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Method of improving the adherence of metallic conductive lines on polyimide layers 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • B05D-003/02
  • B05D-001/38
출원번호 US-0825626 (1977-08-18)
우선권정보 DE-2638799 (1976-08-27)
발명자 / 주소
  • Bahrle Dieter (Schoenaich DEX) Frasch Peter (Boeblingen DEX) Konig Wilfried (Gaertringen DEX) Schwerdt Friedrich (Sindelfingen DEX) Thelen Ursula (Sindelfingen DEX) Vogtmann Theodor (Holzgerlingen DE
출원인 / 주소
  • International Business Machines Corporation (Armonk NY 02)
인용정보 피인용 횟수 : 38  인용 특허 : 1

초록

A method of improving the adherence of conductive metallic lines to a polyimide resin layer by incompletely curing the polyimide resin prior to deposition of the metal layer, and subsequently completely curing the polyimide resin layer after the metal layer is deposited.

대표청구항

A method of fabricating a metal layer having improved adhesion on a polyimide resin surface layer comprising: depositing a layer of polyamidocarboxylic acid on a substrate partially curing said layer of polyamidocarboxylic acid vapor depositing a blanket layer of metal on the resultant partially cur

이 특허에 인용된 특허 (1)

  1. Hecht James Lee (Richmond VA), Process for anion removal from orthophosphate coatings.

이 특허를 인용한 특허 (38)

  1. Hillarion Braun, Adhesion promotion.
  2. Bergkessel Nicholas E. ; Bergstresser Tad ; Chiang Shiuh-Kao ; Prokop Mary K. ; Russell David B., Adhesiveless flexible laminate and process for making adhesiveless flexible laminate.
  3. McDermott, Brian J.; McGowan, Daniel; Spotts, Jr., Ralph Leo; Tryzbiak, Sid, Electrical device with teeth joining layers and method for making the same.
  4. Mittal Kashmiri L. ; Roldan Judith Marie ; Sambucetti Carlos Juan ; Saraf Ravi F., Enhanced adhesion between a vapor deposited metal and an organic polymer surface exhibiting tailored morphology.
  5. Ho Paul S. C. (Chappaqua NY) Hahn Peter O. (Burghausen NY DEX) Lefakis Harry (Shrub Oak NY) Rubloff Gary W. (Katonah NY), Enhanced adhesion between metals and polymers.
  6. Altman Leonard F. (Coral Springs FL) Moore Kevin D. (Schaumburg IL) Shurboff John D. (Palm City FL), Integrated circuit having polyimide/metal passivation layer and method of manufacture using metal lift-off.
  7. Kihara, Shuta; Kedo, Ko, Metal-clad laminate.
  8. Jones Carol R. (Binghamton NY) Susko Robin A. (Owego NY), Method for laminating organic materials via surface modification.
  9. Fineman Jonathan P. (Alburg VT) Kieny ; Jr. Leonard A. (Shelburne VT), Method of etching polyimide.
  10. Nakata Masao,JPX ; Kataoka Kosuke,JPX ; Nagano Hirosaku,JPX, Method of improving adhesive property of polyimide film and polymidefilm having improved adhesive property.
  11. Wiseman Charles D. (Cottage Grove WI) Theisen William M. (Madison WI), Method of making a flexible microcircuit.
  12. Gurol Ismail M. (Seattle WA), Method of making molded circuit board.
  13. Jeter John D. (Iowa Park TX) More Henry S. (Carmichael CA), Method of making well logging apparatus.
  14. Chang Kenneth (Hopewell Junction NY) Chiu George T. (Wappingers Falls NY) Hoeg ; Jr. Anthony (Cary NC) Lee Linda H. (Poughkeepsie NY), Planar metal interconnection system and process.
  15. Durand David (Portsmouth RI), Printed circuit.
  16. Durand David (Portsmouth RI), Printed circuit and method of forming same.
  17. Tarasevich Barbara J. ; Rieke Peter C., Process for depositing thin film layers onto surfaces modified with organic functional groups and products formed thereb.
  18. Lin, Mou-Shiung, Top layers of metal for high performance IC's.
  19. Lin, Mou-Shiung, Top layers of metal for high performance IC's.
  20. Lin, Mou-Shiung, Top layers of metal for high performance IC's.
  21. Lin, Mou-Shiung, Top layers of metal for high performance IC's.
  22. Lin, Mou-Shiung, Top layers of metal for high performance IC's.
  23. Lin, Mou-Shiung, Top layers of metal for high performance IC's.
  24. Lin, Mou-Shiung, Top layers of metal for high performance IC's.
  25. Lin,Mou Shiung, Top layers of metal for high performance IC's.
  26. Lin,Mou Shiung, Top layers of metal for high performance IC's.
  27. Lin,Mou Shiung, Top layers of metal for high performance IC's.
  28. Lin,Mou Shiung, Top layers of metal for high performance IC's.
  29. Lin,Mou Shiung, Top layers of metal for high performance IC's.
  30. Lin,Mou Shiung, Top layers of metal for high performance IC's.
  31. Lin,Mou Shiung, Top layers of metal for high performance IC's.
  32. Lin,Mou Shiung, Top layers of metal for high performance IC's.
  33. Lin,Mou Shiung, Top layers of metal for high performance IC's.
  34. Lin,Mou Shiung, Top layers of metal for high performance IC's.
  35. Lin,Mou Shiung, Top layers of metal for high performance IC's.
  36. Lin,Mou Shiung, Top layers of metal for high performance IC's.
  37. Lin,Mou Shiung, Top layers of metal for high performance IC's.
  38. Jeter John D. (Iowa Park TX) More Henry S. (Carmichael CA), Well logging apparatus with replaceable sensor carrying insulating sleeve disposed in rotation restrained position aroun.
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