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Materials, v.15 no.1, 2022년, pp.123 -
Racka-Szmidt, Katarzyna (Łukasiewicz Research Network—) , Stonio, Bartłomiej (Institute of Microelectronics and Photonics, Al. Lotnikó) , Żelazko, Jarosław (w 32) , Filipiak, Maciej (Jaroslaw.Zelazko@imif.lukasiewicz.gov.pl) , Sochacki, Mariusz (Institute of Microelectronics and Optoelectronics, Warsaw University of Technology, 75 Koszykowa Str., 00-662 Warsaw, Poland)
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The inductively coupled plasma reactive ion etching (ICP-RIE) is a selective dry etching method used in fabrication technology of various semiconductor devices. The etching is used to form non-planar microstructures—trenches or mesa structures, and tilted sidewalls with a controlled angle. Th...
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