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NTIS 바로가기Applied surface science, v.479, 2019년, pp.1021 - 1028
Bhardwaj, Richa (Department of Physics, Panjab University) , Kaur, Baljeet (Department of Physics, Panjab University) , Singh, Jitendra Pal (Advanced Analysis Center, Korea Institute of Science and Technology) , Kumar, Manish (Pohang Accelerator Laboratory, POSTECH) , Lee, H.H. (Pohang Accelerator Laboratory, POSTECH) , Kumar, Parmod (Materials Science Division, Inter-University Accelerator Centre) , Meena, R.C. (Materials Science Division, Inter-University Accelerator Centre) , Asokan, K. (Materials Science Division, Inter-University Accelerator Centre) , Hwa Chae, Keun (Advanced Analysis Center, Korea Institute of Science and Technology) , Goyal, Navdeep (Department of Physics, Panjab University) , Gautam, Sanjeev (Advanced Functional Materials Lab, Panjab University, Dr. S.S. Bhatnagar University Institute of Chemical Engineering & Technology India<)
Abstract In this study, X-ZnO/ZnO/Si(100) (X = Co, Ni and Cu) bilayer structure is fabricated using low energy ion implantation technique. Five different fluences 1 × 1015, 5 × 1015, 1 × 1016, 2.5 × 1016 and 5 × 1016 ions/cm2 with 100 keV ion-beam energy were selected ...
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