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Closure for pipes or pressure vessels and a seal therefor 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • F16J-015/34
출원번호 US-0974036 (1978-12-27)
우선권정보 GB-0045281 (1976-11-01)
발명자 / 주소
  • Platts Douglas J. (Worksop GB2)
출원인 / 주소
  • General Descaling Company Limited (Nottinghamshire GB2 03)
인용정보 피인용 횟수 : 37  인용 특허 : 0

초록

A closure for a pipe or pressure vessel comprises a door adapted to fit into an aperture in a pipe or pressure vessel and an arcuate locking member disposed around the periphery of the door for locking the door to the pipe or pressure vessel, the ends of the locking member being movable towards and

대표청구항

A seal comprising a support of relatively rigid material having first and second flanges having remote surfaces adapted to engage respective opposed faces of elements between which a seal is to be formed, the first flange having a greater surface area than the second flange and being less flexible t

이 특허를 인용한 특허 (37)

  1. Yokomizo,Kenji, Apparatus and method of securing a workpiece during high-pressure processing.
  2. Biberger, Maximilian Albert; Layman, Frederick Paul; Sutton, Thomas Robert, Apparatus for supercritical processing of a workpiece.
  3. Biberger, Maximilian Albert; Layman, Frederick Paul; Sutton, Thomas Robert, Apparatus for supercritical processing of multiple workpieces.
  4. Lollis, Jack D; Lollis, Corey M; Howerton, Richard A, Closure for pressure vessels.
  5. Haibel, Joshua A., Closure having a segmented locking ring.
  6. Jones,William Dale, Control of fluid flow in the processing of an object with a fluid.
  7. Bariaud Christian (Orsay FRX) Delonge Jean-Claude L. (Corbeil-Essonnes FRX), Fluidtight labyrinth seal for a turbo-machine.
  8. Sheydayi,Alexei; Sutton,Thomas, Gate valve for plus-atmospheric pressure semiconductor process vessels.
  9. Jones, William D., High pressure fourier transform infrared cell.
  10. Biberger, Maximilian A.; Layman, Frederick Paul; Sutton, Thomas Robert, High pressure processing chamber for semiconductor substrate.
  11. Biberger,Maximilian A.; Layman,Frederick Paul; Sutton,Thomas Robert, High pressure processing chamber for semiconductor substrate.
  12. Jones,William Dale, High-pressure processing chamber for a semiconductor wafer.
  13. Jones,William Dale, High-pressure processing chamber for a semiconductor wafer.
  14. Tseronis, James A.; Mortiz, Heiko D.; Chandra, Mohan; Farmer, Robert B.; Jafri, Ijaz H.; Talbott, Jonathan, Inverted pressure vessel with horizontal through loading.
  15. Robert B Farmer ; Jonathan A. Talbott ; Mohan Chandra ; James A. Tseronis ; Heiko D. Moritz, Inverted pressure vessel with shielded closure mechanism.
  16. Haibel, Joshua, Locking ring actuator for a pressure retaining closure.
  17. Sheydayi,Alexei, Method and apparatus for clamping a substrate in a high pressure processing system.
  18. Goshi,Gentaro, Method and apparatus for cooling motor bearings of a high pressure pump.
  19. Biberger, Maximilian Albert; Layman, Frederick Paul; Sutton, Thomas Robert, Method and apparatus for supercritical processing of multiple workpieces.
  20. Parent,Wayne M.; Goshi,Gentaro, Method and system for cooling a pump.
  21. Parent,Wayne M., Method and system for determining flow conditions in a high pressure processing system.
  22. Parent, Wayne M.; Geshell, Dan R., Method and system for passivating a processing chamber.
  23. Hansen,Brandon; Lowe,Marie, Method and system for treating a substrate with a high pressure fluid using fluorosilicic acid.
  24. Kawamura,Kohei; Asano,Akira; Miyatani,Koutarou; Hillman,Joseph T.; Palmer,Bentley, Method for supercritical carbon dioxide processing of fluoro-carbon films.
  25. Biberger, Maximilian Albert; Layman, Frederick Paul; Sutton, Thomas Robert, Method for supercritical processing of multiple workpieces.
  26. Biberger,Maximilian Albert; Layman,Frederick Paul; Sutton,Thomas Robert, Method of supercritical processing of a workpiece.
  27. Sheydayi,Alexei, Non-contact shuttle valve for flow diversion in high pressure systems.
  28. Sheydayi,Alexei, Pressure energized pressure vessel opening and closing device and method of providing therefor.
  29. Wuester,Christopher D., Process flow thermocouple.
  30. Mullee, William H., Removal of photoresist and photoresist residue from semiconductors using supercritical carbon dioxide process.
  31. Heiko D Moritz ; Jonathan A. Talbott ; Mohan Chandra ; James A. Tseronis ; Ijaz Jafri, Supercritical fluid drying system and method of use.
  32. Gale,Glenn; Hillman,Joseph T.; Jacobson,Gunilla; Palmer,Bentley, System and method for processing a substrate using supercritical carbon dioxide processing.
  33. Haibel, Joshua A., Tool-less closure.
  34. Haibel, Joshua A.; Schmidt, William L., Tool-less closure.
  35. Jacobson,Gunilla; Yellowaga,Deborah, Treatment of a dielectric layer using supercritical CO.
  36. Kevwitch, Robert, Treatment of substrate using functionalizing agent in supercritical carbon dioxide.
  37. Sheydayi,Alexei, Vacuum chuck utilizing sintered material and method of providing thereof.
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