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Vapor degreasing system having a divider wall between upper and lower vapor zone portions 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • B08B-005/00
출원번호 US-0662750 (1976-03-01)
발명자 / 주소
  • Rand Burton (Norristown PA)
출원인 / 주소
  • Autosonics Inc. (Norristown PA 02)
인용정보 피인용 횟수 : 54  인용 특허 : 0

초록

Cleaning apparatus such as a degreaser tank is provided with a vapor zone divided into upper and lower portions by a wall and a closure member which cooperates with the wall so that the upper and lower portions of the vapor zone may be isolated from one another. During such isolation of the upper an

대표청구항

Apparatus comprising a housing having a sump adapted to contain a vaporizable solvent, a first condensor means supported by the housing adjacent the upper end thereof and defining the upper end of a vapor zone in said housing, a second condensor means in said housing above the sump, a dividing wall

이 특허를 인용한 특허 (54)

  1. Yokomizo,Kenji, Apparatus and method of securing a workpiece during high-pressure processing.
  2. Biberger, Maximilian Albert; Layman, Frederick Paul; Sutton, Thomas Robert, Apparatus for supercritical processing of a workpiece.
  3. Biberger, Maximilian Albert; Layman, Frederick Paul; Sutton, Thomas Robert, Apparatus for supercritical processing of multiple workpieces.
  4. Ohtsuka Shigeo (3-32 ; Kigawa-higashi ; 3-chome Yodogawa-ku ; Osaka JPX) Horimoto Toshio (3-32 ; Kigawa-higashi ; 3-chome Yodogawa-ku ; Osaka JPX) Miyakoshi Shigeo (3-32 ; Kigawa-higashi ; 3-chome Yo, Chloro-fluoro-carbon cleaning apparatus.
  5. Takeda Yutaka (Kawanishi JPX) Kamitani Mamoru (Nara JPX), Cleaning apparatus.
  6. Holm Kurt A. (Skoghall SEX), Cleaning of objects with solvent.
  7. Zappa Donald E. (Pittsburgh PA) Cascone James J. (Voorhees NJ), Closed loop system and method for cleaning articles with a volatile cleaning solvent.
  8. Jones,William Dale, Control of fluid flow in the processing of an object with a fluid.
  9. Rand Burton (Collegeville PA), Degreasing apparatus.
  10. Sheydayi,Alexei; Sutton,Thomas, Gate valve for plus-atmospheric pressure semiconductor process vessels.
  11. Jones, William D., High pressure fourier transform infrared cell.
  12. Biberger, Maximilian A.; Layman, Frederick Paul; Sutton, Thomas Robert, High pressure processing chamber for semiconductor substrate.
  13. Biberger,Maximilian A.; Layman,Frederick Paul; Sutton,Thomas Robert, High pressure processing chamber for semiconductor substrate.
  14. Jones,William Dale, High-pressure processing chamber for a semiconductor wafer.
  15. Jones,William Dale, High-pressure processing chamber for a semiconductor wafer.
  16. Sheydayi,Alexei, Method and apparatus for clamping a substrate in a high pressure processing system.
  17. Duval Leonard A. (207 Harmon Rd. Aurora OH 44202), Method and apparatus for cleaning fine waste material mixed with oil and water.
  18. Goshi,Gentaro, Method and apparatus for cooling motor bearings of a high pressure pump.
  19. Biberger, Maximilian Albert; Layman, Frederick Paul; Sutton, Thomas Robert, Method and apparatus for supercritical processing of multiple workpieces.
  20. Elliott Douglas R. (East Cleveland OH), Method and apparatus for vapor treatment of metals.
  21. Parent,Wayne M.; Goshi,Gentaro, Method and system for cooling a pump.
  22. Parent,Wayne M., Method and system for determining flow conditions in a high pressure processing system.
  23. Parent, Wayne M.; Geshell, Dan R., Method and system for passivating a processing chamber.
  24. Hansen,Brandon; Lowe,Marie, Method and system for treating a substrate with a high pressure fluid using fluorosilicic acid.
