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Current opinion in chemical engineering, v.2 no.1, 2013년, pp.88 - 94
Takenaka, M. , Hasegawa, H.
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Block copolymers in the strong segregation regime self-assemble to form regular periodic nanopatterns that are applicable as templates for nanofabrication or nanoprocessing such as etching masks for nanolithography. However, self-assembly of block copolymers alone usually results in poly-grain struc...
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