[특허]Photopolymerization process and related devices

Photopolymerization process and related devices 원문보기

IPC분류정보
국가/구분	United States(US) Patent 등록
국제특허분류(IPC7판)	G03C-005/04
출원번호	US-0580929 (1975-05-27)
발명자 / 주소	Chandross Edwin Arthur (Berkeley Heights NJ) Tomlinson III Walter John (Holmdel NJ) Weber Heinz Paul (Middletown NJ)
출원인 / 주소	Bell Telephone Laboratories, Incorporated (Murray Hill NJ 02)
인용정보	피인용 횟수 : 43 인용 특허 : 0

초록 ▼

A photopolymerization process is adapted for the production of various optical devices by means of a modified process which serves to increase the index change obtainable in a variable pattern of index of refraction. The process comprises the steps of flowing into place in a supporting structure a mixture of two components of differing reactivity and polarizability, partially polymerizing the mixture, writing a pattern of varying index of refraction in the partially polymerized mixture by further polymerizing it by suitable optical radiation in a corresponding pattern, and fixing the mixture against subsequent changes in polymerization. Typical components used in the process include a mixture of the monomers cyclohexyl methacrylate and N-vinylcarbazole together with benzoin methyl ether as a photosensitive initiator of polymerization, which proceeds by free radical reactions. In the limit of our technique, one of the components can have zero reactivity. This photopolymerization process is applicable to production of volume gratings in closed cavities having parts with constricted clearances therebetween, in which application it is impossible to evaporate unreacted components after the mixture has been flowed into place. The volume gratings are useful in distributed feedback lasers, in frequency sensitive optical filters and in channel-dropping arrangements for optical communication systems. Submerging the apparatus in which polymerization is to occur in an index-matching fluid between flat glass plates is an aid to producing uniform volume gratings in a cylindrical device.

대표청구항 ▼

A process comprising the steps of positioning in a supporting structure a mixture of at least two components of respectively differing photopolymerization reactivities and respectively differing optical polarizabilities, partially polymerizing the mixture, writing a pattern in the partially polymerized mixture by exposing it to optical radiation in a corresponding pattern and of a wavelength suitable for the photopolymerization, and fixing the mixture against the subsequent changes in polymerization. A process comprising mixing cyclohexyl methacrylate and a substantially comparable molecular proportion of N-vinylcarbazole and a substantially smaller proportion of benzoin methyl ether as a photosensitive initiator, flowing said mixture into position in a supporting structure, initially photopolymerizing partially to increase its viscosity to prevent flow along said supporting structure, writing a pattern of index of refraction into said mixture by exposing it to optical radiation adapted to promote further polymerizing of the cyclohexyl methacrylate, whereby a two-way diffusion of the monomer cyclohexyl methacrylate and N-vinylcarbazole occur, said methacrylate toward regions of highest optical intensity and said N-vinylcarbazole toward regions of lowest optical intensity, and fixing the patterns resulting from the two-way diffusion by a final exposure to uniform optical radiation selected to complete the polymerization of said mixture.

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