초록 ▼

Gas, such as exhaust gas from a silicon epitaxial reactor, is treated with a liquid such as water. A basin (12) holds a solution (20) including the liquid utilized to treat such gas in the manner intended. An inlet chamber (14) and a convenient self-cleaning passageway (46) introduce the gas into an

Gas, such as exhaust gas from a silicon epitaxial reactor, is treated with a liquid such as water. A basin (12) holds a solution (20) including the liquid utilized to treat such gas in the manner intended. An inlet chamber (14) and a convenient self-cleaning passageway (46) introduce the gas into and below a first level (36) of solution (20) established within a treatment chamber (16) in the basin (12). Within delivery piping (44), pressure is provided for advancing the gas for treatment. The treatment chamber (16) is provided with sidewalls (28 and 30) having passageways (46 and 48, respectively), which cooperate with the gas pressure to establish multiple levels (36, 38 and 40) of solution (20) in basin (12) to seal chamber (16). Chamber (16) is also provided with heads (60-67) for spraying the liquid into the advancing gas to wet the same for a time sufficient to treat the gas. The passageway (48 ) in outlet wall (30) passes the gas from the treatment chamber (16) into and below a second, higher level (38) of solution (20) in basin (12) and the gas advances to the atomsphere.

대표청구항 ▼

Apparatus for treating gas including any substances therein, comprising: a basin for holding a solution including a liquid utilized to treat such gas in the manner intended; a treatment chamber disposed in the basin and having sufficient space for treatment above the solution in the basin; means for

Apparatus for treating gas including any substances therein, comprising: a basin for holding a solution including a liquid utilized to treat such gas in the manner intended; a treatment chamber disposed in the basin and having sufficient space for treatment above the solution in the basin; means for introducing the gas into the basin and passing the gas below a first level of the solution established within the treatment chamber portion of the basin and for advancing the gas for treatment in the treatment chamber; the treatment chamber including means, in cooperation with the gas advancing means, for establishing multiple levels of solution in the basin to seal said chamber and means in the space above the solution in the basin for spraying the liquid into the advancing gas to wet the same for a time sufficient to treat the gas in the manner intended; and means for passing the gas from the treatment chamber into and below a second, higher level of the solution in the basin and for advancing the gas to the atmosphere.