초록 ▼

A continuous gas plasma etching apparatus comprising a reaction chamber having an inlet means and an outlet means, an activation portion disposed at a distance from said reaction chamber, a distributor means for uniformly supplying said reaction chamber with an activated gas produced in said activat

A continuous gas plasma etching apparatus comprising a reaction chamber having an inlet means and an outlet means, an activation portion disposed at a distance from said reaction chamber, a distributor means for uniformly supplying said reaction chamber with an activated gas produced in said activation proton, an exhaust means for exhausting the gas inside said reaction chamber from a plurality of gas outlets, a conveyer means disposed inside said reaction chamber to transfer workpieces from the inlet means side to the outlet means side in said reaction chamber, a feeding chamber disposed on the inlet means side of said reaction chamber to contain the workpieces, a workpiece feeding means for feeding the workpieces in said feeding chamber from said inlet means to said conveyer means, a first shutter means for opening and shutting said inlet means, a receiving chamber disposed on the outlet means side of said reaction chamber to receive the workpieces treated with said activated gas in said reaction chamber, a treated workpiece delivering means for introducing the treated workpieces in said reaction chamber into said receiving chamber through said outlet means, and a second shutter means for opening and shutting said outlet means.

대표청구항 ▼

A continuous gas plasma etching apparatus comprising a reaction chamber having an inlet means and an outlet means; an activation portion disposed at a distance from said reaction chamber; a distributor means for uniformly supplying said reaction chamber with an activated gas produced in said activat

A continuous gas plasma etching apparatus comprising a reaction chamber having an inlet means and an outlet means; an activation portion disposed at a distance from said reaction chamber; a distributor means for uniformly supplying said reaction chamber with an activated gas produced in said activation portion; an exhaust means for exhausting the gas inside said reaction chamber from a plurality of gas outlets; a conveyer means disposed inside said reaction chamber to transfer workpieces from the inlet means side to the outlet means side in said reaction chamber; a feeding chamber disposed on the inlEt means side of said reaction chamber to contain the workpieces; a workpiece feeding means for feeding the workpieces in said feeding chamber to said conveyer means by means of said inlet means; a first shutter means for opening and shutting said inlet means; a receiving chamber disposed on the outlet means side of said reaction chamber to receive the workpieces treated with said activated gas in said reaction chamber; a treated workpiece delivering means for introducing the treated workpieces in said reaction chamber into said receiving chamber through said outlet means; and a second shutter means for opening and shutting said outlet means.