초록 ▼

A low emissivity coating on a transparent substrate of glass or plastics material is produced by cathode sputtering a layer of silver and thereafter reactively sputtering an anti-reflection metal oxide layer over the silver in the presence of oxygen or an oxidizing gas, wherein a small amount of an

A low emissivity coating on a transparent substrate of glass or plastics material is produced by cathode sputtering a layer of silver and thereafter reactively sputtering an anti-reflection metal oxide layer over the silver in the presence of oxygen or an oxidizing gas, wherein a small amount of an additional metal other than silver is sputtered onto the silver before the overlying anti-reflection metal oxide layer is applied. The process produces a new low emissivity coated product comprising a glass or plastics substrate with a low emissivity coating comprising a silver layer, a small amount of additional metal dispersed non-uniformly in the silver layer and possibly extending over the silver layer, and an overlying anti-reflection metal oxide coating.

대표청구항 ▼

A process for the production of a low emissivity coating on a transparent substrate of glass or plastics material by cathode sputtering comprising, in sequence, (i) sputtering a layer of silver from 5 to 30 nm thick onto the transparent glass or plastics substrate (ii) sputtering at least one additi

A process for the production of a low emissivity coating on a transparent substrate of glass or plastics material by cathode sputtering comprising, in sequence, (i) sputtering a layer of silver from 5 to 30 nm thick onto the transparent glass or plastics substrate (ii) sputtering at least one additional metal other than silver in amount equivalent to a layer 0.5 to 10 nm thick onto the silver and (iii) reactively sputtering, in the presence of oxygen or an oxidising gas, at least one anti-reflection metal oxide layer over the silver and additional metal.