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Apparatus and method of material removal with fluid flow within a slot

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • B08B-007/00
출원번호 US-0404678 (1982-08-03)
발명자 / 주소
  • Titus Stephen D. (Houston TX)
출원인 / 주소
  • Texas Instruments Incorporated (Dallas TX 02)
인용정보 피인용 횟수 : 65  인용 특허 : 1

초록

Apparatus and method for cleaning material at the outer edge of an object by applying a fluid, which can be a solvent, for the material to a flat surface adjacent the edge by contact and moving the solvent onto the edge by centrifugal force. A slot is provided in a planar surface. The slot is filled

대표청구항

Apparatus for removing material from a convex outer edge of an object having a flat surface adjacent thereto, comprising: a. a means defining a source of fluid under pressure to dissolve said material; b. a support provided with a planar surface having an arcuate slot therein elongated in a certain

이 특허에 인용된 특허 (1)

  1. Shortes Samuel R. (Plano TX) Millis Edwin Graham (Dallas TX), Method and apparatus for cleaning the surface of a semiconductor slice with a liquid spray of de-ionized water.

이 특허를 인용한 특허 (65)

  1. Rose Peter H. ; Sferlazzo Piero ; van der Heide Robert G., Aerosol surface processing.
  2. Rose Peter H. ; Sferlazzo Piero ; van der Heide Robert G., Aerosol surface processing.
  3. Hanson,Kyle M., Apparatus and methods for electrochemical processing of microelectronic workpieces.
  4. Hanson,Kyle M.; Ritzdorf,Thomas L.; Wilson,Gregory J.; McHugh,Paul R., Apparatus and methods for electrochemical processing of microelectronic workpieces.
  5. Hanson,Kyle M.; Ritzdorf,Thomas L.; Wilson,Gregory J.; McHugh,Paul R., Apparatus and methods for electrochemical processing of microelectronic workpieces.
  6. Wirth, Paul Z.; Peace, Steven L.; Lund, Erik, Apparatus and methods for processing a workpiece.
  7. Wirth, Paul Z.; Peace, Steven L., Apparatus for processing a workpiece.
  8. Davis Cecil J. (Greenville TX) Matthews Robert T. (Plano TX), Apparatus for transferring workpieces.
  9. Stevens, Joe; Olgado, Donald; Ko, Alex; Mok, Yeuk-Fai Edwin, Edge bead removal/spin rinse dry (EBR/SRD) module.
  10. Stevens, Joseph J.; Lubomirsky, Dmitry; Pancham, Ian; Olgado, Donald J.; Grunes, Howard E.; Mok, Yeuk-Fai Edwin; Dixit, Girish, Electroless plating system.
  11. Bergman, Eric J.; Sharp, Ian; Meuchel, Craig P.; Woods, H. Frederick, Method and apparatus for high-pressure wafer processing and drying.
  12. Davis Cecil J. (Greenville TX) Matthews Robert T. (Plano TX) Jucha Rhett B. (Celeste TX) Loewenstein Lee M. (Plano TX), Method for cleanup processing chamber and vacuum process module.
  13. Luttmer Joseph D. (Richardson TX) York Rudy L. (Plano TX) Smith Patricia B. (Euless TX) Davis Cecil J. (Greenville TX), Method for depositing compound from group II-VI.
  14. Freeman Dean W. (Plano TX) Luttmer Joseph D. (Richardson TX) Smith Patricia B. (Euless TX) Davis Cecil J. (Greenville TX), Method for deposition of silicon oxide on a wafer.
  15. Loewenstein Lee M. (Plano TX) Davis Cecil J. (Greenville TX), Method for etch of GaAs.
  16. Loewenstein Lee M. (Plano TX) Davis Cecil J. (Greenville TX) Jucha Rhett B. (Celeste TX), Method for etch of polysilicon film.
  17. Jucha Rhett B. (Celeste TX) Davis Cecil J. (Greenville TX) Loewenstein Lee M. (Plano TX), Method for etching aluminum film doped with copper.
  18. Davis Cecil J. (Greenville TX) Loewenstein Lee M. (Plano TX) Jucha Rhett B. (Celeste TX), Method for etching an aluminum film doped with silicon.
  19. Luttmer Joseph D. (Richardson TX) Davis Cecil J. (Greenville TX) Smith Patricia B. (Euless TX) York Rudy L. (Plano TX) Loewenstein Lee M. (Plano TX) Jucha Rhett B. (Celeste TX), Method for etching films of mercury-cadmium-telluride and zinc sulfid.
  20. Jucha Rhett B. (Celeste TX) Davis Cecil J. (Greenville TX), Method for etching tungsten.
  21. Jucha Rhett B. (Celeste TX) Davis Cecil J. (Greenville TX) Carter Duane E. (Plano TX) Crank Sue E. (Coppell TX) Jones John I. (Plano TX), Method for etching tungsten.
  22. Jucha Rhett B. (Celeste TX) Davis Cecil J. (Greenville TX) Crank Sue E. (Coppell TX), Method for etching tungsten.
  23. Luttmer Joseph D. (Richardson TX) Davis Cecil J. (Greenville TX) Smith Patricia B. (Euless TX) York Rudy L. (Plano TX), Method for passivating wafer.
  24. Jucha Rhett B. (Celeste TX) Davis Cecil J. (Greenville TX) Jones John I. (Plano TX), Method for plasma etching tungsten.
  25. York Rudy L. (Plano TX) Luttmer Joseph D. (Richardson TX) Smith Patricia B. (Euless TX) Davis Cecil J. (Greenville TX), Method of sequential cleaning and passivating a GaAs substrate using remote oxygen plasma.
