[특허]Low shock transmissive antechamber seal mechanisms for vacuum chamber type semi-conductor wafer electron beam writing ap

[미국특허] Low shock transmissive antechamber seal mechanisms for vacuum chamber type semi-conductor wafer electron beam writing ap 원문보기

IPC분류정보
국가/구분	United States(US) Patent 등록
국제특허분류(IPC7판)	C23C-013/08
출원번호	US-0219657 (1980-12-24)
발명자 / 주소	Mack Alfred (Poughkeepsie NY) O\Neill Brian C. (Millbrook NY) Penzetta Fred L. (Wappingers Falls NY)
출원인 / 주소	International Business Machines Corporation (Armonk NY 02)
인용정보	피인용 횟수 : 53 인용 특허 : 2

초록 ▼

An electron beam vacuum chamber is provided with an elevator mechanism within the chamber including a platform closing off an opening within a horizontal vacuum chamber wall and separating the vacuum chamber from an overlying antechamber partially defined by a vertically displaceable lid overlying the opening and moving towards and away from the opening. Resilient peripheral seals are fixed to the lid facing the chamber wall and the elevator platform. A coil spring partially compressible upon contact with the first peripheral seal carried by the lid with the face of the vacuum chamber wall forms a first mechanical override and an annular spring metal diaphragm fixedly mounted about its outer peripheral edge to the vacuum chamber adjacent the opening has its inner peripheral edge freely flexible and is contacted by the resilient peripheral seal of the platform to form a second mechanical override.

대표청구항 ▼

In an electron beam writing system for beam writing on work pieces, said system including: an electron beam vacuum chamber having internally a beam writing area, an access opening within said vacuum chamber to one side of the beam writing area, movable means mounted to said vacuum chamber for movement between a first position in sealing contact with said vacuum chamber about said access opening to define an antechamber with said opening and for closing and sealing said antechamber to said vacuum chamber and to the atmosphere and for movement away from said chamber to a second position remote therefrom to permit access to the interior of said antechamber and said electron beam vacuum chamber, and drive means for shifting said movable means between said first and said second positions, the improvement comprising mechanical override means interposed between said drive means and said movable means for dampening impact during sealing contact between said movable means and said vacuum chamber and means for preventing vibration transfer, at the termination of movement of said movable means at said first and said second positions, to said vacuum chamber beam writing area to facilitate simultaneous beam writing on work at said beam writing area and loading and unloading of another workpiece through said access opening.

이 특허에 인용된 특허 (2) 인용/피인용 타임라인 분석

Wittkower Andrew B. (Rockport MA) Ryding Geoffrey (Manchester MA), Isolation lock for workpieces.
상세보기
Hassan Javathu K. (Hopewell Junction NY) Mack Alfred (Poughkeepsie NY) Wojtaszek Michael R. (Poughkeepsie NY), Method and apparatus for handling workpieces.
상세보기

