[특허]Apparatus for depositing thin layers of materials by reactive spraying in a high-frequency inductive plasma

[미국특허] Apparatus for depositing thin layers of materials by reactive spraying in a high-frequency inductive plasma 원문보기

IPC분류정보
국가/구분	United States(US) Patent 등록
국제특허분류(IPC7판)	C23C-013/12 B23K-005/00
출원번호	US-0633263 (1975-11-19)
우선권정보	LU-0071343 (1974-11-22)
발명자 / 주소	Beucherie Pierre (Biandronno (Varese) IT)
출원인 / 주소	European Atomic Energy Community (EURATOM) (Kirchberg LU 03)
인용정보	피인용 횟수 : 13 인용 특허 : 1

초록 ▼

A method and apparatus for depositing thin layers of insulating or slightly conductive materials involves reactive spraying through high-frequency inductive plasma. The conductive component of the material to be deposited is sprayed in a first chamber through which an ionizable inert gas travels, the sprayed particles then passing through a second chamber in which a substrate is placed and to which a reactive gas is supplied. Insulating and weakly inductive materials such as oxides, carbide and nitrides may be deposited at a rate substantially comparable with the rate for conductive materials to obtain high quality uniform deposits.

대표청구항 ▼

An apparatus for depositing thin layers by reactive spraying a high frequency inductive plasma comprising a sealing-tight vessel connected to a vacuum generation system containing means which are adapted to produce a high-frequency electromagnetic field and comprise a material which can be sprayed by the field, at least one surface serving as a substrate for the thin layer deposition, means for injecting gas into the vessel near the surface and means for injecting a gas into the vessel near the means applying the electromagnetic field, the gases comprising a reactive gas and an inert gas which can be ionized by the electromagnetic field, said vessel comprising partition means dividing it into a first chamber which contains the means applying the electromagnetic field and is connected to the means supplying an ionizable inert gas and at least a second chamber which contains the substrate or substrates and is connected to the means for supplying reactive gas, the partition means being formed with an aperture which connects the chambers and is disposed on the straight path between the substrates and the means for applying the electromagnetic field, the vessel being provided with connecting ducts to the vacuum generation system, the ducts being so disposed with respect to the chambers that the reactive gas cannot flow into the first chamber.

이 특허에 인용된 특허 (1) 인용/피인용 타임라인 분석

Gorinas Guy (Annecy FR), Device for the rapid depositing of oxides in thin layers which adhere well to plastic supports.
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이 특허를 인용한 특허 (13) 인용/피인용 타임라인 분석

Carr,Jeffrey W., Apparatus and method for atmospheric pressure reactive atom plasma processing for shaping of damage free surfaces.
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Ikeda, Yuji, Apparatus and method for coating object by supplying droplet to surface of the object while applying active species to the droplet.
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Carr, Jeffrey W., Apparatus and method for reactive atom plasma processing for material deposition.
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Carr,Jeffrey W., Apparatus and method for reactive atom plasma processing for material deposition.
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Mullin Richard S. (Pomfret CT) Riendeau Leo A. (Springfield MA) Ulion Nicholas E. (Marlborough CT), Apparatus for applying ceramic coatings.
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Maeda Kazuo (Tokyo JPX) Ohira Kouichi (Tokyo JPX) Nishimoto Yuhko (Tokyo JPX), Apparatus for forming film.
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Mohanty, Pravansu S., Coaxial laser assisted cold spray nozzle.
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Sugata Hiroyuki (Yokohama JPX) Sugata Masao (Yokohama JPX) Kurihara Noriko (Kawasaki JPX) Den Tohru (Tokyo JPX) Ando Kenji (Kawasaki JPX) Kamiya Osamu (Machida JPX), Device and process for treating fine particles.
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Carr, Jeffrey W., Method for atmospheric pressure reactive atom plasma processing for surface modification.
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Carr,Jeffrey W., Method for non-contact cleaning of a surface.
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Maklad Mokhtar S. (Roanoke VA), Method of fabricating large optical preforms.
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Mohanty, Pravansu S.; Varadaraajan, Vikram, Multichannel cold spray apparatus.
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Vig ; John R. ; Hafner ; Erich ; Andres ; Ronald P., Nozzle beam type metal vapor source.
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IPC	Description
A	생활필수품
A62	인명구조; 소방(사다리 E06C)
A62B	인명구조용의 기구, 장치 또는 방법(특히 의료용에 사용되는 밸브 A61M 39/00; 특히 물에서 쓰이는 인명구조 장치 또는 방법 B63C 9/00; 잠수장비 B63C 11/00; 특히 항공기에 쓰는 것, 예. 낙하산, 투출좌석 B64D; 특히 광산에서 쓰이는 구조장치 E21F 11/00)
A62B-1/08	.. 윈치 또는 풀리에 제동기구가 있는 것

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[미국특허] Apparatus for depositing thin layers of materials by reactive spraying in a high-frequency inductive plasma 원문보기