  25. Kawamura,Kohei; Asano,Akira; Miyatani,Koutarou; Hillman,Joseph T.; Palmer,Bentley, Method for supercritical carbon dioxide processing of fluoro-carbon films.
  26. Biberger, Maximilian Albert; Layman, Frederick Paul; Sutton, Thomas Robert, Method for supercritical processing of multiple workpieces.
  27. Biberger, Maximilian A.; Schilling, Paul E., Method of depositing metal film and metal deposition cluster tool including supercritical drying/cleaning module.
  28. Biberger,Maximilian A.; Schilling,Paul E., Method of depositing metal film and metal deposition cluster tool including supercritical drying/cleaning module.
  29. Biberger,Maximilian Albert; Layman,Frederick Paul; Sutton,Thomas Robert, Method of supercritical processing of a workpiece.
  30. Sheydayi,Alexei, Non-contact shuttle valve for flow diversion in high pressure systems.
  31. Sheydayi,Alexei, Pressure energized pressure vessel opening and closing device and method of providing therefor.
  32. Ammann Hans H. (Chester NJ) Oien Michael A. (Chatham Township ; Morris County NJ), Process and apparatus for controlling losses in volatile working fluid systems.
  33. Wuester,Christopher D., Process flow thermocouple.
  34. Mullee, William H.; de Leeuwe, Marc; Roberson, Jr., Glenn A., Removal of CMP residue from semiconductor substrate using supercritical carbon dioxide process.
  35. Mullee William H. ; de Leeuwe Marc ; Roberson ; Jr. Glenn A., Removal of CMP residue from semiconductors using supercritical carbon dioxide process.
  36. Mullee, William H., Removal of photoresist and photoresist residue from semiconductors using supercritical carbon dioxide process.
  37. Mullee, William H., Removal of photoresist and photoresist residue from semiconductors using supercritical carbon dioxide process.
  38. William H. Mullee ; Maximilian A. Biberger ; Paul E. Schilling, Removal of photoresist and residue from substrate using supercritical carbon dioxide process.
  39. Koch Robert, Removal of polishing residue from substrate using supercritical fluid process.
  40. Mullee William H., Removal of resist or residue from semiconductors using supercritical carbon dioxide.
  41. Publ, Rudy; Kisela, David; Rothwell, Tim; Merz, Greg, Reservoir module for a recycler assembly.
  42. Peck, Douglas J.; Spigarelli, Donald J., Single vapor system for soldering, fusing or brazing.
  43. Westcott Robert D. (1073 N. Grant Canby OR 97013), Solvent recovery apparatus and method.
  44. Rand ; Burton, Solvent spray cleaning system for minimizing solvent losses.
  45. Grebinski Thomas J. (Sunnyvale CA), Surface treatment to remove impurities in microrecesses.
  46. Gale,Glenn; Hillman,Joseph T.; Jacobson,Gunilla; Palmer,Bentley, System and method for processing a substrate using supercritical carbon dioxide processing.
  47. Jacobson,Gunilla; Yellowaga,Deborah, Treatment of a dielectric layer using supercritical CO.
  48. Kevwitch, Robert, Treatment of substrate using functionalizing agent in supercritical carbon dioxide.
  49. Sheydayi,Alexei, Vacuum chuck utilizing sintered material and method of providing thereof.
  50. Mansur Pierre G., Vapor containment and recovery system on a general parts washer apparatus.
  51. McCord,Richard G.; McCord,Thomas G., Vapor generating and recovery apparatus.
  52. Petterson Robert C. (7800 Cohn St. New Orleans LA 70118) Loubier Roger C. (1000 Milton St. Gretna LA 70053), Vapor stripping method.
  53. Petterson Robert C. (7800 Cohn St. New Orleans LA 70018) Loubier Roger C. (1000 Milton St. Gretna LA 70053), Vapor stripping process.
  54. Shirai Mitugu (Hadano JPX) Sasaki Hideaki (Hadano JPX) Ueda Sadatoshi (Chiba JPX) Sawada Akira (Fujisawa JPX), Vapor tank.
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