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[해외논문] Insertion of Dielectric Interlayer: A New Approach to Enhance Energy Storage in HfₓZr1-xO₂ Capacitors

IEEE electron device letters : a publication of the IEEE Electron Devices Society, v.42 no.3, 2021년, pp.331 - 334  

Das, Dipjyoti (Korea Advanced Institute of Science and Technology (KAIST), School of Electrical Engineering, Daejeon, South Korea) ,  Gaddam, Venkateswarlu (Korea Advanced Institute of Science and Technology (KAIST), School of Electrical Engineering, Daejeon, South Korea) ,  Jeon, Sanghun (Korea Advanced Institute of Science and Technology (KAIST), School of Electrical Engineering, Daejeon, South Korea)

Abstract AI-Helper 아이콘AI-Helper

In this letter, we demonstrate an effective way to enrich the performance of HfxZr1–x O2 (HZO) energy storage capacitors (ESCs) by inserting Al2O3 dielectric interlayer (DIL) in the middle of HZO in TiN/HZO/TiN structure. The impact of DIL (1 Å, 5 Å and 10 Å) is investiga...

참고문헌 (34)

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