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NTIS 바로가기Journal of micro/nanolithography, MEMS, and MOEMS : JM3, v.18 no.1, 2019년, pp.1 -
Meli, Luciana (IBM Semiconductor Research, Albany, New York) , Petrillo, Karen (IBM Semiconductor Research, Albany, New York) , De Silva, Anuja (IBM Semiconductor Research, Albany, New York) , Arnold, John (IBM Semiconductor Research, Albany, New York) , Felix, Nelson (IBM Semiconductor Research, Albany, New York) , Robinson, Chris (IBM Semiconductor Research, Albany, New York) , Briggs, Benjamin (IBM Semiconductor Research, Albany, New York) , Matham, Shravan (IBM Semiconductor Research, Albany, New York) , Mignot, Yann (IBM Semiconductor Research, Albany, New York) , Shearer, Jeffrey (IBM Semiconductor Research, Albany, New York) , Hamieh, Bassem (IBM Semiconductor Research, Albany, New York) , Hontake, Koichi (Tokyo Electron Limited, Technology Center America, LLC, Albany, New York) , Huli, Lior (Tokyo Electron Limited, Technology Center America, LLC, Albany, New York) , Lemley, Corey (Tokyo Electron Limited, Technology Center America, LLC, Albany, New York) , Hetzer, Dave (Tokyo Electron Limited, Technology Center America, LLC, Albany, New York) , Liu, Eric (Tokyo Electron Limited, Technology Center America, LLC, Albany, New York) , Akiteru, Ko (Tokyo Electron Limited, Technology Center America, LLC, Albany, New York) , Kawakami, Shinichiro (Tokyo Electron Kyushu Limited, Ku) , Shimoaoki, Takeshi , Hashimoto, Yusaku , Ichinomiya, Hiroshi , Kai, Akiko , Tanaka, Koichiro , Jain, Ankit , Choi, Heungsoo , Saville, Barry
초록이 없습니다.
Goethals Implementation of full field EUV lithography using the ADT 2008
De Silva, Anuja, Seshadri, Indira, Arceo, Abraham, Petrillo, Karen, Meli, Luciana, Mendoza, Brock, Yao, Yiping, Belyansky, Michael, Halle, Scott, Felix, Nelson M.. Study of alternate hardmasks for extreme ultraviolet patterning. Journal of vacuum science and technology. materials, processing, measurement, & phenomena : JVST B. B, Nanotechnology & microelectronics, vol.34, no.6, 06KG03-.
Stochastic effects in EUV lithography: random, local CD variability, and printing failures. Journal of micro/nanolithography, MEMS, and MOEMS : JM3, vol.16, no.4, 1-.
De Silva Inorganic hardmask development for EUV patterning 105830V 2018
Flanagin, Lewis W., Singh, Vivek K., Willson, C. Grant. Surface roughness development during photoresist dissolution. Journal of vacuum science & technology. processing, measurement, and phenomena : an official journal of the American Vacuum Society. B, Microelectronics and nanometer structures, vol.17, no.4, 1371-.
He, D.. Process dependence of roughness in a positive-tone chemically amplified resist. Journal of vacuum science & technology. processing, measurement, and phenomena : an official journal of the American Vacuum Society. B, Microelectronics and nanometer structures, vol.16, no.6, 3748-.
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