초록

Photohardenable compositions are described comprising a halogenated oligomeric ester, acrylate or methacrylate monomer compatible with the ester, free-radical generating initiator, epoxide, and cationic initiator. The compositions are particularly useful as plating and etching resists.

대표청구항 ▼

A photohardenable composition comprising: (a) about 10 to 80 weight percent of a halogenated oligomeric ester having a molecular weight of less than about 10,000 and a content of halogen attached to carbon of an sp2 electronic configuration of about 19 to 55 weight percent; (b) about 10 to 80 weight

A photohardenable composition comprising: (a) about 10 to 80 weight percent of a halogenated oligomeric ester having a molecular weight of less than about 10,000 and a content of halogen attached to carbon of an sp2 electronic configuration of about 19 to 55 weight percent; (b) about 10 to 80 weight percent of an acrylate or methacrylate monomer compatible with (a); (c) about 0.2 to 10 weight percent of a free radical generating initiator activatible by actinic light or electron beam irradiation; (d) about 2 to 20 weight percent of a compound having an average epoxide functionality of about 1 to 1.8; (e) about 1 to 10 weight percent of a cationic initiator activatible by actinic light or electron beam irradiation.