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NTIS 바로가기Applied physics letters, v.119 no.26, 2021년, pp.262905 -
Kim, Minki (School of Electrical Engineering, Korea Advanced Institute of Science and Technology , 291 Daehakro, Yuseong-gu, Daejeon 34141, South Korea) , Goh, Youngin (School of Electrical Engineering, Korea Advanced Institute of Science and Technology , 291 Daehakro, Yuseong-gu, Daejeon 34141, South Korea) , Hwang, Junghyeon (School of Electrical Engineering, Korea Advanced Institute of Science and Technology , 291 Daehakro, Yuseong-gu, Daejeon 34141, South Korea) , Jeon, Sanghun (School of Electrical Engineering, Korea Advanced Institute of Science and Technology , 291 Daehakro, Yuseong-gu, Daejeon 34141, South Korea)
Metal-nitride layers were used as tungsten (W)-diffusion barriers for ultra-thin (<5 nm) Hf0.5Zr0.5O2 (HZO)-based ferroelectric capacitors with W as the bottom electrode. The influence of various metal nitrides (e.g., TiN, HfN, and ZrN) on the leakage properties, ferroelectricity, and reliability of...
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