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NTIS 바로가기New journal of physics, v.8 no.4, 2006년, pp.47 - 47
Swindells, I (Department of Electrical Engineering and Electronics, University of Liverpool, Brownlow Hill, Liverpool L69 3GJ, UK) , Kelly, P J (Department of Chemistry and Materials, Manchester Metropolitan University, Chester Street, Manchester M1 5GD, UK) , Bradley, J W (Department of Electrical Engineering and Electronics, University of Liverpool, Brownlow Hill, Liverpool L69 3GJ, UK)
Using time-resolved optical emission spectroscopy and Langmuir probing, the effect of substrate bias (and the absence of the substrate) on the energetics and concentrations of the plasma species at different phases of the pulse have been investigated in a bi-polar unbalanced pulsed dc magnetron. The...
Schiller, S., Goedicke, K., Reschke, J., Kirchhoff, V., Schneider, S., Milde, F.. Pulsed magnetron sputter technology. Surface & coatings technology, vol.61, no.1, 331-337.
Kelly, P.J., Abu-Zeid, O.A., Arnell, R.D., Tong, J.. The deposition of aluminium oxide coatings by reactive unbalanced magnetron sputtering. Surface & coatings technology, vol.86, no.1, 28-32.
Belkind, A., Freilich, A., Scholl, R.. Using pulsed direct current power for reactive sputtering of Al2O3. Journal of vacuum science & technology. A, Vacuum, surfaces, and films, vol.17, no.4, 1934-1940.
Bartzsch, H., Glöß, D., Böcher, B., Frach, P., Goedicke, K.. Properties of SiO2 and Al2O3 films for electrical insulation applications deposited by reactive pulse magnetron sputtering. Surface & coatings technology, vol.174, 774-778.
Vetushka, A., Karkari, S. K., Bradley, J. W.. Two-dimensional spatial survey of the plasma potential and electric field in a pulsed bipolar magnetron discharge. Journal of vacuum science & technology. A, Vacuum, surfaces, and films, vol.22, no.6, 2459-2468.
2002 10.1088/0963-0252/11/2/307 11 165 0963-0252 Plasma Sources Sci. Technol. Bradley J W
Muratore, C., Moore, J.J., Rees, J.A.. Electrostatic quadrupole plasma mass spectrometer and Langmuir probe measurements of mid-frequency pulsed DC magnetron discharges. Surface & coatings technology, vol.163, 12-18.
2005 10.1116/1.1828086 23 0734-2101 J. Vac. Sci. Technol. Moiseev T
2002 10.1088/0957-0233/13/9/308 13 1431 0957-0233 Meas. Sci. Technol. Karkari S K
Vlček, J., Pajdarová, A. D., Musil, J.. Pulsed dc Magnetron Discharges and their Utilization in Plasma Surface Engineering. Contributions to plasma physics, vol.44, no.5, 426-436.
Bradley, J.W, Bäcker, H, Kelly, P.J, Arnell, R.D. Time-resolved Langmuir probe measurements at the substrate position in a pulsed mid-frequency DC magnetron plasma. Surface & coatings technology, vol.135, no.2, 221-228.
2005 10.1088/1367-2630/7/1/090 7 90 1367-2630 New J. Phys. Belkind A
Lee, Sang-Won, Seo, Sang-Hun, In, Jung-Hwan, Chung, Chin-Wook, Chang, Hong-Young. Characterization of pulsed plasma in unbalanced magnetron argon discharge. Physics of plasmas, vol.12, no.6, 063502-.
Seo, Sang-Hun, In, Jung-Hwan, Chang, Hong-Young, Han, Jeon-Geon. Effect of duty cycle on plasma parameters in the pulsed dc magnetron argon discharge. Applied physics letters, vol.86, no.26, 262103-.
Bradley, J.W., Bäcker, H., Kelly, P.J., Arnell, R.D.. Space and time resolved Langmuir probe measurements in a 100 kHz pulsed rectangular magnetron system. Surface & coatings technology, vol.142, 337-341.
Richter, F., Welzel, Th., Dunger, Th., Kupfer, H.. Time-resolved characterisation of pulsed magnetron discharges using Langmuir probes. Surface & coatings technology, vol.188, 384-391.
