IPC분류정보
국가/구분 |
United States(US) Patent
공개
|
국제특허분류(IPC7판) |
|
출원번호 |
US-0649341
(2017-07-13)
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공개번호 |
US-0017876
(2018-01-18)
|
발명자
/ 주소 |
- CHEN, Jang Fung
- BENCHER, Christopher Dennis
|
출원인 / 주소 |
|
인용정보 |
피인용 횟수 :
0 인용 특허 :
0 |
초록
▼
Embodiments of the present disclosure generally relate to apparatuses and systems for performing photolithography processes. More particularly, compact illumination tools for projecting an image onto a substrate are provided. In one embodiment, an illumination tool includes a microLED array includin
Embodiments of the present disclosure generally relate to apparatuses and systems for performing photolithography processes. More particularly, compact illumination tools for projecting an image onto a substrate are provided. In one embodiment, an illumination tool includes a microLED array including one or more microLEDs. Each microLED produces at least one light beam. The illumination tool also includes a beamsplitter adjacent the microLED array, one or more refractory lens components adjacent the beam splitter, and a projection lens adjacent the one or more refractory lens components. The mounting plate advantageously provides for compact alignment in a system having a plurality of illumination tools, each of which is easily removable and replaceable.
대표청구항
▼
1. An illumination tool, comprising: a microLED array, wherein the microLED array comprises one or more microLED, wherein each microLED produces at least one light beam;a beamsplitter adjacent the microLED array;one or more refractory lens components adjacent the beamsplitter; anda projection lens a
1. An illumination tool, comprising: a microLED array, wherein the microLED array comprises one or more microLED, wherein each microLED produces at least one light beam;a beamsplitter adjacent the microLED array;one or more refractory lens components adjacent the beamsplitter; anda projection lens adjacent the one or more refractory lens components. 2. The illumination tool of claim 1, wherein the projection lens further comprises: a focus group; anda window. 3. The illumination tool of claim 2, further comprising: a focus sensor; anda camera. 4. The illumination tool of claim 3, wherein the focus sensor and camera are disposed adjacent the beamsplitter. 5. The illumination tool of claim 4, further comprising: a light dump. 6. The illumination tool of claim 5, further comprising: a light level sensor. 7. The illumination tool of claim 6, further comprising: a distortion compensator. 8. The illumination tool of claim 7, wherein the distortion compensator is disposed between the projection lens and the beamsplitter. 9. An illumination tool, comprising: a microLED array, wherein the microLED array comprises one or more microLED, wherein each microLED produces at least one light beam;a beamsplitter adjacent the microLED array;one or more refractory lens components adjacent the beamsplitter;a projection lens adjacent the one or more refractory lens components; anda distortion compensator disposed between the projection lens and the beamsplitter. 10. The illumination tool of claim 9, wherein the projection lens further comprises: a focus group; anda window. 11. The illumination tool of claim 10, further comprising: a focus sensor; anda camera. 12. The illumination tool of claim 11, wherein the focus sensor and camera are coupled orthogonally to the beamsplitter. 13. The illumination tool of claim 12, further comprising: a light dump. 14. The illumination tool of claim 13, further comprising: a mounting plate, wherein the frustrated cube assembly, the microLED array, the beamsplitter, and the one or more refractory lens components are coupled to the mounting plate. 15. The illumination tool of claim 14, further comprising: a light level sensor. 16. An illumination tool system, comprising: two or more stages, wherein the two or more stages are configured to hold one or more substrates; anda plurality of illumination tools for patterning the one or more substrates, wherein each illumination tool comprises: a microLED array, wherein the microLED array comprises one or more microLED, wherein each microLED produces at least one light beam;a beamsplitter adjacent the microLED array;one or more refractory lens components adjacent the beam splitter; anda projection lens adjacent the one or more refractory lens components. 17. The illumination tool system of claim 16, wherein the projection lens further comprises: a focus group; anda window. 18. The illumination tool system of claim 17, further comprising: a focus sensor; anda camera. 19. The illumination tool system of claim 18, wherein the focus sensor and camera are coupled orthogonally to the beamsplitter. 20. The illumination tool system of claim 19, further comprising: a light dump.
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