[특허]Phenol-free photoresist stripper

[미국특허] Phenol-free photoresist stripper 원문보기

IPC분류정보
국가/구분	United States(US) Patent 등록
국제특허분류(IPC7판)	C23G-005/02 G03C-011/12
출원번호	US-0740154 (1976-11-08)
발명자 / 주소	Vander Mey John E. (Stirling NJ)
출원인 / 주소	Allied Chemical Corporation (Morris Township, Morris County NJ 02)
인용정보	피인용 횟수 : 21 인용 특허 : 2

초록 ▼

Stripping solutions, free from phenol compounds, comprising at least 30 weight percent of an unsubstituted or alkyl substituted aryl sulfonic acid have been found effective for removal of organic polymeric substances from inorganic substrates. The novel compositions comprise 30-80 percent of one or more of the sulfonic acids in admixture with chlorinated aryl compounds, alkylaryl compounds having 1-14 alkyl carbons, an isoparaffinic hydrocarbon, or mixtures thereof.

대표청구항 ▼

A stripping solution for removing polymeric organic substances from an inorganic substrate, said solution being essentially free of phenol compounds and comprising: 30-80 weight percent of an aryl sulfonic acid having the formula [Figure] wherein R is hydrogen or an alkyl group containing 1 to 14 carbon atoms or mixtures thereof, and 20-70 weight percent of a solvent which includes a chlorinated aryl compound of the formula [Figure] wherein R1, R2 and R3 are each independently H, Cl or alkyl, and R1, R2 and R3 together have 0-5 carbons. A stripping solution for removing polymeric organic substances from an inorganic substrate, said solution being essentially free of phenol compounds and comprising: 30-80 weight percent of a mixture or aryl sulfonic acids of the formula [Figure] wherein R is hydrogen or an alkyl group containing 1 to 14 carbon atoms, said mixture of aryl sulfonic acids including dodecylbenzene sulfonic acid and toluene sulfonic acid, in admixture with 20-70 weight percent of a solvent which is chlorinated aryl compound of the formula [Figure] where R1, R2 and R3 are each independently H, Cl or alkyl, and R1, R2 and R3 together have 0-5 carbons; an isoparaffinic hydrocarbon having an average molecular weight between 150 and 210 and a boiling point between 160°and 220°C.; an alkylaryl compound of the formula [Figure] where R1 is an alkyl group, R2, R3 and R4 are independently hydrogen or an alkyl group and R1, R2, and R3 and R4 together contain 1-14 carbon atoms; or mixtures thereof; said composition including 10-60 weight percent of at least one of said chlorinated aryl compounds and 10-60 weight percent of at least one of said alkylaryl compounds.

이 특허에 인용된 특허 (2) 인용/피인용 타임라인 분석

Neisius ; Karl Heinz ; Baumer ; Wilhelm, Method for stripping photolacquers.
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Vandermey John E. (Stirling NJ) Jones Harold F. (Dover NJ) Dill Harold T. (Andover MA), Photoresist stripper rinse.
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이 특허를 인용한 특허 (21) 인용/피인용 타임라인 분석

Lee, Wai Mun, Alkanolamine semiconductor process residue removal composition and process.
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Wai Mun Lee, Alkanolamine semiconductor process residue removal process.
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Egbe, Matthew I.; Peters, Darryl W., Aqueous stripping and cleaning composition.
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Egbe, Matthew I.; Peters, Darryl W., Aqueous stripping and cleaning composition.
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Dingess John A. ; Osmanski Frank A., Cleaning compositions and methods.
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Lee,Wai Mun, Cleaning compositions and methods of use thereof.
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Lee Wai Mun ; Pittman ; Jr. Charles U. ; Small Robert J., Cleaning solutions including nucleophilic amine compound having reduction and oxidation potentials.
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Lee Wai Mun ; Pittman ; Jr. Charles U. ; Small Robert J., Cleaning solutions including nucleophilic amine compound having reduction and oxidation potentials.
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Lee,Wai Mun; Pittman, Jr.,Charles U.; Small,Robert J., Cleaning solutions including nucleophilic amine compound having reduction and oxidation potentials.
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Lee,Wai Mun; Pittman, Jr.,Charles U.; Small,Robert J., Cleaning solutions including nucleophilic amine compound having reduction and oxidation potentials.
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Lee,Wai Mun; Pittman, Jr.,Charles U.; Small,Robert J., Cleaning solutions including nucleophilic amine compound having reduction and oxidation potentials.
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Hisamoto Iwao (Suita JPX) Omure Yukio (Takatsuki JPX), Composition for cleaning surface of substrate.
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Kobayashi Masakazu (Kawasaki JPX) Asaumi Shingo (Fujisawa JPX) Yokota Akira (Yamato JPX) Nakane Hisashi (Yokohama JPX), Containing an arylsulfonic acid, a phenol and a naphalenic solvent.
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Lee Wai Mun ; Pittman ; Jr. Charles U. ; Small Robert J., Method of removing etching residue.
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Armant Richard G. (Vestal NY) Arrington Edward L. (Owego NY) Bhatt Anilkumar C. (Johnson City NY) Egleton Donald M. (Endicott NY) Ortloff Frederick M. (Binghamton NY) Sniezek Joseph J. (Endwell NY) W, Phenolic-free stripping composition and use thereof.
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Lee Wai M. (Milpitas CA), Photoresist stripping composition and method.
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Ward Irl E. (1526 Leon Dr. Hatfield PA 19440) Michelotti Francis W. (3560 Southwood Dr. Easton PA 18042), Photoresist stripping compositions.
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Settineri William J. (Midland MI) Klassen Harold E. (Midland MI) Tolly Milton C. (Hope MI), Process for the removal of carbon from solid surfaces.
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Egbe, Matthew I.; Legenza, Michael Walter; Durham, Dana L., Semi-aqueous stripping and cleaning composition containing aminobenzenesulfonic acid.
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Aszman Harry W. (43 Baird Rd. Englishtown NJ 07726) Buck Charles E. (3 Lockward Rd. Caldwell NJ 07006), Solid detergent cleaning composition, reusable cleaning pad containing same and method of manufacture.
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Sizensky Joseph J. (Seekonk MA), Stripping composition and method of using the same.
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IPC	Description
A	생활필수품
A62	인명구조; 소방(사다리 E06C)
A62B	인명구조용의 기구, 장치 또는 방법(특히 의료용에 사용되는 밸브 A61M 39/00; 특히 물에서 쓰이는 인명구조 장치 또는 방법 B63C 9/00; 잠수장비 B63C 11/00; 특히 항공기에 쓰는 것, 예. 낙하산, 투출좌석 B64D; 특히 광산에서 쓰이는 구조장치 E21F 11/00)
A62B-1/08	.. 윈치 또는 풀리에 제동기구가 있는 것

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[미국특허] Phenol-free photoresist stripper 원문보기