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Remote center compliance system 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • G01B-005/25
출원번호 US-0732286 (1976-10-13)
발명자 / 주소
  • Watson
  • Paul C.
출원인 / 주소
  • The Charles Stark Draper Laboratory, Inc.
대리인 / 주소
    Iandiorio, Joseph S.
인용정보 피인용 횟수 : 73  인용 특허 : 1

초록

A remote center compliance system including means for establishing rotational motion about a center remote from the means for establishing the rotational motion and in two directions transverse to radii from the remote center.

대표청구항

대표청구항이 없습니다.

이 특허에 인용된 특허 (1)

  1. Johnson Elmer E. (622 Locust Road Sausalito CA 94965), Edge finder.

이 특허를 인용한 특허 (73)

  1. Kazerooni Homayoon (Minneapolis MN), Active compliant end-effector with force, angular position, and angular velocity sensing.
  2. Rebman Jack (Erie PA), Adjustable link-type insertion compliance device.
  3. Danmoto Shojiro (Ushiku JPX) Sato Hachiro (Abiko JPX) Kanno Fumio (Tsuchiura JPX), Alignment apparatus.
  4. Sreenivasan, Sidlgata V; Watts, Michael P. C.; Choi, Byung J.; Voisin, Ronald D., Alignment methods for imprint lithography.
  5. Choi,Byung Jin; Sreenivasan,Sidlgata V.; Johnson,Stephen C., Apparatus to control displacement of a body spaced-apart from a surface.
  6. Choi, Byung Jin; Sreenivasan, Sidlgata V.; Johnson, Stephen C., Apparatus to orientate a body with respect to a surface.
  7. Drake Samuel H. (Lexington MA) Simunovic Sergio N. (Newton MA), Compliance element for remote center compliance unit.
  8. Hailey Samuel I. (Fort Worth TX) Kaler ; Jr. George M. (Tarrant TX), Compliance mechanism.
  9. Brendamour David A. (Cincinnati OH), Compliant apparatus with remote smeared centers.
  10. Consales Emanuel J. (Winchester MA) Kondoleon Anthony (Tewksbury MA), Compliant assembly system with force sensor members.
  11. Prentakis Antonios E. (Cambridge MA), Compliant link.
  12. Xu,Frank Y.; Miller,Michael N.; Watts,Michael P. C., Composition for an etching mask comprising a silicon-containing material.
  13. De Fazio Thomas L. (Watertown MA), Deformable remote center compliance device.
  14. Dumargue Guy (Boulogne FRX) Huellec Jean-Yves (Fontenay-Aux-Roses FRX), Elastically connected, two-part tool support, particularly for a robot.
  15. Bye Jeffrey C. (Everett WA) Gabriel Mark F. (Renton WA), End-effector assembly for countersinking a predrilled bore.
  16. Hirabayashi Hisaaki (Yokohama JPX) Sugimoto Koichi (Yokohama JPX), Fitting device.
  17. Ruden, Shawn A., Fixture assembly.
  18. Vangal-Ramamurthy, Jambunathan; Vasudevan, Rahool, Flexure based compliance device for use with an assembly device.
  19. Choi, Byung J.; Sreenivasan, Sidlgata V., Flexure based macro motion translation stage.
  20. Choi, Byung Jin; Meissl, Mario J.; Sreenivasan, Sidlagata V.; Watts, Michael P. C., Formation of discontinuous films during an imprint lithography process.
  21. Ventura Luciano,ITX, Head for the linear dimension checking of mechanical pieces.
  22. Choi, Byung Jin; Sreenivasan, Sidlgata V.; Johnson, Stephen C., High precision orientation alignment and gap control stages for imprint lithography processes.
  23. Sreenivasan, Sidlgata V.; Choi, Byung J.; Colburn, Matthew; Bailey, Todd, High-resolution overlay alignment methods for imprint lithography.
  24. Sreenivasan,Sidlgata V.; Schumaker,Philip D., Imprint lithography template having opaque alignment marks.
  25. Rebman Jack (Erie PA), Insertion compliance device.
  26. Watson Paul C. (Brentwood NH), Instrumented remote center compliance device.
  27. Sorze, Fabio, Lockable elastic joint for anthropomorphous robot serving industrial machines, particularly for sheet metal machining machines.
  28. Consales Emanuel J. (Winchester MA), Locking system for a remote center compliance device.
  29. Drazan Pavel J. (Cardiff GBX), Manipulating unit.
  30. Xu, Frank Y.; Watts, Michael P. C.; Stacey, Nicholas A., Materials for imprint lithography.
  31. Derby Stephen J. (Brunswick NY), Mechanical closed loop robotic arm end effector positioning system.
  32. Joseph M. Schimmels, Method and apparatus for assembling rigid parts.
  33. Sugimoto Koichi (Hiratsuka JPX) Hirabayashi Hisaaki (Yokohama JPX) Arai Shinichi (Yokohama JPX) Sakaue Shiyuki (Yokohama JPX), Method and apparatus for controlling a robot utilizing force, position, velocity, spring constant, mass coefficient, and.
  34. Hyatt Robert J. (Stanford CA) Abbott Edward H. (Ann Arbor MI) Bush Robert E. (Rochester Hills MI) Shannon Francis J. (Northville MI), Method and apparatus for robotic transfer of workpieces.
  35. Watts,Michael P. C.; Sreenivasan,Sidlgata V., Method for fabricating bulbous-shaped vias.
