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Dual-gimbal gyroscope flexure suspension 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • G01C-019/18
출원번호 US-0673745 (1976-04-05)
발명자 / 주소
  • Wyse Stanley Frederick (Encino CA)
출원인 / 주소
  • Litton Systems, Inc. (Woodland Hills CA 02)
인용정보 피인용 횟수 : 38  인용 특허 : 0

초록

A universal gyroscope flexure hinge assembly is provided to interconnect the inertial flywheel of a 2-axes free rotor gyroscope to the gyroscope spin shaft, with two symmetrical, axially displaced gimbal elements which allow two axes of angular freedom. Errors which would arise due to axially displa

대표청구항

A flexure hinge assembly comprising: a pair of concentric tubular members partially attached to one another, each of said tubular members having at least two pairs of adjacent apertures extending through the walls thereof and each of said pairs of apertures forming a flexure blade, each said flexure

이 특허를 인용한 특허 (38)

  1. Sreenivasan, Sidlgata V; Watts, Michael P. C.; Choi, Byung J.; Voisin, Ronald D., Alignment methods for imprint lithography.
  2. Routson Gregory S. (Kentwood MI), Circumferentially oriented flexure suspension.
  3. Xu,Frank Y.; Miller,Michael N.; Watts,Michael P. C., Composition for an etching mask comprising a silicon-containing material.
  4. Duncan Damon H. (Phoenix AZ), Flexure assembly for a dynamically tuned gyroscope.
  5. Choi, Byung J.; Sreenivasan, Sidlgata V., Flexure based macro motion translation stage.
  6. Choi, Byung Jin; Meissl, Mario J.; Sreenivasan, Sidlagata V.; Watts, Michael P. C., Formation of discontinuous films during an imprint lithography process.
  7. Krupick Walter J. (Succasunna NJ), Gyroscope hinge assembly with adjustable axial compliance.
  8. Choi, Byung Jin; Sreenivasan, Sidlgata V.; Johnson, Stephen C., High precision orientation alignment and gap control stages for imprint lithography processes.
  9. Sreenivasan, Sidlgata V.; Choi, Byung J.; Colburn, Matthew; Bailey, Todd, High-resolution overlay alignment methods for imprint lithography.
  10. Jenkins, Lyle J.; Hopkins, Ralph E.; Kumar, Kaplesh; Greiff, Paul; Foster, Edmund R.; Walker, Richard M.; Coco, Richard H.; Moscaritolo, Anthony M., Hybrid wafer gyroscope.
  11. Harper, Bruce M.; Saito, Toshiyuki Max, Imprint embossing alignment system.
  12. Harper, Bruce M.; Saito, Toshiyuki Max, Imprint embossing alignment system.
  13. Sreenivasan,Sidlgata V.; Schumaker,Philip D., Imprint lithography template having opaque alignment marks.
  14. Treves, David; Dorsey, Paul C., Imprinting method with embossing foil free to expand for nano-imprinting of recording media.
  15. Harper,Bruce M.; Saito,Toshiyuki Max; Bajorek,Christopher H., Isothermal imprint embossing system.
  16. Xu, Frank Y.; Watts, Michael P. C.; Stacey, Nicholas A., Materials for imprint lithography.
  17. Watts,Michael P. C.; Sreenivasan,Sidlgata V., Method for fabricating bulbous-shaped vias.
  18. Willson, Carlton Grant; Sreenivasan, Sidlgata V.; Bonnecaze, Roger T., Method for fabricating nanoscale patterns in light curable compositions using an electric field.
  19. Harper, Bruce M., Method of aligning a die and stamping a substrate for nano-imprint lithography.
  20. Choi, Byung-Jin; Sreenivasan, Sidlgata V.; Willson, Carlton Grant; Colburn, Mattherw E.; Bailey, Todd C.; Ekerdt, John G., Method of automatic fluid dispensing for imprint lithography processes.
  21. Previte Peter L. (Paterson NJ), Method of manufacturing a flexure suspension assembly.
  22. Rubin, Daniel I., Method of reducing pattern distortions during imprint lithography processes.
  23. Sreenivasan, Sidlgata V.; Watts, Michael P. C., Method to arrange features on a substrate to replicate features having minimal dimensional variability.
  24. Choi,Byung Jin; Xu,Frank Y.; Stacey,Nicholas A.; Truskett,Van Xuan Hong; Watts,Michael P. C., Method to reduce adhesion between a conformable region and a pattern of a mold.
  25. Truskett,Van N.; Mackay,Christopher J.; Choi,B. Jin, Method to reduce adhesion between a polymerizable layer and a substrate employing a fluorine-containing layer.
  26. Choi, Byung J.; Colburn, Matthew; Sreenivasan, S. V.; Willson, C. Grant; Bailey, Todd; Ekerdt, John, Methods for high-precision gap and orientation sensing between a transparent template and substrate for imprint lithography.
  27. Harper,Bruce M., Press die alignment.
  28. Treves, David; Dorsey, Paul C., Press system for nano-imprinting of recording media with a two step pressing method.
  29. Treves, David; Dorsey, Paul C., Press system with embossing foil free to expand for nano-imprinting of recording media.
  30. Treves, David; Dorsey, Paul C., Press system with embossing foil free to expand for nano-imprinting of recording media.
  31. Treves, David; Dorsey, Paul C.; Siu, Calvin Tue Chiu, Press system with interleaved embossing foil holders for nano-imprinting of recording media.
  32. Treves, David; Dorsey, Paul C.; Siu, Calvin Tue Chiu, Press system with interleaved embossing foil holders for nano-imprinting of recording media.
  33. Willson, Carlton Grant; Colburn, Matthew Earl, Step and flash imprint lithography.
  34. Sreenivasan,Sidlgata V.; Choi,Byung J.; Schumaker,Norman E.; Voisin,Ronald D.; Watts,Michael P. C.; Meissl,Mario J., Step and repeat imprint lithography processes.
  35. Choi,Byung J.; Sreenivasan,Sidlgata V., System for determining characteristics of substrates employing fluid geometries.
  36. Carroll Raymond (Andover MA) Ahn Byong-Ho (Wayland MA), System for electronically tuning and suppressing 2N rectification torques in a dynamically tuned free rotor gyroscope.
  37. Bailey, Todd; Choi, Byung J.; Colburn, Matthew; Sreenivasan, S. V.; Willson, C. Grant; Ekerdt, John, Template for room temperature, low pressure micro-and nano-imprint lithography.
  38. Katz Amnon (401 Forrest Hill La. Grand Prairie TX 75051), Tunable link.
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