초록 ▼

An apparatus for automatic semi-batch sheet treatment of wafers such as high-purity silicon semiconductor wafers by plasma reaction is disclosed. The apparatus comprises a wafer carrying mechanism, a reaction chamber with an opening at the bottom, a wafer table disposed beneath the opening and provi

An apparatus for automatic semi-batch sheet treatment of wafers such as high-purity silicon semiconductor wafers by plasma reaction is disclosed. The apparatus comprises a wafer carrying mechanism, a reaction chamber with an opening at the bottom, a wafer table disposed beneath the opening and provided with a sub-table for mounting the wafer, and control devices for driving the above elements in linkage motion. The wafer carrying mechanism is substantially composed of a conveyor for carrying a wafer to be treated, a pair of open-close type wafer carrying wire conveyors which are spaced in parallel at a certain distance and open and close in linkage motion so that the wafer table may pass vertically therethrough to be fixed vacuum-tightly to the reaction chamber, a mechanism for opening and closing the wire conveyors and a treated wafer carrying conveyor. The subtable is vertically movable and capable of passing the wire conveyors when closed.

대표청구항 ▼

An apparatus for the automatic sheet by sheet semibatch treatment of a wafer by plasma reaction, which apparatus comprises wafer carrying means substantially comprising along a horizontal longitudinal axis a conveyor for carrying a wafer to be treated, a pair of open-close type wafer carrying wire c

An apparatus for the automatic sheet by sheet semibatch treatment of a wafer by plasma reaction, which apparatus comprises wafer carrying means substantially comprising along a horizontal longitudinal axis a conveyor for carrying a wafer to be treated, a pair of open-close type wafer carrying wire conveyors being parallel spaced at a certain distance, a means for opening and closing the wafer carrying wire conveyors operatively associated therewith, and a treated wafer carrying conveyor; a reaction chamber with an opening at the bottom disposed above wafer carrying wire conveyors; a wafer table disposed beneath the opening of the reaction chamber, vertically movable to be fixed vacuum-tightly to the opening of the reaction chamber at an uppermost position; a sub-table which is fittable vacuum-tightly in the center of the wafer table and is vertically movable separately therefrom; elevator means for vertically moving the wafer table and the sub-table to take the wafer mounted thereon into and out of the reaction chamber; and control means for driving the wafer carrying means, the reaction chamber, the wafer table and the sub-table in linkage motion.