IPC분류정보
| 국가/구분 |
United States(US) Patent
등록
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| 국제특허분류(IPC7판) |
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| 출원번호 |
US-0814827
(1977-07-12)
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| 우선권정보 |
CH-0009138 (1976-07-16) |
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발명자
/ 주소 |
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| 출원인 / 주소 |
- Ciba-Geigy Corporation (Ardsley NY 02)
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| 인용정보 |
피인용 횟수 :
17 인용 특허 :
0 |
초록
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Bis-tetrazoles wherein the two tetrazole rings are bridged by a direct bond or a divalent organic residue in 5,5′-position or in 1,1′-position have been found to be suitable as blowing agents for thermoplastic resins. They decompose at temperatures of about 230 to 300°C. and therefore can be used fo
Bis-tetrazoles wherein the two tetrazole rings are bridged by a direct bond or a divalent organic residue in 5,5′-position or in 1,1′-position have been found to be suitable as blowing agents for thermoplastic resins. They decompose at temperatures of about 230 to 300°C. and therefore can be used for the expansion of resins which are processed at such temperatures, for instance polypropylene, polycarbonates, polyphenyleneoxides or polyamides. Preferred are bis-tetrazoles bridges by aliphatic or araliphatic residues. The expansion can be carried out in an extruder or an injection moulding device.
대표청구항
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Process for foaming a thermoplastic resin, which process comprises adding to the thermoplast 0.05 to 5% by weight of a bis-tetrazole of the formula I, II or III [Figure] I [Figure] II [Figure] III wherein R1 represents hydrogen, C1-C4-alkyl, C5-C6-cycloalkyl, phenyl, naphthyl, or phenyl substituted
Process for foaming a thermoplastic resin, which process comprises adding to the thermoplast 0.05 to 5% by weight of a bis-tetrazole of the formula I, II or III [Figure] I [Figure] II [Figure] III wherein R1 represents hydrogen, C1-C4-alkyl, C5-C6-cycloalkyl, phenyl, naphthyl, or phenyl substituted by C1-C4-alkyl, C1-C4-alkoxy or halogen, and R represents a direct bond, or a straight-chain or branched-chain alkylene group having 1-10 C atoms, which can be substituted by phenyl, benzyl, halogen, nitro, hydroxy, C1-C4-alkoxy, formyl, C2-C5-alkanoyl, benzoyl or cyclohexylcarbonyl, or R represents an alkylene group which has 2-8 C atoms and which is interrupted by －O－, －S－, －SO2－or －NY－, wherein Y represents hydrogen, C1-C4-alkyl, phenyl, naphthyl, cyclohexyl, benzyl, or a group of the formula R2CO－or R2SO2－, and R2 represents C1-C4-alkyl, phenyl, or phenyl substituted by C1-C4-alkyl, halogen or C1-C4-alkoxy, or R represents an alkenylene or alkynylene group each having 2-8 C atoms, or a radical of the formula －Ar－(CH2)m－, －(CH2)m－Ar－(CH2)m－, －(CH2)m－O－Ar－O－(CH2)m－, －(CH2)m－NH－Ar－NH－(CH2)m－, －(CH2)m－Ar－X－Ar－(CH2)m－, －(CH2)m－O－Ar－X－Ar－O－(CH2)m－or －(CH2)m－NH－Ar－X－Ar－NH－(CH2)m－, wherein m represents 1 or 2, and Ar represents a phenylene or naphthylene group, which can be substituted by halogen, NO2, alkyl or alkoxy each having 1-4 C atoms, and X represents a direct bond, －O－, －S－, －SO2－, －CH2－, －C(CH3)2 or －CO－, or R represents a bivalent heterocyclic radical of the formula －(CH2)n－Het－(CH2)n－, wherein n represents 0, 1 or 2, and Het represents a 5- or 6-membered, non-condensed or condensed hetero ring having 1 to 3 N, O or S atoms, or a radical of the formula [Figure] or R represents in the formula III a group of the formula －Ar－or －Ar－X－Ar－or, if R1 is not hydrogen, represents also in the formula I or II a group of the formula －Ar－or －Ar－X－Ar－; and subsequently heating the mixture.
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