[미국특허]
Method of water-solubilizing high performance polyether epoxide resins, the solubilized resins and thermoset, hydrophobi
원문보기
IPC분류정보
국가/구분
United States(US) Patent
등록
국제특허분류(IPC7판)
B05D-003/02
C08L-063/00
출원번호
US-0019958
(1979-03-12)
발명자
/ 주소
Martin Patrick H. (Danville CA)
출원인 / 주소
The Dow Chemical Company (Midland MI 02)
인용정보
피인용 횟수 :
35인용 특허 :
1
초록▼
Hydrophobic, thermoset resins having highly desirable properties in coatings applications can be prepared from novel, water-thinnable, base-neutralized, acidic reaction products of orthophosphoric acid with hydrophobic, nominally-difunctional polyether epoxide resins having average epoxide equivalen
Hydrophobic, thermoset resins having highly desirable properties in coatings applications can be prepared from novel, water-thinnable, base-neutralized, acidic reaction products of orthophosphoric acid with hydrophobic, nominally-difunctional polyether epoxide resins having average epoxide equivalent weights (EEW) of from about 172 to about 5500. The phosphate groups in these products, when formed with fugitive bases, are thermally decomposable to yield resins which are not rapidly self-converting as such but are rapidly heat convertible in admixture with any of several types of curing agents. The functional groups responsible for water solubilization are utilized (and reacted out) in curing of the resins. The invention provides a method of utilizing hydrophobic, high performance polyether epoxide type polymers in aqueous coating systems having the ability to wet metal surfaces.
대표청구항▼
A process for making water-thinnable, base-neutralized, acidic resins which are convertible to hydrophobic, high performance, thermoset resins, said process comprising: (I) reacting orthophosphoric acid with a polyether epoxide resin E1 consisting essentially of molecules of the formula [Figure] (a)
A process for making water-thinnable, base-neutralized, acidic resins which are convertible to hydrophobic, high performance, thermoset resins, said process comprising: (I) reacting orthophosphoric acid with a polyether epoxide resin E1 consisting essentially of molecules of the formula [Figure] (a) [Figure] or [Figure] (p) [Figure] wherein Q, independently, in each occurrence, is [Figure] n is an integer of from 0 to 40, r is zero, 1 or 2 and, independently in each occurrence; R1 is H, methyl or ethyl, R2 is －Br, －Cl or a C1 to C4 alkyl or alkenyl group, R3 is a C1-C4 alkylene or alkenylene group, >C(CF3)2, －CO－, －SO2－, －S－, －O－or a valence bond, R4 is －Br, －Cl or a C1 to C4 alkyl or alkenyl group; and R5 is H or alkyl of 1 to 12 carbons, said reaction being carried out by contacting E1 with an orthophosphoric acid source material and from 0 to about 25 molecular proportions of water per molecular proportion of H3PO4 provided by said source material, until the fraction of the oxirane groups in E1 converted is such that when the resulting product is at least partially salified with a base, an aqueous dispersion which contains essentially no co-solvents or dispersing agents can be formed from it, the amount of orthophosphoric acid included as such in said source material, or obtainable therefrom by hydrolysis, being such as to provide from about 0.3 to about 2.8 P-OH hydroxyl groups per oxirane group, and (II) salifying the resultant reaction product with at least sufficient of a base to render it water-thinnable.
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