[논문]Effects of superimposed dual-frequency (13.56/2 MHz) inductively coupled plasma source on the uniformity of Ar/CF4 plasma

Yang, Kyung Chae; Shin, Ye Ji; Tak, Hyun Woo; Lee, Wonseok; Lee, Seung Bae; Yeom, Geun Young

doi:10.1016/j.vacuum.2019.108802

[해외논문] Effects of superimposed dual-frequency (13.56/2 MHz) inductively coupled plasma source on the uniformity of Ar/CF4 plasma

Vacuum, v.168, 2019년, pp.108802 -

Yang, Kyung Chae (School of Advanced Materials Science and Engineering, Sungkyunkwan University) , Shin, Ye Ji (School of Advanced Materials Science and Engineering, Sungkyunkwan University) , Tak, Hyun Woo (School of Advanced Materials Science and Engineering, Sungkyunkwan University) , Lee, Wonseok (SEMES CO., LTD.) , Lee, Seung Bae (SEMES CO., LTD.) , Yeom, Geun Young (School of Advanced Materials Science and Engineering, Sungkyunkwan University)

Abstract ▼ AI-Helper

Abstract As one of the methods for controlling the plasma uniformity, superimposed dual frequencies of 13.56 and 2 MHz were used on an inductively coupled plasma (ICP) source, and the effects of the superimposed dual-frequency ICP on the plasma and etch uniformities were investigated and compared with a conventional single-frequency ICP operation at 13.56 MHz using Ar/CF4. The superimposed dual-frequency ICP operated at 13.56 and 2 MHz improved the plasma uniformity compared to the single-frequency ICP for both Ar and Ar/CF4 by improving the plasma density near the center region of the wafer close to the edge region. In addition, for Ar plasma, a change in the power ratio of 2/13.56 MHz during the superimposed dual-frequency operation changed the EEDF of the plasma and the IED toward the wall. When SiO2 was etched using Ar/CF4 with the superimposed dual-frequency ICP while biasing the substrate with a separate radio frequency power of 12.56 MHz, similar to the results on the plasma uniformity, the SiO2 etch uniformity within a 300 mm diameter wafer was improved by using the superimposed dual-frequency ICP operated at 13.56 and 2 MHz, as compared to that using a single-frequency ICP of 13.56 MHz. Highlights The superimposed dual-frequency ICP operated at 13.56 and 2 MHz improved the plasma uniformity by improving plasma density near the center region of the wafer close to the edge region. Also when SiO2 was etched using Ar/CF4 while biasing the substrate with a separate RF power, the ICP operated using superimposed dual frequencies showed a better etch uniformity. Using superimposed dual frequencies of 13.56 and 2 MHz showed a better plasma and etch uniformity.

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참고문헌 (29)

Jpn. J. Appl. Phys. Ishikawa 56 2017 10.7567/JJAP.56.06HA02 Progress and prospects in nanoscale dry processes: how can we control atomic layer reactions?

상세보기
Plasma Sources Sci. Technol. Khater 9 545 2000 10.1088/0963-0252/9/4/310 A new inductively coupled plasma source design with improved azimuthal symmetry control

상세보기
Lieberman 2005 Principles of Plasma Discharges and Materials Processing
J. Phys. D Appl. Phys. Lee 47 2014 10.1088/0022-3727/47/1/015205 Standing wave effect on plasma distribution in an inductively coupled plasma source with a short antenna

상세보기
J. Vac. Sci. Technol. A Stevens 14 139 1996 10.1116/1.579909 Uniformity of radio frequency bias voltages along conducting surfaces in a plasma

상세보기
Thin Solid Films Lee 518 5219 2010 10.1016/j.tsf.2010.03.147 Impedance transition and series resonance between bulk plasma and sheath in biased inductively coupled plasma

상세보기
J. Phys. D Appl. Phys. Robiche 36 1810 2003 10.1088/0022-3727/36/15/311 Analytical model of a dual frequency capacitive sheath

상세보기
J. Phys. D Appl. Phys. Yuan 41 205209 2008 10.1088/0022-3727/41/20/205209 Effect of low-frequency power on dual-frequency capacitively coupled plasmas

상세보기
J. Vac. Sci. Technol. A Liu 33 2015 10.1116/1.4907926 Electromagnetic effects in high-frequency large-area capacitive discharges: a review

