IPC분류정보
국가/구분 |
United States(US) Patent
공개
|
국제특허분류(IPC7판) |
|
출원번호 |
16755221
(2018-10-12)
|
공개번호 |
20200317531
(2020-10-08)
|
우선권정보 |
JP-2017-200790 (2017-10-17) |
국제출원번호 |
PCT/JP2018/038164
(2018-10-12)
|
발명자
/ 주소 |
- SAKAI, Junya
- YAMAMATO, Tomohiro
- YOSHIOKA, Yuuki
- FUJII, Shouji
|
출원인 / 주소 |
|
인용정보 |
피인용 횟수 :
0 인용 특허 :
0 |
초록
▼
A boron structure body includes boron having each concentration of Ti, Al, Fe, Cr, Ni, Co, Cu, W, Ta, Mo and Nb being 0.1 ppmw or less and having a thickness of 0.8 to 5 mm. The boron structure body may have a tubular shape, and when used as a doping agent, a ratio of 11B that is an isotope may be 9
A boron structure body includes boron having each concentration of Ti, Al, Fe, Cr, Ni, Co, Cu, W, Ta, Mo and Nb being 0.1 ppmw or less and having a thickness of 0.8 to 5 mm. The boron structure body may have a tubular shape, and when used as a doping agent, a ratio of 11B that is an isotope may be 95 mass % or more. The boron structure body can be easily crushed, and a high-purity boron powder having an average particle diameter of 0.5 to 3 mm and having each metal impurity concentration of 0.3 ppmw or less can be obtained.
대표청구항
▼
1. A boron structure body comprising boron having each concentration of titanium, aluminum, iron, chromium, nickel, cobalt, copper, tungsten, tantalum, molybdenum and niobium being 0.1 ppmw or less, and having a thickness of 0.8 to 5 mm. 2. The boron structure body according to claim 1, having a tub
1. A boron structure body comprising boron having each concentration of titanium, aluminum, iron, chromium, nickel, cobalt, copper, tungsten, tantalum, molybdenum and niobium being 0.1 ppmw or less, and having a thickness of 0.8 to 5 mm. 2. The boron structure body according to claim 1, having a tubular shape. 3. The boron structure body according to claim 1, having a density of 2.2 g/cm3 or more. 4. The boron structure body according to claim 1, wherein a ratio of 11B as an isotope of boron is 95 mass % or more. 5. A boron powder comprising a crushed material of the boron structure body according to claim 1, having an average particle diameter of 0.5 to 3 mm, and having each concentration of titanium, aluminum, iron, chromium, nickel, cobalt, copper, tungsten, tantalum, molybdenum and niobium being 0.3 ppmw or less. 6. The boron powder according to claim 5, wherein the each concentration of titanium, aluminum, iron, chromium, nickel, cobalt, copper, tungsten, tantalum, molybdenum and niobium is 0.2 ppmw or less. 7. A boron powder having an average particle diameter of 0.5 to 3 mm, and having each concentration of titanium, aluminum, iron, chromium, nickel, cobalt, copper, tungsten, tantalum, molybdenum and niobium being 0.3 ppmw or less. 8. The boron powder according to claim 7, wherein the each concentration of titanium, aluminum, iron, chromium, nickel, cobalt, copper, tungsten, tantalum, molybdenum and niobium is 0.2 ppmw or less. 9. The boron powder according to claim 5, having an average particle diameter of 0.7 mm or more. 10. The boron powder according to claim 9, wherein the average particle diameter is 0.8 mm or more. 11. The boron powder according to any one claim 5, wherein a content of a boron fine powder having a particle diameter of less than 0.5 mm is 40 mass % or less. 12. A boron structure body to claim 1, having a total metal impurity concentration of 0.1 ppmw to 0.9 ppmw. 13. A method of making the boron structure body, comprising: feeding a boron halide represented by BX3, wherein X is chlorine, bromine or iodine but is not fluorine, together with hydrogen to a heated metal substrate;reducing the boron halide and depositing boron on the metal substrate, wherein contamination due to diffusion of metal substrate components during deposition is suppressed by adjusting a thickness of deposited boron on the metal substrate to a specific thickness; andobtaining a boron structure body by removing the metal substrate after the deposition,wherein the boron structure body comprises boron andtitanium, aluminum, iron, chromium, nickel, cobalt, copper, tungsten, tantalum, molybdenum and niobium, each having a concentration of 0.1 ppmw or less,wherein the boron structure body has a thickness of 0.8 to 5 mm. 14. The method according to claim 13, further comprising crushing the boron structure body.
※ AI-Helper는 부적절한 답변을 할 수 있습니다.