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Journal of physics. Conference series, v.100 no.8, 2008년, pp.082013 -
Gudmundsson, J T
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The ionization mechanism and the temporal behavior of the plasma parameters in a high power impulse magnetron sputtering (HiPIMS) discharge are investigated using a time dependent global (volume averaged) model. The metal ion fraction and the ionized flux fraction are shown to be very high, the sput...
Helmersson, Ulf, Lattemann, Martina, Bohlmark, Johan, Ehiasarian, Arutiun P., Gudmundsson, Jon Tomas. Ionized physical vapor deposition (IPVD): A review of technology and applications. Thin solid films, vol.513, no.1, 1-24.
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