 antiferroelectric ceramics. Journal of electroceramics, vol.32, no.4, 307-310.
Kühnel, Kati, Czernohorsky, Malte, Mart, Clemens, Weinreich, Wenke. High-density energy storage in Si-doped hafnium oxide thin films on area-enhanced substrates. Journal of vacuum science and technology. materials, processing, measurement, & phenomena : JVST B. B, Nanotechnology & microelectronics, vol.37, no.2, 021401-.
Peng, Biaolin, Zhang, Qi, Li, Xing, Sun, Tieyu, Fan, Huiqing, Ke, Shanming, Ye, Mao, Wang, Yu, Lu, Wei, Niu, Hanben, Scott, James F., Zeng, Xierong, Huang, Haitao. Giant Electric Energy Density in Epitaxial Lead‐Free Thin Films with Coexistence of Ferroelectrics and Antiferroelectrics. Advanced electronic materials, vol.1, no.5, 1500052-.
Riedel, S., Polakowski, P., Müller, J.. A thermally robust and thickness independent ferroelectric phase in laminated hafnium zirconium oxide. AIP advances, vol.6, no.9, 095123-.
Ma, Beihai, Kwon, Do-Kyun, Narayanan, Manoj, (Balu) Balachandran, U.. Dielectric properties and energy storage capability of antiferroelectric Pb0.92La0.08Zr0.95Ti0.05O3 film-on-foil capacitors. Journal of materials research, vol.24, no.9, 2993-2996.
Park, Min Hyuk, Lee, Young Hwan, Mikolajick, Thomas, Schroeder, Uwe, Hwang, Cheol Seong. Review and perspective on ferroelectric HfO2-based thin films for memory applications. MRS Communications, vol.8, no.3, 795-808.
Banerjee, Parag, Perez, Israel, Henn-Lecordier, Laurent, Lee, Sang Bok, Rubloff, Gary W.. Nanotubular metal-insulator-metal capacitor arrays for energy storage. Nature nanotechnology, vol.4, no.5, 292-296.
Chauhan, Aditya, Patel, Satyanarayan, Vaish, Rahul, Bowen, Chris R.. Anti-Ferroelectric Ceramics for High Energy Density Capacitors. Materials, vol.8, no.12, 8009-8031.
Kim, Tae Yun, Kim, Sung Kyun, Kim, Sang-Woo. Application of ferroelectric materials for improving output power of energy harvesters. Nano convergence, vol.5, no.1, 30-.
Kui Yao, Shuting Chen, Rahimabady, M., Mirshekarloo, M. S., Shuhui Yu, Tay, F. E. H., Sritharan, T., Li Lu. Nonlinear dielectric thin films for high-power electric storage with energy density comparable with electrochemical supercapacitors. IEEE transactions on ultrasonics, ferroelectrics, and frequency control, vol.58, no.9, 1968-1974.
Appl Phys Lett Evolution of phases and ferroelectric properties of thin Hf?.?Zr?.?O? films according to the thickness and annealing temperature park 2013 102
Das, Dipjyoti, Gaddam, Venkateswarlu, Jeon, Sanghun.
Demonstration of High Ferroelectricity (P
Tian, Xuan, Shibayama, Shigehisa, Nishimura, Tomonori, Yajima, Takeaki, Migita, Shinji, Toriumi, Akira. Evolution of ferroelectric HfO2 in ultrathin region down to 3 nm. Applied physics letters, vol.112, no.10, 102902-.
Park, Min Hyuk, Kim, Han Joon, Kim, Yu Jin, Moon, Taehwan, Kim, Keum Do, Hwang, Cheol Seong. Thin HfxZr1‐xO2 Films: A New Lead‐Free System for Electrostatic Supercapacitors with Large Energy Storage Density and Robust Thermal Stability. Advanced energy materials, vol.4, no.16, 1400610-.
Kim, Taeho, An, Minho, Jeon, Sanghun. Evolution of crystallographic structure and ferroelectricity of Hf0.5Zr0.5O2 films with different deposition rate. AIP advances, vol.10, no.1, 015104-.
Ali, Faizan, Liu, Xiaohua, Zhou, Dayu, Yang, Xirui, Xu, Jin, Schenk, Tony, Müller, Johannes, Schroeder, Uwe, Cao, Fei, Dong, Xianlin. Silicon-doped hafnium oxide anti-ferroelectric thin films for energy storage. Journal of applied physics, vol.122, no.14, 144105-.
Hoffmann, M., Schroeder, U., Kunneth, C., Kersch, A., Starschich, S., Bottger, U., Mikolajick, T.. Ferroelectric phase transitions in nanoscale HfO2 films enable giant pyroelectric energy conversion and highly efficient supercapacitors. Nano energy, vol.18, 154-164.
해당 논문의 주제분야에서 활용도가 높은 상위 5개 콘텐츠를 보여줍니다.
더보기 버튼을 클릭하시면 더 많은 관련자료를 살펴볼 수 있습니다.
*원문 PDF 파일 및 링크정보가 존재하지 않을 경우 KISTI DDS 시스템에서 제공하는 원문복사서비스를 사용할 수 있습니다.
※ AI-Helper는 부적절한 답변을 할 수 있습니다.