상세보기
Plasma Sources Sci. Technol. Lee 21 2012 10.1088/0963-0252/21/3/035003 Experimental observation of the skin effect on plasma uniformity in inductively coupled plasmas with a radio frequency bias

상세보기
Appl. Phys. Lett. Perret 83 243 2003 10.1063/1.1592617 Ion flux nonuniformities in large-area high-frequency capacitive discharges

상세보기
J. Vac. Sci. Technol. A Sung 30 2012 10.1116/1.4754695 Frequency and electrode shape effects on etch rate uniformity in a dual-frequency capacitive reactor

상세보기
Thin Solid Films Lee 519 7009 2011 10.1016/j.tsf.2011.01.218 Effects of RF bias power on electron energy distribution function and plasma uniformity in inductively coupled argon plasma

상세보기
Plasma Sources Sci. Technol. Mishra 21 2012 10.1088/0963-0252/21/3/035018 Synergetic effects in a discharge produced by a dual frequency-dual antenna large-area ICP source

상세보기
Rev. Sci. Instrum. Kim 84 2013 10.1063/1.4802673 Two-dimensional-spatial distribution measurement of electron temperature and plasma density in low temperature plasmas

상세보기
Plasma Sources Sci. Technol. Lee 24 2015 10.1088/0963-0252/24/6/065012 Improvement of uniformity in a weakly magnetized inductively coupled plasma

상세보기
J. Appl. Phys. Liu 116 2014 Experimental observation of standing wave effect in low-pressure very-high-frequency capacitive discharges

상세보기
J. Vac. Sci. Technol. A Zhang 33 2015 10.1116/1.4928033 Fluid simulation of the bias effect in inductive/capacitive discharges

상세보기
J. Appl. Phys. Denda 95 870 2004 10.1063/1.1636527 Functional separation in two frequency operation of an inductively coupled plasma

상세보기
Appl. Phys. Lett. Sansonnens 82 182 2003 10.1063/1.1534918 Shaped electrode and lens for a uniform radio-frequency capacitive plasma

상세보기
Phys. Plasmas Chabert 11 4081 2004 10.1063/1.1770900 Suppression of the standing wave effect in high frequency capacitive discharges using a shaped electrode and a dielectric lens: self-consistent approach

상세보기
Vacuum Monaghan 119 34 2015 10.1016/j.vacuum.2015.03.019 Measurement of nc-Si:H film uniformity and diagnosis of plasma spatial structure produced by a very high frequency, differentially powered, multi-tile plasma source

상세보기
Thin Solid Films Monaghan 519 6884 2011 10.1016/j.tsf.2011.04.092 Characterisation of thin film silicon films deposited by plasma enhanced chemical vapour deposition at 162 MHz, using a large area, scalable, multi-tile-electrode plasma source

상세보기
Plasma Sources Sci. Technol. Schungel 23 2014 Ion distribution functions at the electrodes of capacitively coupled high-pressure hydrogen discharges

상세보기
J. Vac. Sci. Technol. Vac., Surf. Films Sirse 34 2016 10.1116/1.4959844 Electron density modulation in pulsed dual-frequency (2/13.56MHz) dual-antenna inductively coupled plasma discharge

상세보기
Jpn. J. Appl. Phys. Brcka 55 2016 10.7567/JJAP.55.07LD08 Investigation of large-area multicoil inductively coupled plasma sources using three-dimensional fluid model

상세보기
J. Appl. Phys. Kushner 82 5312 1997 10.1063/1.366297 Consequences of asymmetric pumping in low pressure plasma processing reactors: a three-dimensional modeling study

상세보기
J. Appl. Phys. Diomede 109 2011 10.1063/1.3573488 Particle-in-cell simulation of ion energy distributions on an electrode by applying tailored bias waveforms in the afterglow of a pulsed plasma

상세보기
J. Phys. D Appl. Phys. Mishra 46 235203 2013 10.1088/0022-3727/46/23/235203 Temporal evolution of plasma potential in a large-area pulsed dual-frequency inductively coupled discharge

상세보기

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[해외논문] Effects of superimposed dual-frequency (13.56/2 MHz) inductively coupled plasma source on the uniformity of Ar/CF4 plasma

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[해외논문] Effects of superimposed dual-frequency (13.56/2 MHz) inductively coupled plasma source on the uniformity of Ar/CF4 plasma

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