  26. Ritzdorf,Thomas L.; Eudy,Steve L.; Wilson,Gregory J.; McHugh,Paul R.; Weaver,Robert A.; Aegerter,Brian; Dundas,Curt; Peace,Steven L., Methods and apparatus for processing microelectronic workpieces using metrology.
  27. Curtis Gary L. ; Thompson Raymon F., Micro-environment chamber and system for rinsing and drying a semiconductor workpiece.
  28. Gary L. Curtis ; Raymon F. Thompson, Micro-environment chamber and system for rinsing and drying a semiconductor workpiece.
  29. Gary L Curtis ; Raymon F. Thompson, Micro-environment reactor for processing a workpiece.
  30. Jucha Rhett B. (Celeste TX) Davis Cecil J. (Greenville TX) Loewenstein Lee M. (Plano TX), Process for etch of tungsten.
  31. Loewenstein Lee M. (Plano TX) Davis Cecil J. (Greenville TX), Process for etching silicon nitride film.
  32. Rose Peter H. ; Sferlazzo Piero, Processing a surface.
  33. Davis Cecil J. (Greenville TX) Abernathy Joseph V. (Wylie TX) Matthews Robert T. (Plano TX) Hildenbrand Randall C. (Richardson TX) Simpson Bruce (Dallas TX) Jones John I. (Plano TX) Loewenstein Lee M, Processing apparatus.
  34. Fisher Wayne G. (Allen TX) Bennett Tommy J. (McKinney TX) Davis Cecil J. (Greenville TX) Matthews Robert T. (Plano TX), Processing apparatus.
  35. Liu Jiann (Irving TX) Davis Cecil J. (Greenville TX) Loewenstein Lee M. (Plano TX), Processing apparatus.
  36. Davis Cecil J. (Greenville TX) Jucha Rhett B. (Celeste TX), Processing apparatus and method.
  37. Davis Cecil J. (Greenville TX) Loewenstein Lee M. (Plano TX) Jucha Rhett B. (Celeste TX) Matthews Robert T. (Plano TX) Hildenbrand Randall C. (Richardson TX) Freeman Dean W. (Garland TX) Jones John I, Processing apparatus and method.
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  40. Davis Cecil J. (Greenville TX) Freeman Dean W. (Garland TX) Matthews Robert T. (Plano TX) Tomlin Joel T. (Garland TX), Processing apparatus for wafers.
  41. Fisher Wayne G. (Allen TX), Processing apparatus for wafers.
  42. Curtis Gary L. ; Thompson Raymon F., Reactor for processing a microelectronic workpiece.
  43. Curtis, Gary L.; Thompson, Raymon F., Reactor for processing a microelectronic workpiece.
  44. Steven L. Peace ; Gary L. Curtis ; Raymon F. Thompson ; Brian Aegerter ; Curt T. Dundas, Reactor for processing a semiconductor wafer.
  45. Steven L. Peace ; Gary L. Curtis ; Raymon F. Thompson ; Brian Aegerter ; Curt T. Dundas, Reactor for processing a semiconductor wafer.
  46. Steven L. Peace ; Paul Z. Wirth ; Eric Lund, Reactor for processing a workpiece using sonic energy.
  47. Wirth, Paul Z.; Peace, Steven L., Reactor for processing a workpiece using sonic energy.
  48. Loewenstein Lee M. (Plano TX) Davis Cecil J. (Greenville TX), Remote plasma generation process using a two-stage showerhead.
  49. Jucha Rhett B. (Celeste TX) Carter Duane E. (Plano TX) Davis Cecil J. (Greenville TX) Crank Sue E. (Coppell TX), Selective etching of tungsten by remote and in situ plasma generation.
  50. Aegerter,Brian K.; Dundas,Curt T.; Ritzdorf,Tom L.; Curtis,Gary L.; Jolley,Michael; Peace,Steven L., Selective treatment of microelectric workpiece surfaces.
  51. Aegerter, Brian K.; Dundas, Curt T.; Ritzdorf, Tom L.; Curtis, Gary L.; Jolley, Michael, Selective treatment of microelectronic workpiece surfaces.
  52. Brian Aegerter ; Curt T. Dundas ; Michael Jolley ; Tom L. Ritzdorf ; Steven L. Peace ; Gary L. Curtis ; Raymon F. Thompson, Selective treatment of the surface of a microelectronic workpiece.
  53. Hiroki Taniyama JP; Youichi Tanaka JP; Toshihiko Takahashi JP, Substrate cleaning apparatus and method.
  54. Wilson, Gregory J.; McHugh, Paul R.; Hanson, Kyle M., System for electrochemically processing a workpiece.
  55. Curtis, Gary L; Thompson, Raymon F., System for processing a workpiece.
  56. Curtis, Gary L; Thompson, Raymon F., System for processing a workpiece.
  57. Curtis, Gary L; Thompson, Raymon F., System for processing a workpiece.
  58. Curtis,Gary L.; Thompson,Raymon F., System for processing a workpiece.
  59. Gary L. Curtis ; Raymon F. Thompson, System for processing a workpiece.
  60. Hanson,Kyle M., System for processing a workpiece.
  61. Hongo, Akihisa; Morisawa, Shinya, Wafer cleaning apparatus.
  62. Hongo,Akihisa; Morisawa,Shinya, Wafer cleaning apparatus.
  63. Levi Mark W. (Utica NY), Wafer cleaning method.
  64. Davis Cecil J. (Greenville TX) Loewenstein Lee M. (Plano TX) Matthews Robert T. (Plano TX) Jones John I. (Plano TX) Jucha Rhett B. (Celeste TX), Wafer processing apparatus and method.
  65. Wilson,Gregory J.; McHugh,Paul R.; Hanson,Kyle M., Workpiece processor having processing chamber with improved processing fluid flow.
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