  36. Willson, Carlton Grant; Sreenivasan, Sidlgata V.; Bonnecaze, Roger T., Method for fabricating nanoscale patterns in light curable compositions using an electric field.
  37. Choi, Byung-Jin; Sreenivasan, Sidlgata V.; Willson, Carlton Grant; Colburn, Mattherw E.; Bailey, Todd C.; Ekerdt, John G., Method of automatic fluid dispensing for imprint lithography processes.
  38. Choi,Byung Jin; Sreenivasan,Sidlgata V.; Johnson,Stephen C., Method of orientating a template with respect to a substrate in response to a force exerted on the template.
  39. Rubin, Daniel I., Method of reducing pattern distortions during imprint lithography processes.
  40. Sreenivasan, Sidlgata V.; Watts, Michael P. C., Method to arrange features on a substrate to replicate features having minimal dimensional variability.
  41. Choi,Byung Jin; Xu,Frank Y.; Stacey,Nicholas A.; Truskett,Van Xuan Hong; Watts,Michael P. C., Method to reduce adhesion between a conformable region and a pattern of a mold.
  42. Truskett,Van N.; Mackay,Christopher J.; Choi,B. Jin, Method to reduce adhesion between a polymerizable layer and a substrate employing a fluorine-containing layer.
  43. Choi, Byung J.; Colburn, Matthew; Sreenivasan, S. V.; Willson, C. Grant; Bailey, Todd; Ekerdt, John, Methods for high-precision gap and orientation sensing between a transparent template and substrate for imprint lithography.
  44. Gustavson Richard E. (Wellesley Hills MA) Selvage Craig C. (Lexington MA) Whitney Daniel E. (Arlington MA), Operator member erection system and method.
  45. De Fazio Thomas L. (Watertown MA), Passive mating system.
  46. Cheng Chi-Cheng,TWX ; Chen Gin-Shan,TWX, Passive multiple remote center compliance device.
  47. Higuchi Toshiro (Yokohama JPX), Precision automatic assembly apparatus, with electromagnetically supported member and assembly method using same.
  48. Cusack Robert F. (Grosse Pointe Park MI), Precision parallel mechanical float.
  49. Cusack Robert F. (Grosse Pointe Park MI), Precision parallel mechanical float.
  50. Brenner,Kurt; Jenisch,Walter; Stacklies,Horst; Roth,Roland, Probe head for a coordinate measuring machine.
  51. Watson Paul C. (Assembly Associates ; P.O. Box 45 Arlington Heights MA 02175), Remote axis admittance system.
  52. Joo, Sang-wan, Remote center compliance device.
  53. Zafred Paolo R. (Pittsburgh PA) Veronesi Luciano (O\Hara Township ; Allegheny County PA), Remote center compliance device.
  54. Joo, Sang-Wan, Remote center compliance device with measuring sensor.
  55. Whitney, Daniel E., Remote center compliance gripper system.
  56. Sang-cheol Won KR; Sang-cheol Lee KR, Remote center compliance system having variable center.
  57. Choi,Byung Jin; Sreenivasan,Sidlgata V.; Johnson,Stephen C., Remote center compliant flexure device.
  58. Stoianovici,Dan; Whitcomb,Louis L.; Mazilu,Dumitru; Taylor,Russell H.; Kavoussi,Louis R., Remote center of motion robotic system and method.
  59. Sangwan Joo,JPX, Remote elastic center machine.
  60. Weiss, Kevin B., Robot compliance device.
  61. Stoianovici, Dan; Mazilu, Dumitru; Kavoussi, Louis R., Robot for computed tomography interventions.
  62. Gabrielli Gino (Paris FRX), Robot wrist.
  63. Ito Genji (Funabashi JPX) Tsunoo Mitsunobu (Narashino JPX) Fukuchi Fumio (Funabashi JPX), Screw fastening apparatus.
  64. De Fazio Thomas L. (Watertown MA), Single stage remote center compliance device.
  65. Schimmels Joseph M. ; Huang Shuguang, Spatial parallel compliant mechanism.
  66. Schimmels Joseph M. ; Huang Shuguang, Spatial parallel compliant mechanism.
  67. Willson, Carlton Grant; Colburn, Matthew Earl, Step and flash imprint lithography.
  68. Sreenivasan,Sidlgata V.; Choi,Byung J.; Schumaker,Norman E.; Voisin,Ronald D.; Watts,Michael P. C.; Meissl,Mario J., Step and repeat imprint lithography processes.
  69. Stoianovici,Daniel; Patriciu,Alexandru; Kavoussi,Louis; Fichtinger,Gabor, System and method for laser based computed tomography and magnetic resonance registration.
  70. Choi,Byung J.; Sreenivasan,Sidlgata V., System for determining characteristics of substrates employing fluid geometries.
  71. Bailey, Todd; Choi, Byung J.; Colburn, Matthew; Sreenivasan, S. V.; Willson, C. Grant; Ekerdt, John, Template for room temperature, low pressure micro-and nano-imprint lithography.
  72. Matheson Ronald R. (Utica MI) Hucul Daniel E. (Bloomfield Hills MI) Burkhardt James (Plymouth MI) Schepke Joseph W. (Utica MI), Variable compliance device.
  73. McCormick Peter E. (Dallas TX) Culbertson Timothy D. (Little Elm TX) Autry ; Jr. Walter D. (Keene TX), Variable compliance device.
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