2004 10.1088/0963-0252/13/2/001 13 189 0963-0252 Plasma Sources Sci. Technol. Bradley J W
Karkari, S. K., Vetushka, A., Bradley, J. W.. Measurement of the plasma potential adjacent to the substrate in a midfrequency bipolar pulsed magnetron. Journal of vacuum science & technology. A, Vacuum, surfaces, and films, vol.21, no.6, L28-L32.
Stamate, E., Ohe, K.. Influence of surface condition in Langmuir probe measurements. Journal of vacuum science & technology. A, Vacuum, surfaces, and films, vol.20, no.3, 661-666.
2005 10.1088/0022-3727/38/11/018 38 1769 0022-3727 J. Phys. D: Appl. Phys. Lopez J
Ehiasarian, A.P., New, R., Münz, W.-D., Hultman, L., Helmersson, U., Kouznetsov, V.. Influence of high power densities on the composition of pulsed magnetron plasmas. Vacuum, vol.65, no.2, 147-154.
2000 10.1116/1.582380 18 4 0734-2101 J. Vac. Sci. Technol. Macak K
Bohlmark, Johan, Alami, Jones, Christou, Chris, Ehiasarian, Arutiun P., Helmersson, Ulf. Ionization of sputtered metals in high power pulsed magnetron sputtering. Journal of vacuum science & technology. A, Vacuum, surfaces, and films, vol.23, no.1, 18-22.
Wallendorf, Till, Marke, Swen, May, Christian, Strümpfel, Johannes. Optical investigations in a PEM controlled reactive magnetron sputter process for aluminium doped zinc oxide layers using metallic alloy targets. Surface & coatings technology, vol.174, 222-228.
Sproul, W.D., Christie, D.J., Carter, D.C., Tomasel, F., Linz, T.. Pulsed Plasmas for Sputtering Applications. Surface engineering : a joint publication of the Institute of Metals and the Wolfson Institute for Surface Engineering, vol.20, no.3, 174-176.
Guimarães, F., Almeida, J., Bretagne, J.. Modeling of the energy deposition mechanisms in an argon magnetron planar discharge. Journal of vacuum science & technology. A, Vacuum, surfaces, and films, vol.9, no.1, 133-140.
1993 10.1088/0963-0252/2/3/001 2 127 0963-0252 Plasma Sources Sci. Technol. Guimarães F
1993 10.1088/0963-0252/2/3/002 2 138 0963-0252 Plasma Sources Sci. Technol. Guimarães F
Kelly, PJ, Arnell, RD. The influence of substrate temperature on the properties of Al, Zr and W coatings deposited by closed-field unbalanced magnetron sputtering. Vacuum, vol.49, no.1, 43-47.
2004 10.1088/0022-3727/37/19/R01 37 R217 0022-3727 J. Phys. D: Appl. Phys. Donnelly V M
Chilton, J. Ethan, Boffard, John B., Schappe, R. Scott, Lin, Chun C.. Measurement of electron-impact excitation into the3p54plevels of argon using Fourier-transform spectroscopy. Physical review. A. Atomic, molecular, and optical physics, vol.57, no.1, 267-277.
1999 10.1103/PhysRevA.59.2749 59 2749 1050-2947 Phys. Rev. Boffard J
Bartschat, K., Zeman, V.. Electron-impact excitation from the(3p54s)metastable states of argon. Physical review. A. Atomic, molecular, and optical physics, vol.59, no.4, R2552-R2554.
2004 10.1088/0022-3727/37/12/R01 37 R143 0022-3727 J. Phys. D: Appl. Phys. Boffard J
Seo, Sang-Hun, Chang, Hong-Young. Anomalous behaviors of plasma parameters in unbalanced direct-current magnetron discharge. Physics of plasmas, vol.11, no.7, 3595-3601.
1970 Electric Probes for Plasma Diagnostics Swift J D
2005 10.1088/0963-0252/14/3/021 14 576 0963-0252 Plasma Sources Sci. Technol. Seo S-H
2004 10.1088/0963-0252/13/3/007 13 409 0963-0252 Plasma Sources Sci. Technol. Seo S-H
1996 10.1088/0963-0252/5/2/006 5 145 0963-0252 Plasma Sources Sci. Technol. Lieberman M A
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