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NTIS 바로가기Thin solid films, v.491 no.1/2, 2005년, pp.1 - 17
Sproul, W.D. (Reactive Sputtering Consulting, LLC, 3324 South Lemay Avenue, Fort Collins, CO 80525, USA) , Christie, D.J. (Advanced Energy Industries, Inc., 1625 Sharp Point Drive, Fort Collins, CO 80525, USA) , Carter, D.C. (Advanced Energy Industries, Inc., 1625 Sharp Point Drive, Fort Collins, CO 80525, USA)
AbstractThe method of reactive gas control during reactive sputtering strongly influences the deposition rate and film properties of the compound being deposited. Flow control of the reactive gas is the simplest method, but since reactive sputtering is typically done in the compound or poisoned mode...
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