[논문]Near-field sub-diffraction photolithography with an elastomeric photomask

Paik, Sangyoon; Kim, Gwangmook; Chang, Sehwan; Lee, Sooun; Jin, Dana; Jeong, Kwang-Yong; Lee, I Sak; Lee, Jekwan; Moon, Hongjae; Lee, Jaejun; Chang, Kiseok; Choi, Su Seok; Moon, Jeongmin; Jung, Soonshin; Kang, Shinill; Lee, Wooyoung; Choi, Heon-Jin; Choi, Hyunyong; Kim, Hyun Jae; Lee, Jae-Hyun; Cheon, Jinwoo; Kim, Miso; Myoung, Jaemin; Park, Hong-Gyu; Shim, Wooyoung

doi:10.1038/s41467-020-14439-1

[해외논문] Near-field sub-diffraction photolithography with an elastomeric photomask 원문보기

Nature communications, v.11 no.1 = v.11, 2020년, pp.805 -

Paik, Sangyoon (Department of Materials Science and Engineering, Yonsei University, Seoul, 120-749 Republic of Korea) , Kim, Gwangmook (Department of Materials Science and Engineering, Yonsei University, Seoul, 120-749 Republic of Korea) , Chang, Sehwan (Department of Physics, Korea University, Seoul, 02841 Republic of Korea) , Lee, Sooun (Department of Materials Science and Engineering, Yonsei University, Seoul, 120-749 Republic of Korea) , Jin, Dana (Department of Materials Science and Engineering, Yonsei University, Seoul, 120-749 Republic of Korea) , Jeong, Kwang-Yong (Department of Physics, Korea University, Seoul, 02841 Republic of Korea) , Lee, I Sak (School of Electrical and Electronic Engineering, Yonsei University, 50 Yonsei-ro, Seodaemun-gu, Seoul 03722 Republic of Korea) , Lee, Jekwan (Department of Physics and Astronomy, and Institute of Applied Physics, Seoul National University, Seoul, Republic of Korea) , Moon, Hongjae (Department of Materials Science and Engineering, Yonsei University, Seoul, 120-749 Republic of Korea) , Lee, Jaejun (Department of Materials Science and Engineering, Yonsei University, Seoul, 120-749 R) , Chang, Kiseok , Choi, Su Seok , Moon, Jeongmin , Jung, Soonshin , Kang, Shinill , Lee, Wooyoung , Choi, Heon-Jin , Choi, Hyunyong , Kim, Hyun Jae , Lee, Jae-Hyun , Cheon, Jinwoo , Kim, Miso , Myoung, Jaemin , Park, Hong-Gyu , Shim, Wooyoung

Abstract ▼ AI-Helper

Photolithography is the prevalent microfabrication technology. It needs to meet resolution and yield demands at a cost that makes it economically viable. However, conventional far-field photolithography has reached the diffraction limit, which imposes complex optics and short-wavelength beam source to achieve high resolution at the expense of cost efficiency. Here, we present a cost-effective near-field optical printing approach that uses metal patterns embedded in a flexible elastomer photomask with mechanical robustness. This technique generates sub-diffraction patterns that are smaller than 1/10th of the wavelength of the incoming light. It can be integrated into existing hardware and standard mercury lamp, and used for a variety of surfaces, such as curved, rough and defect surfaces. This method offers a higher resolution than common light-based printing systems, while enabling parallel-writing. We anticipate that it will be widely used in academic and industrial productions.Photolithography is an established microfabrication technique but commonly uses costly shortwavelength light sources to achieve high resolution. Here the authors use metal patterns embedded in a flexible elastomer photomask with mechanical robustness for generation of subdiffraction patterns as a cost effective near-field optical printing approach.

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