이 특허를 인용한 특허 (48) 인용/피인용 타임라인 분석

1. Frind Gerhard (Altamont NY) Siemers Paul A. (Clifton Park NY) Rutkowski Stephen F. (Duanesburg NY), Apparatus and method for transfer arc cleaning of a substrate in an RF plasma system.

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2. Kieser Jrg (Albstadt DEX) Geisler Michael (Wchtersbach DEX) Wilhelm Rolf (Calw-Stammheim DEX) Ruchle Eberhard (Remseck DEX), Apparatus for producing a plasma and for the treatment of substrates.

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3. Nakao Shuji (Itami JPX), Apparatus utilizing charged particles.

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4. Plester, George; Ehrich, Horst, Barrier coated plastic containers and coating methods therefor.

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5. Shi,Yu; Mucha,Lawrence S., Coating composition containing an epoxide additive and structures coated therewith.

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6. Engemann Jurgen (Wuppertal DEX), Device for the generation of electrically charged and/or uncharged particles.

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7. Delaunay Marc (Grenoble FRX) Gualandris Ren (Grenoble FRX) Geller Richard (Grenoble FRX) Jacquot Claude (St Egreve FRX) Ludwig Paul (Grenoble FRX) Mathonnet Jean-Marc (Grenoble FRX) Rocco Jean-Claude, Electron cyclotron resonance ion source.

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8. Ghanbari Ebrahim (Huntington NY), Electron cyclotron resonance plasma source.

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9. Campbell Gregor (Glendale CA) Conn Robert W. (Los Angeles CA) Shoji Tatsuo (Nagoya JPX), High density plasma deposition and etching apparatus.

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10. Mintz Donald M. ; Hanawa Hiroji ; Somekh Sasson ; Maydan Dan ; Collins Kenneth S., High frequency semiconductor wafer processing apparatus and method.

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11. Plester George,BEX ; Ehrich Horst,DEX ; Rule Mark, Hollow plastic containers with an external very thin coating of low permeability to gases and vapors through plasma-assisted deposition of inorganic substances and method and system for making the co.

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12. Asmussen Jes (Okemos MI) Root Joseph J. (East Lansing MI), Ion generating apparatus and method for the use thereof.

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13. Farley Marvin ; Dudnikov Vadim G. ; Nasser-Ghodsi Mehran, Ion implantation with charge neutralization.

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14. Yamazaki Shunpei,JPX, Layer member forming method.

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15. Yamazaki,Shunpei, Layer member forming method.

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16. Boswell Roderick W. (Australian Capital Territory AUX), Method and apparatus for producing large volume magnetoplasmas.

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17. Plester, George; Ehrich, Horst; Rule, Mark, Method for coating a plastic container with vacuum vapor deposition.

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18. Hirose, Naoki; Inujima, Takashi; Takayama, Toru, Method for forming I-carbon film.

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19. Miyanaga Akiharu,JPX ; Inoue Tohru,JPX ; Yamazaki Shunpei,JPX, Method for forming a film.

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20. Yamazaki, Shunpei, Method for the manufacture of an insulated gate field effect semiconductor device.

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21. George Plester BE; Horst Ehrich DE, Methods for measuring the degree of ionization and the rate of evaporation in a vapor deposition coating system.

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22. Kutney, Michael C.; Hoffman, Daniel J.; Delgadino, Gerardo A.; Gold, Ezra R.; Sinha, Ashok; Zhao, Xiaoye; Burns, Douglas H.; Ma, Shawming, Methods to avoid unstable plasma states during a process transition.

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23. Inujima, Takashi; Hirose, Naoki; Tashiro, Mamoru; Yamazaki, Shunpei, Microwave enhanced CVD method and apparatus.

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24. Yamazaki Shunpei,JPX, Microwave enhanced CVD system under magnetic field.

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25. Yamazaki, Shunpei, Microwave enhanced CVD system under magnetic field.

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26. Okamoto Yukio (Sagamihara JPX), Microwave plasma production apparatus.

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27. Rule, Mark; Shi, Yu; Gebele, Thomas; Grimm, Helmut; Budke, Elisabeth, Multilayer polymeric/inorganic oxide structure with top coat for enhanced gas or vapor barrier and method for making same.

