초록 ▼

A method for producing a cooled sputtering target assembly is described. The resultant target is also described. The material to be sputtered is provided in the form of powder which is hot isostatically pressed in a toroidal metallic container under conditions which promote compaction and bonding of

A method for producing a cooled sputtering target assembly is described. The resultant target is also described. The material to be sputtered is provided in the form of powder which is hot isostatically pressed in a toroidal metallic container under conditions which promote compaction and bonding of the powder particles to form a fully dense material. The container is then partially removed from the target material except for a remnant around the outer surface. A cooling jacket is then fabricated and attached to the remnant of the container.

대표청구항 ▼

A method for fabricating a fluid cooled sputtering target including the steps of: a. providing a toroidal container formed from a ductile metal; b. filling the container with a powder material whose composition is that of the desired target; c. evacuating the filled container and sealing it so as to

A method for fabricating a fluid cooled sputtering target including the steps of: a. providing a toroidal container formed from a ductile metal; b. filling the container with a powder material whose composition is that of the desired target; c. evacuating the filled container and sealing it so as to maintain the powder filled container in an evacuated condition; d. isostatically compacting the container at an elevated temperature selected so that the powder is densified and bonded to the container; e. removing the container from the densified powder material except for a remnant around the outer periphery; f. joining a fluid cooling means to the outer contour remnant.