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Apparatus for performing continuous treatment in vacuum 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • C23C-015/00
출원번호 US-0296314 (1981-08-26)
우선권정보 JP-0117069 (1980-08-27); JP-0117070 (1980-08-27); JP-0137802 (1980-10-03); JP-0137804 (1980-10-03)
발명자 / 주소
  • Tateishi Hideki (Yokohama JPX) Kamei Tsuneaki (Kanagawa JPX) Abe Katsuo (Yokosuka JPX) Kobayashi Shigeru (Kawasaki JPX) Aiuchi Susumu (Yokohama JPX) Nakatsukasa Masashi (Tama JPX) Takahashi Nobuyuki
출원인 / 주소
  • Hitachi, Ltd. (Tokyo JPX 03) Anelva Corporation (Tokyo JPX 03)
인용정보 피인용 횟수 : 83  인용 특허 : 3

초록

An apparatus for performing continuous treatment in vacuum including an inlet chamber, a first intermediate chamber, at least one vacuum treating chamber, a second intermediate chamber and a withdrawing chamber arranged in the indicated order in a direction in which base plates are successively tran

대표청구항

An apparatus for performing continuous treatment in vacuum, comprising: (a) an inlet chamber having atmospheric leak means connected thereto and including therein a cassette elevator for moving upwardly and downwardly a cassette in which a number of shelves are arranged in a vertically spaced relati

이 특허에 인용된 특허 (3)

  1. Lane George C. (Danbury CT) Cartwright Cyril A. (Monroe CT) Elmslie Keith W. (Guilford CT), Sputter coating method.
  2. Love Robert B. (Franklin TN), Vacuum deposition system and method.
  3. Small Edward A. (Santa Rosa CA) Edwards Richard H. (Santa Rosa CA) Eufusia Eugene A. (Santa Rosa CA) Clary Robert M. (Santa Rosa CA) Bergfelt Nils H. (Santa Rosa CA), Vapor deposition apparatus.

이 특허를 인용한 특허 (83)

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  34. Zhang Hongyong (Kanagawa JPX) Kusumoto Naoto (Kanagawa JPX), Method for annealing a semiconductor.
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