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28. Rule, Mark; Shi, Yu; Gebele, Thomas; Grimm, Helmut; Budke, Elisabeth, Multilayer polymeric/inorganic oxide structure with top coat for enhanced gas or vapor barrier and method for making same.

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29. Rule, Mark; Shi, Yu; Ehrich, Horst, Multilayer polymeric/zero valent material structure for enhanced gas or vapor barrier and UV barrier and method for making same.

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30. Rule, Mark; Shi, Yu; Ehrich, Horst, Multilayer polymeric/zero valent material structure for enhanced gas or vapor barrier and uv barrier and method for making same.

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31. Trow John ; Ishikawa Tetsuya, Plasma confinement for an inductively coupled plasma reactor.

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32. Mori Haruhisa (Yokohama JPX) Nakano Motoo (Yokohama JPX) Ono Yoshinobu (Tokyo JPX) Igarashi Takashi (Yokohama JPX) Hotta Masanao (Akigawa JPX), Plasma generating device with stepped waveguide transition.

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33. Yamazaki, Shunpei, Plasma processing apparatus.

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34. Hirose Naoki,JPX ; Inujima Takashi,JPX ; Takayama Toru,JPX, Plasma processing apparatus and method.

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35. Naoki Hirose JP; Takashi Inujima JP; Toru Takayama JP, Plasma processing apparatus and method.

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36. Yoshida Akihisa (Neyagawa JPX) Setsune Kentaro (Sakai JPX) Hirao Takashi (Moriguchi JPX), Plasma processing apparatus for large area ion irradiation.

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37. Hirose Naoki (Atsugi JPX) Inugima Takashi (Atsugi JPX) Takayama Toru (Atsugi JPX), Plasma processing apparatus with a lisitano coil.

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38. Nakanishi Koichiro (Amagasaki JPX) Ootera Hiroki (Amagasaki JPX) Hanazaki Minoru (Amagasaki JPX) Minami Toshihiko (Amagasaki JPX), Plasma processor.

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39. Hoffman, Daniel J.; Lindley, Roger A.; Kutney, Michael C.; Salinas, Martin J.; Tavassoli, Hamid F.; Horioka, Keiji; Buchberger, Jr., Douglas A., Plasma reactor with minimal D.C. coils for cusp, solenoid and mirror fields for plasma uniformity and device damage reduction.

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40. Tei, Goushu; Tanaka, Nobuyoshi; Ohmi, Tadahiro; Hirayama, Masaki, Plasma treatment method and method of manufacturing optical parts using the same.

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41. Plester George,BEX ; Ehrich Horst,DEX, Plasma-enhanced vacuum vapor deposition system including systems for evaporation of a solid, producing an electric arc discharge and measuring ionization and evaporation.

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42. Plester George,BEX ; Ehrich Horst,DEX ; Rule Mark ; Pickel Herbert,DEX ; Humele Heinz,DEX, Plastic containers with an external gas barrier coating.

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43. Humele, Heinz; Pickel, Herbert; Plester, George; Ehrich, Horst; Rule, Mark, Plastic containers with an external gas barrier coating, method and system for coating containers using vapor deposition, method for recycling coated containers, and method for packaging a beverage.

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44. Miyanaga, Akiharu; Inoue, Tohru; Yamazaki, Shunpei, Pulsed electromagnetic energy method for forming a film.

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45. Miyanaga,Akiharu; Inoue,Tohru; Yamazaki,Shunpei, Pulsed plasma CVD method for forming a film.

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46. Markunas Robert J. (Chapel Hill NC) Hendry Robert (Hillsborough NC) Rudder Ronald A. (Cary NC), Remote plasma enhanced CVD method and apparatus for growing an epitaxial semconductor layer.

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47. Yamazaki Shunpei,JPX, Semiconductor device, manufacturing method, and system.

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48. Desalvo, Gregory C.; Quach, Tony K.; Ebel, John L.; Walker, Anders P.; Cassity, Paul D., Stiffened backside fabrication for microwave radio frequency wafers.

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