이 특허를 인용한 특허 (53) 인용/피인용 타임라인 분석

Yokomizo,Kenji, Apparatus and method of securing a workpiece during high-pressure processing.
상세보기
Walde Michael (Rodenbach DEX) Zejda Jaroslav (Rodenbach DEX), Apparatus for passing workpieces into and out of a coating chamber through locks.
상세보기
Biberger, Maximilian Albert; Layman, Frederick Paul; Sutton, Thomas Robert, Apparatus for supercritical processing of a workpiece.
상세보기
Biberger, Maximilian Albert; Layman, Frederick Paul; Sutton, Thomas Robert, Apparatus for supercritical processing of multiple workpieces.
상세보기
Kroeker Tony R. ; Cook Larry, Atmospheric wafer transfer module with nest for wafer transport robot.
상세보기
Boyd Trace L. ; Beer Richard D. ; Terbeek Eric A. ; Wong Vernon W. H., Chamber interfacing O-rings and method for implementing same.
상세보기
Boyd Trace L. ; Beer Richard D. ; Terbeek Eric A. ; Wong Vernon W. H., Chamber interfacing O-rings and method for implementing same.
상세보기
Kroeker,Tony R., Cluster tool process chamber having integrated high pressure and vacuum chambers.
상세보기
Jones,William Dale, Control of fluid flow in the processing of an object with a fluid.
상세보기
Kroeker Tony R. ; Mooring Benjamin W. ; Bright Nicolas J., Dual sided slot valve and method for implementing the same.
상세보기
Sheydayi,Alexei; Sutton,Thomas, Gate valve for plus-atmospheric pressure semiconductor process vessels.
상세보기
Jones, William D., High pressure fourier transform infrared cell.
상세보기
Biberger, Maximilian A.; Layman, Frederick Paul; Sutton, Thomas Robert, High pressure processing chamber for semiconductor substrate.
상세보기
Biberger,Maximilian A.; Layman,Frederick Paul; Sutton,Thomas Robert, High pressure processing chamber for semiconductor substrate.
상세보기
Toro-Lira Guillermo L., High speed in-vacuum flat panel display handler.
상세보기
Jones,William Dale, High-pressure processing chamber for a semiconductor wafer.
상세보기
Jones,William Dale, High-pressure processing chamber for a semiconductor wafer.
상세보기
Ken Lee ; Ke Ling Lee ; Mingwei Jiang ; Robert M. Martinson, Horizontal sputtering system.
상세보기
Robert B Farmer ; Jonathan A. Talbott ; Mohan Chandra ; James A. Tseronis ; Heiko D. Moritz, Inverted pressure vessel with shielded closure mechanism.
상세보기
Sheydayi,Alexei, Method and apparatus for clamping a substrate in a high pressure processing system.
상세보기
Goshi,Gentaro, Method and apparatus for cooling motor bearings of a high pressure pump.
상세보기
Biberger, Maximilian Albert; Layman, Frederick Paul; Sutton, Thomas Robert, Method and apparatus for supercritical processing of multiple workpieces.
상세보기
Parent,Wayne M.; Goshi,Gentaro, Method and system for cooling a pump.
상세보기
Parent,Wayne M., Method and system for determining flow conditions in a high pressure processing system.
상세보기
Parent, Wayne M.; Geshell, Dan R., Method and system for passivating a processing chamber.
상세보기
Hansen,Brandon; Lowe,Marie, Method and system for treating a substrate with a high pressure fluid using fluorosilicic acid.
상세보기
Kawamura,Kohei; Asano,Akira; Miyatani,Koutarou; Hillman,Joseph T.; Palmer,Bentley, Method for supercritical carbon dioxide processing of fluoro-carbon films.
상세보기
Biberger, Maximilian Albert; Layman, Frederick Paul; Sutton, Thomas Robert, Method for supercritical processing of multiple workpieces.
상세보기
Biberger,Maximilian Albert; Layman,Frederick Paul; Sutton,Thomas Robert, Method of supercritical processing of a workpiece.
상세보기
Kroeker, Tony R.; Tomasch, Gregory A., Methods of implementing a single shaft, dual cradle vacuum slot valve.
상세보기
Sheydayi,Alexei, Non-contact shuttle valve for flow diversion in high pressure systems.
상세보기
Sheydayi,Alexei, Pressure energized pressure vessel opening and closing device and method of providing therefor.
상세보기
Wuester,Christopher D., Process flow thermocouple.
상세보기
Mullee, William H., Removal of photoresist and photoresist residue from semiconductors using supercritical carbon dioxide process.
상세보기
Mooring Benjamin W. ; Bright Nicolas J., Semiconductor processing platform architecture having processing module isolation capabilities.
상세보기
Harada Hiroshi (Tokyo JPX) Iwasawa Yoshiyuki (Tokyo JPX) Ishida Tsutomu (Tokyo JPX) Kobayashi Shintaro (Tokyo JPX), Semiconductor processing system.
상세보기
Kroeker, Tony R.; Tomasch, Gregory A., Single shaft, dual cradle vacuum slot valve.
상세보기
Idris, Fadzli B.; Purushothman, Ganesen, Sputter chamber pressure gauge with vibration absorber.
상세보기
Chandra, Mohan; Mount, David J.; Costantini, Michael A.; Moritz, Heiko D.; Jafri, Ijaz; Boyd, Jim; Heathwaite, Rick M., Supercritical fluid cleaning process for precision surfaces.
상세보기
Heiko D Moritz ; Jonathan A. Talbott ; Mohan Chandra ; James A. Tseronis ; Ijaz Jafri, Supercritical fluid drying system and method of use.
상세보기
Lee Ke Ling ; Mazur Mikhail ; Lee Ken ; Martinson Robert M., System and method for handling and masking a substrate in a sputter deposition system.
상세보기
Gale,Glenn; Hillman,Joseph T.; Jacobson,Gunilla; Palmer,Bentley, System and method for processing a substrate using supercritical carbon dioxide processing.
상세보기
Ke Ling Lee ; Mikhail Mazur ; Ken Lee ; Robert M. Martinson, System and method for transporting and sputter coating a substrate in a sputter deposition system.
상세보기
Larson Dean Jay ; Sutton Thomas R., Tolerance resistant and vacuum compliant door hinge with open-assist feature.
상세보기
Boyd Trace L. ; Terbeek Eric A., Transport chamber and method for making same.
상세보기
Jacobson,Gunilla; Yellowaga,Deborah, Treatment of a dielectric layer using supercritical CO.
상세보기
Kevwitch, Robert, Treatment of substrate using functionalizing agent in supercritical carbon dioxide.
상세보기
Tomasch,Gregory A., Unitary slot valve actuator with dual valves.
상세보기
Tomasch,Gregory A., Unitary slot valve actuator with dual valves.
상세보기
Boyd Trace L. (San Jose CA) Yeoman Martin F. (San Ramon CA), Vacuum chamber gate valve and method for making same.
상세보기
Sheydayi,Alexei, Vacuum chuck utilizing sintered material and method of providing thereof.
상세보기
Mirkovich Ninko T. (Novato CA) Zajac John (San Jose CA), Vacuum load lock apparatus.
상세보기
Kloss,Ingo, Workpiece feeder device for an electron beam processing device.
상세보기

