$\require{mediawiki-texvc}$

연합인증

연합인증 가입 기관의 연구자들은 소속기관의 인증정보(ID와 암호)를 이용해 다른 대학, 연구기관, 서비스 공급자의 다양한 온라인 자원과 연구 데이터를 이용할 수 있습니다.

이는 여행자가 자국에서 발행 받은 여권으로 세계 각국을 자유롭게 여행할 수 있는 것과 같습니다.

연합인증으로 이용이 가능한 서비스는 NTIS, DataON, Edison, Kafe, Webinar 등이 있습니다.

한번의 인증절차만으로 연합인증 가입 서비스에 추가 로그인 없이 이용이 가능합니다.

다만, 연합인증을 위해서는 최초 1회만 인증 절차가 필요합니다. (회원이 아닐 경우 회원 가입이 필요합니다.)

연합인증 절차는 다음과 같습니다.

최초이용시에는
ScienceON에 로그인 → 연합인증 서비스 접속 → 로그인 (본인 확인 또는 회원가입) → 서비스 이용

그 이후에는
ScienceON 로그인 → 연합인증 서비스 접속 → 서비스 이용

연합인증을 활용하시면 KISTI가 제공하는 다양한 서비스를 편리하게 이용하실 수 있습니다.

Method of curing adhesive 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • C03C-027/00
출원번호 US-0391238 (1982-06-23)
발명자 / 주소
  • Hutter
  • III Charles G. (4110 County Line Carson City NV 89701)
인용정보 피인용 횟수 : 39  인용 특허 : 2

초록

A method is provided for rapidly and thoroughly curing a heat curable adhesive substance by application of radiation heat energy without excessive temperature elevation of the adhesive substance. The method comprises the controlled application of radiation heat energy to the adhesive substance for e

대표청구항

A method of curing a heat curable substance, comprising the steps of: positioning a heat sensor adjacent an exposed surface of the substance for responding to radiation heat energy to generate a signal representative of the temperature level of the exposed surface of the substance; irradiating the e

이 특허에 인용된 특허 (2)

  1. Rocholl ; Martin-Gottfried, Apparatus for rapidly producing cemented panes of insulating glass.
  2. Giddings Sydney A. (Cincinnati OH), Method and apparatus for controlling rate related manufacturing operations using a reaction simulation technique.

이 특허를 인용한 특허 (39)

