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Vacuum sputtering apparatus 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • C23C-015/00
  • C23C-013/08
출원번호 US-0556584 (1975-03-10)
발명자 / 주소
  • Rosvold Warren C. (Sunnyvale CA)
출원인 / 주소
  • Signetics Corporation (Sunnyvale CA 02)
인용정보 피인용 횟수 : 75  인용 특허 : 0

초록

Vacuum sputtering apparatus for treating articles having a housing forming a main vacuum chamber with a plurality of work stations therein. A lock chamber is provided in the main vacuum chamber through which articles can be inserted and removed. Means is provided in the main vacuum chamber for advan

대표청구항

In a vacuum sputtering apparatus for treating articles, a housing forming a main vacuum chamber having a plurality of work stations therein, at least one sputtering apparatus mounted in at least one of the work stations, means connected to the vacuum chamber for forming a vacuum in the vacuum chambe

이 특허를 인용한 특허 (75)

  1. Tanaka ; Akio ; Edamura ; Mizuo ; Ruruitsu ; Satoshi ; Kunise ; Satoru, Apparatus for ion-nitriding.
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