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NTIS 바로가기Materials Research Society symposia proceedings, v.70, 1986년, pp.167 -
Schropp, Ruud E. I. , Snijder, Jan , Verwey, Jan F.
ABSTRACTThe density of states (DOS) has for the first time been calculated throughout the entire bandgap region of undoped amorphous silicon from quasi-static capacitance-voltage (QSCV) measurements using MOS structures. The QSCV DOS is compared with the DOS obtained by the field-effect method. It i...
Proc. of Conference on Tetrahedrally Bonded Amorphous Semiconductors 318 1981 Fritzsche
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Phys.Rev. B25 5285 1982 10.1103/PhysRevB.25.5285 Lang
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[5] Schropp R.E.I. , Snijder J. and Verwey J.F. , this proceedings.
Fritzsche, H.. Density-of-states distribution in the mobility gap of a-Si:H. Journal of non-crystalline solids, vol.77, no.1, 273-280.
Singh, Jasprit, Cohen, Morrel H.. Capacitance-voltage measurements in amorphous Schottky barriers. Journal of applied physics, vol.51, no.1, 413-418.
Hirose, M., Suzuki, T., Döhler, G. H.. Electronic density of states in discharge-produced amorphous silicon. Applied physics letters, vol.34, no.3, 234-236.
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