활용도 분석정보

상세보기

다운로드

내보내기

활용도 Top5 특허

해당 특허가 속한 카테고리에서 활용도가 높은 상위 5개 콘텐츠를 보여줍니다.
더보기 버튼을 클릭하시면 더 많은 관련자료를 살펴볼 수 있습니다.

IPC	Description
A	생활필수품
A62	인명구조; 소방(사다리 E06C)
A62B	인명구조용의 기구, 장치 또는 방법(특히 의료용에 사용되는 밸브 A61M 39/00; 특히 물에서 쓰이는 인명구조 장치 또는 방법 B63C 9/00; 잠수장비 B63C 11/00; 특히 항공기에 쓰는 것, 예. 낙하산, 투출좌석 B64D; 특히 광산에서 쓰이는 구조장치 E21F 11/00)
A62B-1/08	.. 윈치 또는 풀리에 제동기구가 있는 것

내보내기 구분	파일저장 인쇄 메일전송
구성항목	기본정보 상세정보 관리번호, 국가코드, 자료구분, 상태, 출원번호, 출원일자, 공개번호, 공개일자, 등록번호, 등록일자, 발명명칭(한글), 발명명칭(영문), 출원인(한글), 출원인(영문), 출원인코드, 대표IPC 관리번호, 국가코드, 자료구분, 상태, 출원번호, 출원일자, 공개번호, 공개일자, 공고번호, 공고일자, 등록번호, 등록일자, 발명명칭(한글), 발명명칭(영문), 출원인(한글), 출원인(영문), 출원인코드, 대표출원인, 출원인국적, 출원인주소, 발명자, 발명자E, 발명자코드, 발명자주소, 발명자 우편번호, 발명자국적, 대표IPC, IPC코드, 요약, 미국특허분류, 대리인주소, 대리인코드, 대리인(한글), 대리인(영문), 국제공개일자, 국제공개번호, 국제출원일자, 국제출원번호, 우선권, 우선권주장일, 우선권국가, 우선권출원번호, 원출원일자, 원출원번호, 지정국, Citing Patents, Cited Patents
저장형식	Text(ASCII format) Excel format PIAS분석(.xls)
메일정보	받는사람 (필수) @ 보내는사람 (선택) @ 제목 내용 KISTI 검색결과 이메일 서비스
안내	총 건의 자료가 검색되었습니다. 다운받으실 자료의 인덱스를 입력하세요. (1-10,000) 검색결과의 순서대로 최대 10,000건 까지 다운로드가 가능합니다. 데이타가 많을 경우 속도가 느려질 수 있습니다.(최대 2~3분 소요) 다운로드 파일은 UTF-8 형태로 저장됩니다. 파일의 내용이 제대로 보이지 않을실 때는 웹브라우저 상단의 보기 -> 인코딩 -> 자동선택 여부를 확인하십시오. ~ Text(ASCII format) Excel format

연합인증

[미국특허] Low shock transmissive antechamber seal mechanisms for vacuum chamber type semi-conductor wafer electron beam writing ap 원문보기

초록 ▼

대표청구항 ▼

연구과제 타임라인

이 특허에 인용된 특허 (2) 인용/피인용 타임라인 분석

이 특허를 인용한 특허 (53) 인용/피인용 타임라인 분석

활용도 분석정보

활용도 Top5 특허

관련 콘텐츠

특허 원문 보기

IPC 상위 출원인

AI-Helper ※ AI-Helper는 오픈소스 모델을 사용합니다.

선택된 텍스트

연합인증

[미국특허] Low shock transmissive antechamber seal mechanisms for vacuum chamber type semi-conductor wafer electron beam writing ap 원문보기

초록 ▼

대표청구항 ▼

연구과제 타임라인

전체(0) 논문(0) 특허(0) 보고서(0)

전체(0) 논문(0) 특허(0) 보고서(0)

이 특허에 인용된 특허 (2) 인용/피인용 타임라인 분석

이 특허를 인용한 특허 (53) 인용/피인용 타임라인 분석

활용도 분석정보

활용도 Top5 특허 더보기

관련 콘텐츠

특허 원문 보기

IPC 상위 출원인

AI-Helper ※ AI-Helper는 오픈소스 모델을 사용합니다.

선택된 텍스트

활용도 Top5 특허