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[미국특허] Removal of CO2 and/or H2S and/or COS from gases containing these constituents 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • B01D-053/34
출원번호 US-0177615 (1980-08-13)
우선권정보 DE-2551717 (1975-11-18)
발명자 / 주소
  • Appl Max (Dannstadt-Schauernheim DEX) Wagner Ulrich (Limburgerhof DEX) Henrici Hans J. (Mannheim DEX) Kuessner Klaus (Heuchelheim DEX) Volkamer Klaus (Frankenthal DEX) Fuerst Ernst (Neustadt DEX)
출원인 / 주소
  • BASF Aktiengesellschaft (DEX 03)
인용정보 피인용 횟수 : 141  인용 특허 : 2

초록

An aqueous solution containing from 0.81 to 1.3 moles of piperazine per liter is used as a washing agent for removing impurities such as H2S, CO2 and COS from gases. Piperazine can also be used, in amounts of up to 0.8 mole per liter, together with physical or chemical solvents, to accelerate the ab

대표청구항

In a process for removing CO2, H2S or both as constituents from gases by washing the gases with an aqueous solution of a scrubbing liquid and subsequently regenerating the scrubbing liquid, the improvement which comprises: using a scrubbing liquid which contains (a) from about 0.05 to 0.8 mole/l of

이 특허에 인용된 특허 (2) 인용/피인용 타임라인 분석

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  2. Sykes ; Jr. James A. (Houston TX), Selective removal of sulfur compounds from acid gas mixtures containing significant quantities of carbonyl sulfide.

이 특허를 인용한 특허 (141) 인용/피인용 타임라인 분석

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