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Radiation physics and chemistry, v.80 no.2, 2011년, pp.236 - 241
Lawrie, Kirsten (Australian Institute for Bioengineering and Nanotechnology, The University of Queensland, St Lucia, 4072, Australia) , Blakey, Idriss (Australian Institute for Bioengineering and Nanotechnology, The University of Queensland, St Lucia, 4072, Australia) , Blinco, James (Australian Institute for Bioengineering and Nanotechnology, The University of Queensland, St Lucia, 4072, Australia) , Gronheid, Roel (IMEC, Kapeldreef 75, B-3001, Leuven, Belgium) , Jack, Kevin (Centre for Microscopy and Microanalysis, The University of Queensland, St Lucia, 4072, Australia) , Pollentier, Ivan (IMEC, Kapeldreef 75, B-3001, Leuven, Belgium) , Leeson, Michael J. (Intel Corporation, RA3-252, 2501 NW 229th Avenue, Hilsboro, OR 97124, USA) , Younkin, Todd R. (Intel Corporation, RA3-252, 2501 NW 229th Avenue, Hilsboro, OR 97124, USA) , Whittaker, Andrew K. (Australian Institute for Bioengineering and Nanotechnology, The University of Queensland, St Lucia, 4072, Australia)
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AbstractPoly(olefin sulfone)s, formed by the reaction of sulfur dioxide (SO2) and an olefin, are known to be highly susceptible to degradation by radiation and thus have been identified as candidate materials for chain scission-based extreme ultraviolet lithography (EUVL) resist materials. In order ...
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