초록 ▼

A method for forming on a substrate a relatively thick, densified, essentially non-porous, fine-grained layer of a non-conductive material. The method comprises the steps of vapor depositing onto such substrate a starting material while simultaneously bombarding the substrate with ions of a preselec

A method for forming on a substrate a relatively thick, densified, essentially non-porous, fine-grained layer of a non-conductive material. The method comprises the steps of vapor depositing onto such substrate a starting material while simultaneously bombarding the substrate with ions of a preselected gas. During the process, the substrate is disposed in the atmosphere of a preselected gas, and an RF field is established between the substrate and an opposing electrode structure to produce a plasma of such gas in the vicinity of the substrate. The substrate is electrically biased to attract ions from the plasma, such ions serving to impact on the substrate and thereby densify the vapor deposit thereon. Preferably, the starting material is one which reacts with the gas ions to form the desired material on the substrate; alternatively, the starting material comprises the desired material, in which case the gas plasma preferably comprises an inert gas.

대표청구항 ▼

A method for forming on the surface of a substrate a dense, photoconductive layer of stoichiometrically balanced lead oxide, said method comprising the steps of: (a) disposing the substrate in an atmosphere of a gas comprising a mixture of oxygen and an inert gas; (b) establishing an RF electric fie

A method for forming on the surface of a substrate a dense, photoconductive layer of stoichiometrically balanced lead oxide, said method comprising the steps of: (a) disposing the substrate in an atmosphere of a gas comprising a mixture of oxygen and an inert gas; (b) establishing an RF electric field in the vicinity of the substrate surface to produce a plasma of the gas in the vicinity of the substrate surface, such plasma comprising a mixture of positively charged gas ions and electrons; (c) electrically biasing the substrate to cause the positively charged gas ions to bombard the substrate surface; and (d) depositing on the substrate surface a vapor of lead oxide while the surface undergoes bombardment by said gas ions.