|국가/구분||United States(US) Patent 등록|
|미국특허분류(USC)||427/64 ; 65/43 ; 118/315 ; 118/323|
|발명자 / 주소|
|출원인 / 주소|
|인용정보||피인용 횟수 : 17 인용 특허 : 3|
For supplying frit slurry to the sealing surface of a funnel portion of a cathode ray tube, air under pressure, preferably saturated with a solvent for the frit slurry, is supplied to a vessel containing the frit slurry, and the latter is transported by the air under pressure out of an outlet of the vessel and through a hose or hoses for deposit on the sealing surface. The flow of frit slurry is regulated by a valve between the vessel outlet and the hoses. The frit slurry contained in the vessel is stirred continuously to maintain a substantially constan...
An apparatus for applying viscous material to a surface of an article comprising: supply means for providing a gas under pressure; saturating means for saturating said gas with a vaporized solvent for said viscous material to deter drying of the latter when exposed to the saturated gas under pressure; and containment means for containing said viscous material and to which said saturated gas under pressure is supplied, said containment means having an outlet through which said viscous material is forced by said saturated gas under pressure for application...