초록 ▼

A process and apparatus for thermally decomposing silicon containing gas for deposition on fluidized nucleating silicon seed particles is disclosed. Silicon seed particles are produced in a secondary fluidized reactor by thermal decomposition of a silicon containing gas. The thermally produced silic

A process and apparatus for thermally decomposing silicon containing gas for deposition on fluidized nucleating silicon seed particles is disclosed. Silicon seed particles are produced in a secondary fluidized reactor by thermal decomposition of a silicon containing gas. The thermally produced silicon seed particles are then introduced into a primary fluidized bed reactor to form a fluidized bed. Silicon containing gas is introduced into the primary reactor where it is thermally decomposed and deposited on the fluidized silicon seed particles. Silicon seed particles having the desired amount of thermally decomposed silicon product thereon are removed from the primary fluidized reactor as ultra pure silicon product. An apparatus for carrying out this process is also disclosed.

대표청구항 ▼

An apparatus for producing silicon by thermally decomposing a silicon containing gas in the presence of fluidized nucleating seed particles of silicon comprising: a primary fluidized bed reactor defining a primary fluidized reactor zone; seed particle introduction means for introducing seed particle

An apparatus for producing silicon by thermally decomposing a silicon containing gas in the presence of fluidized nucleating seed particles of silicon comprising: a primary fluidized bed reactor defining a primary fluidized reactor zone; seed particle introduction means for introducing seed particles of silicon into said primary fluidized reactor zone; means for introducing a fluidizing gas into said primary fluidized reactor zone to maintain said silicon particles in a fluidized suspension; means for introducing a silicon containing gas into said primary fluidized reactor zone; means for heating said primary fluidized reactor zone to a temperature sufficient to thermally decompose the silicon in said silicon containing gas to elemental silicon for deposition on said silicon seed particles; means for removing excess fluidizing gas, unreacted silicon containing gas, reaction by-product gases and any entrained silicon particles therein from said primary fluidized reactor zone; means for removing silicon seed particles having thermally decomposed silicon product thereon from said primary fluidized reactor zone; and seed source means for supplying silicon seed particles to said seed particle introduction means, said seed source means including seed reactor means for thermally decomposing a seed generating gas containing silicon to form precursor silicon seed particles, said seed reactor having porous walls defining a pyrolysis seed reactor zone; means for introducing said seed generating gas containing silicon into said pyrolysis seed reactor zone; protective gas means for passing an inert gas through said porous reactor walls to provide a protective inert gas boundary to prevent deposition of silicon on said porous reactor walls; means for heating said pyrolysis seed reactor to a temperature sufficient to thermally decompose said seed generating gas containing silicon to form precursor silicon seed particles including a heat generating element disposed internally within said pyrolysis seed reactor zone and including means for providing a protective, inert gas boundary surrounding said heat generating element to prevent contact of silicon with said heat generating element; means for removing said precursor silicon seed particles from said pyrolysis seed reactor zone; and means for transporting said precursor silicon seed particles to said seed particle introduction means for introduction into said primary fluidized reactor zone as said silicon seed particles.