  1. Johnson, William A., Apparatus and method for mounting an electrical connector to a glass sheet of a vehicle window.
  2. Johnson,William A, Apparatus and method for mounting an electrical connector to a glass sheet of a vehicle window.
  3. Varadarajan, Bhadri N.; McLaughlin, Kevin M.; van Schravendijk, Bart, Carbon containing low-k dielectric constant recovery using UV treatment.
  4. Varadarajan, Bhadri; Jiang, Gengwei; Reddy, Sirish K.; Sims, James S., Cascaded cure approach to fabricate highly tensile silicon nitride films.
  5. Varadarajan, Bhadri; Jiang, Gengwei; Reddy, Sirish K.; Sims, James S., Cascaded cure approach to fabricate highly tensile silicon nitride films.
  6. Draeger, Nerissa S.; Ray, Gary William, Creation of porosity in low-k films by photo-disassociation of imbedded nanoparticles.
  7. Brumm Curtis (Mason City IA) Ernst Randi (Lorreto MN) Rogalla Lyle H. (Hugo MN), Glass edge sealant curing system.
  8. McLaughlin, Kevin M.; Pharkya, Amit; Reddy, Kapu Sirish, Low temperature formation of high quality silicon oxide films in semiconductor device manufacturing.
  9. Lee Timothy C. P. (Kenilworth GB2) Lowe George B. (Anstey GB2), Manufacture of insulated glass units.
  10. Shuman Jack N. (3330 Foxcroft Rd. Charlotte NC 28211), Method and apparatus of temperature control in heat forming of thermoplastic sheet material.
  11. Chaffin Kimberly Ann, Method for dielectrically heating an adhesive.
  12. Kelman, Maxim; Shrinivasan, Krishnan; Wang, Feng; Lu, Victor; Chang, Sean; Lu, Guangquan, Method for reducing stress in porous dielectric films.
  13. Bandyopadhyay, Ananda K.; Cho, Seon Mee; Fu, Haiying; Srinivasan, Easwar; Mordo, David, Method to improve mechanical strength of low-K dielectric film using modulated UV exposure.
  14. Bandyopadhyay, Ananda K.; Cho, Seon-Mee; Fu, Haiying; Srinivasan, Easwar; Mordo, David, Method to improve mechanical strength of low-K dielectric film using modulated UV exposure.
  15. Bandyopadhyay, Ananda K.; Cho, Seon-Mee; Fu, Haiying; Srinivasan, Easwar; Mordo, David, Method to improve mechanical strength of low-K dielectric film using modulated UV exposure.
  16. Haverkamp, Jason Dirk; Hausmann, Dennis M.; McLaughlin, Kevin M.; Shrinivasan, Krishnan; Rivkin, Michael; Smargiassi, Eugene; Sabri, Mohamed, Multi-station sequential curing of dielectric films.
  17. Haverkamp, Jason; Hausmann, Dennis; McLaughlin, Kevin; Shrinivasan, Krishnan; Rivkin, Michael; Smargiassi, Eugene; Sabri, Mohamed, Multi-station sequential curing of dielectric films.
  18. Shrinivasan, Krishnan; Rivkin, Michael; Smargiassi, Eugene; Sabri, Mohamed, Multi-station sequential curing of dielectric films.
  19. Shrinivasan, Krishnan; Rivkin, Michael; Smargiassi, Eugene; Sabri, Mohamed, Multi-station sequential curing of dielectric films.
  20. Thomas David M., Process for rapid manufacturing multi-pane glass windows.
  21. Varadarajan, Bhadri N., Progressive UV cure.
  22. Smargiassi, Eugene; Lau, Stephen Yu-Hong; Kamian, George D.; Xi, Ming, Purging of porogen from UV cure chamber.
  23. Smargiassi, Eugene; Lau, Stephen Yu-Hong; Kamian, George D.; Xi, Ming, Purging of porogen from UV cure chamber.
  24. Smargiassi, Eugene; Lau, Stephen Yu-Hong; Kamian, George D.; Xi, Ming, Purging of porogen from UV cure chamber.
  25. Smargiassi, Eugene; Lau, Stephen Yu-Hong; Kamian, George D.; Xi, Ming, Purging of porogen from UV cure chamber.
  26. Smargiassi, Eugene; Lau, Stephen Yu-Hong; Kamian, George D.; Xi, Ming, Purging of porogen from UV cure chamber.
  27. Gilleo, Kenneth B., Releasable microcapsule and adhesive curing system using the same.
  28. Tarafdar, Raihan M.; Papasouliotis, George D.; Rulkens, Ron; Hausmann, Dennis M.; Tobin, Jeff; Tipton, Adrianne K.; Nie, Bunsen, Sequential deposition/anneal film densification method.
  29. Hirose, Isao, Sheet-like products of photoreaction, as well as manufacturing method and apparatus for sheet-like products of photoreaction.
  30. Belek Ronald E., Shielded radiation assembly.
  31. Shrinivasan, Krishna; Wang, Feng; Kamian, George; Gentile, Steve; Yam, Mark, Single-chamber sequential curing of semiconductor wafers.
  32. Varadarajan, Bhadri; Chang, Sean; Sims, James S.; Lu, Guangquan; Mordo, David; Ilcisin, Kevin; Pandit, Mandar; Carris, Michael, Tensile dielectric films using UV curing.
  33. Varadarajan, Bhadri; Antonelli, George A.; van Schravendijk, Bart, UV and reducing treatment for K recovery and surface clean in semiconductor processing.
  34. van Schravendijk, Bart; Crew, William, UV treatment for carbon-containing low-k dielectric repair in semiconductor processing.
  35. van Schravendijk, Bart; Denisse, Christian, UV treatment of etch stop and hard mask films for selectivity and hermeticity enhancement.
  36. Swanson, Douglas R.; Nestell, David E.; Lynam, Niall R., Vehicle assembly line-side heat activation of a "Ready-To-Install" window fixing adhesive for attachment of a vehicle window to a vehicle.
  37. Swanson Douglas R. ; Nestell David E. ; Lynam Niall R., Vehicle assembly line-side heat activation of a "ready-to-install" window fixing adhesive for attachment of a vehicle window to a vehicle.
  38. Swanson Douglas R. ; Nestell David E. ; Lynam Niall R., Vehicle assembly line-side heat activation of a "ready-to-install" window fixing adhesive for attachment of a vehicle window to a vehicle.
  39. Swanson, Douglas R.; Nestell, David E.; Lynam, Niall R., Vehicle assembly line-side heat activation of a "ready-to-install" window fixing adhesive for attachment of a vehicle window to a vehicle.
섹션별 컨텐츠 바로가기

AI-Helper ※ AI-Helper는 오픈소스 모델을 사용합니다.

AI-Helper 아이콘
AI-Helper
안녕하세요, AI-Helper입니다. 좌측 "선택된 텍스트"에서 텍스트를 선택하여 요약, 번역, 용어설명을 실행하세요.
※ AI-Helper는 부적절한 답변을 할 수 있습니다.

선택된 텍스트

맨위로