다음과 같은 기능을 한번의 로그인으로 사용 할 수 있습니다.
NTIS 바로가기
Frontiers of optoelectronics in China, v.3 no.2, 2010년, pp.194 - 197
Wang, Lei , Zhang, Yiwen , Qiu, Fei , Zhou, Ning , Wang, Dingli , Xu, Zhimou , Zhao, Yanli , Yu, Yonglin , Liu, Wen
초록이 없습니다.
Journal of Vacuum Science and Technology B C. Kaden 10 6 2970 1992 10.1116/1.585954 Kaden C, Griesinger U, Schweitzer H, Pilkuhn M H, Stath N. Fabrication of nonconventional distributed feedback lasers with variable grating periods and phase shifts by electron beam lithography. Journal of Vacuum Science and Technology B, 1992, 10(6): 2970-2973
Applied Physics Letters S. Y. Chou 67 21 3114 1995 10.1063/1.114851 Chou S Y, Krauss P R, Renstrom P J. Imprint of sub-25 nm vias and trenches in polymers. Applied Physics Letters, 1995, 67(21): 3114-3116
Journal of Vacuum Science and Technology B S. Y. Chou 15 6 2897 1997 10.1116/1.589752 Chou S Y, Krauss P R, Zhang W, Guo L, Zhuang L. Sub-10 nm imprint lithography and applications. Journal of Vacuum Science and Technology B, 1997, 15(6): 2897-2904
Microelectronic Engineering H. C. Scheer 56 34 311 2001 10.1016/S0167-9317(01)00569-X Scheer H C, Schulz H. A contribution to the flow behaviour of thin polymer films during hot embossing lithography. Microelectronic Engineering, 2001, 56(3,4): 311-332
Proceedings of SPIE Y. Chen 5645 283 2005 10.1117/12.570745 Chen Y, Roy E, Kanamori Y, Belotti M, Decanini D. Soft nanoimprint lithography. Proceedings of SPIE, 2005, 5645: 283-288
Proceedings of the SPIE J. Viheriala 7271 727110-1 2009 Viheriala J, Viljanen M R, Kontio J, Leinonen T, Tommila J, Dumitrescu M, Niemi T, Pessa M. Soft stamp UV-nanoimprint lithography for fabrication of laser diodes. Proceedings of the SPIE, 2009, 7271: 727110-1-727110-10
Nanotechnology M. T. Li 14 1 33 2003 10.1088/0957-4484/14/1/308 Li M T, Chen L, Zhang W, Chou S Y. Pattern transfer fidelity of nanoimprint lithography on six-inch wafers. Nanotechnology, 2003, 14(1): 33-36
Journal of Vacuum Science and Technology B C. S. Whelan 15 5 1728 1997 10.1116/1.589362 Whelan C S, Kazior T E, Hur K Y. High rate CH4:H2 plasma etch processes for InP. Journal of Vacuum Science and Technology B, 1997, 15(5): 1728-1732
Journal of Vacuum Science and Technology B J. E. Schramm 15 6 2031 1997 10.1116/1.589219 Schramm J E, Babic D I, Hu E L, Bowers J E, Merz J L. Fabrication of high-aspect-ratio InP-based vertical-cavity laser mirrors using CH4/H2/O2/Ar reactive ion etching. Journal of Vacuum Science and Technology B, 1997, 15(6): 2031-2036
Optics Express W. X. Yu 11 16 1925 2003 10.1364/OE.11.001925 Yu W X, Yuan X C. Variable surface profile gratings in sol-gel glass fabricated by holographic interference. Optics Express, 2003, 11(16): 1925-1930
IEEE Journal of Quantum Electronics M. G. Davis 30 11 2458 1994 10.1109/3.333696 Davis M G, Dowd R F O. A transfer matrix method based large-signal dynamic model for multielectrode DFB Lasers. IEEE Journal of Quantum Electronics, 1994, 30(11): 2458-2466
Copyright KISTI. All Rights Reserved.
※ AI-Helper는 부적절한 답변을 할 수 있습니다.