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NTIS 바로가기IEEE electron device letters : a publication of the IEEE Electron Devices Society, v.42 no.12, 2021년, pp.1731 - 1734
Lee, Geon-Beom (Korea Advanced Institute of Science and Technology (KAIST), School of Electrical Engineering, Daejeon, South Korea) , Jung, Jin-Woo (Korea Advanced Institute of Science and Technology (KAIST), School of Electrical Engineering, Daejeon, South Korea) , Kim, Choong-Ki (SK Hynix Inc., Icheon-si, South Korea) , Bang, Tewook (SK Hynix Inc., Icheon-si, South Korea) , Yoo, Min-Soo (SK Hynix Inc., Icheon-si, South Korea) , Choi, Yang-Kyu (Korea Advanced Institute of Science and Technology (KAIST), School of Electrical Engineering, Daejeon, South Korea)
Stress-induced damage in a MOSFET can be cured by Joule heating, which can be produced by an intentional forward junction current (
Park, Jun-Young, Yun, Dae-Hwan, Choi, Yang-Kyu. Curing of Hot-Carrier Induced Damage by Gate-Induced Drain Leakage Current in Gate-All-Around FETs. IEEE electron device letters : a publication of the IEEE Electron Devices Society, vol.40, no.12, 1909-1912.
Jun-Young Park, Dong-Il Moon, Myeong-Lok Seol, Choong-Ki Kim, Chang-Hoon Jeon, Hagyoul Bae, Tewook Bang, Yang-Kyu Choi. Self-Curable Gate-All-Around MOSFETs Using Electrical Annealing to Repair Degradation Induced From Hot-Carrier Injection. IEEE transactions on electron devices, vol.63, no.3, 910-915.
Ragnarsson, Lars-Åke, Lundgren, Per. Electrical characterization of Pb centers in (100)Si-SiO2 structures: The influence of surface potential on passivation during post metallization anneal. Journal of applied physics, vol.88, no.2, 938-942.
Ghibaudo, G., Roux, O., Nguyen-Duc, Ch., Balestra, F., Brini, J.. Improved Analysis of Low Frequency Noise in Field-Effect MOS Transistors. Physica status solidi. A, Applied research, vol.124, no.2, 571-581.
Atlas user’s manual device simulation software 2008
Fleetwood, D. M., Winokur, P. S., Reber Jr., R. A., Meisenheimer, T. L., Schwank, J. R., Shaneyfelt, M. R., Riewe, L. C.. Effects of oxide traps, interface traps, and ‘‘border traps’’ on metal-oxide-semiconductor devices. Journal of applied physics, vol.73, no.10, 5058-5074.
Stathis, J.H., Zafar, S.. The negative bias temperature instability in MOS devices: A review. Microelectronics reliability, vol.46, no.2, 270-286.
Aichinger, T., Nelhiebel, M., Einspieler, S., Grasser, T.. In Situ Poly Heater—A Reliable Tool for Performing Fast and Defined Temperature Switches on Chip. IEEE transactions on device and materials reliability : a publication of the IEEE Electron Devices Society and the IEEE Reliability Society, vol.10, no.1, 3-8.
Onishi, K., Kang, Chang Seok, Choi, Rino, Cho, Hag-Ju, Gopalan, S., Nieh, R.E., Krishnan, S.A., Lee, J.C.. Improvement of surface carrier mobility of HfO2 MOSFETs by high-temperature forming gas annealing. IEEE transactions on electron devices, vol.50, no.2, 384-390.
Lee, Geon-Beom, Kim, Choong-Ki, Park, Jun-Young, Bang, Tewook, Bae, Hagyoul, Kim, Seong-Yeon, Ryu, Seung-Wan, Choi, Yang-Kyu. A Novel Technique for Curing Hot-Carrier-Induced Damage by Utilizing the Forward Current of the PN-Junction in a MOSFET. IEEE electron device letters : a publication of the IEEE Electron Devices Society, vol.38, no.8, 1012-1014.
Mulaosmanovic, Halid, Breyer, Evelyn T., Mikolajick, Thomas, Slesazeck, Stefan. Recovery of Cycling Endurance Failure in Ferroelectric FETs by Self-Heating. IEEE electron device letters : a publication of the IEEE Electron Devices Society, vol.40, no.2, 216-219.
Lee, Geon-Beom, Kim, Choong-Ki, Yoo, Min-Soo, Choi, Yang-Kyu. Low-Frequency Noise Characteristics Under the OFF-State Stress. IEEE transactions on electron devices, vol.67, no.10, 4366-4371.
IEEE Trans Electron Devices Hot-electron-induced MOSFET degradation—Model, monitor, and improvement hu 1985 ed 32 375
Park, Jun-Young, Hur, Jae, Choi, Yang-Kyu. Demonstration of a Curable Nanowire FinFET Using Punchthrough Current to Repair Hot-Carrier Damage. IEEE electron device letters : a publication of the IEEE Electron Devices Society, vol.39, no.2, 180-183.
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