$\require{mediawiki-texvc}$

연합인증

연합인증 가입 기관의 연구자들은 소속기관의 인증정보(ID와 암호)를 이용해 다른 대학, 연구기관, 서비스 공급자의 다양한 온라인 자원과 연구 데이터를 이용할 수 있습니다.

이는 여행자가 자국에서 발행 받은 여권으로 세계 각국을 자유롭게 여행할 수 있는 것과 같습니다.

연합인증으로 이용이 가능한 서비스는 NTIS, DataON, Edison, Kafe, Webinar 등이 있습니다.

한번의 인증절차만으로 연합인증 가입 서비스에 추가 로그인 없이 이용이 가능합니다.

다만, 연합인증을 위해서는 최초 1회만 인증 절차가 필요합니다. (회원이 아닐 경우 회원 가입이 필요합니다.)

연합인증 절차는 다음과 같습니다.

최초이용시에는
ScienceON에 로그인 → 연합인증 서비스 접속 → 로그인 (본인 확인 또는 회원가입) → 서비스 이용

그 이후에는
ScienceON 로그인 → 연합인증 서비스 접속 → 서비스 이용

연합인증을 활용하시면 KISTI가 제공하는 다양한 서비스를 편리하게 이용하실 수 있습니다.

Ion generating apparatus and method for the use thereof 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • H01J-007/46
  • H01J-019/80
출원번호 US-0468897 (1983-02-23)
발명자 / 주소
  • Asmussen Jes (Okemos MI) Root Joseph J. (East Lansing MI)
출원인 / 주소
  • Board of Trustees operating Michigan State University (East Lansing MI 02)
인용정보 피인용 횟수 : 82  인용 특허 : 9

초록

A radio frequency wave ion generating apparatus which provides a thin disc shaped plasma adjacent an ion attracting means is described. The radio frequency waves are preferably microwaves. Several improvements to microwave plasma generation are described including the steps of generation of a resona

대표청구항

In an ion generating apparatus including a plasma source employing a radio frequency wave coupler which is excited in one or more of its TE or TM modes of resonance to produce the plasma in the coupler and optionally including a static magnetic field which aids in confining the ions in the coupler i

이 특허에 인용된 특허 (9)

  1. Morimiya Osami (Tokyo JPX) Suzuki Setsuo (Yokohama JPX) Monma Shigeki (Yokohama JPX), Discharge apparatus having hollow cathode.
  2. Huffman Fred N. (Sudbury MA), Method and apparatus for producing negative ions.
  3. Consoli Terenzio (Meylan FR), Method for producing and heating a plasma.
  4. Koike Hidemi (Tokorozawa JPX) Sakudo Noriyuki (Ohme JPX) Tokiguchi Katsumi (Hachioji JPX) Kanomata Ichiro (Fuchu JPX), Microwave discharge ion source.
  5. Sakudo Noriyuki (Ohme JPX) Tokiguchi Katsumi (Hachioji JPX) Koike Hidemi (Tokorozawa JPX) Kanomata Ichiro (Fuchu JPX), Microwave plasma ion source.
  6. Sakudo Noriyuki (Ohme JPX) Tokiguchi Katsumi (Hachioji JPX) Koike Hidemi (Tokorozawa JPX) Kanomata Ichiro (Fuchu JPX) Nakashima Humihiko (Katsuta JPX), Microwave plasma ion source.
  7. Camplan Jean (Paris FRX) Chaumont Jacques (Fontenay le Fleury FRX) Meunier Robert (Bonnelles FRX), Movable extraction electrode for an ion source.
  8. Abe Haruhiko (Itami JPX) Harada Hiroshi (Itami JPX) Denda Masahiko (Itami JPX) Nagasawa Koichi (Itami JPX) Kono Yoshio (Itami JPX), Plasma treating apparatus.
  9. Geller Richard (4 ; place Grenette 3800 Grenoble FRX) Gugliermotte Francis (1 ; boulevard Jomardiere 38120 Saint Egreve FRX), Process and apparatus for producing highly charged large ions and an application utilizing this process.

이 특허를 인용한 특허 (82)

  1. Bowering,Norbert R.; Khodykin,Oleh V.; Bykanov,Alexander N.; Fomenkov,Igor V., Alternative fuels for EUV light source.
  2. Patten ; Jr. Donald O. ; Simpson Matthew A. ; Windischmann Henry ; Heuser Michael S. ; Quirk William A. ; Jaffe Stephen M., Apparatus and method for depositing a substance with temperature control.
  3. Efthimion Philip C. (Bedminister NJ) Helfritch Dennis J. (Flemington NJ), Apparatus and method for enhanced chemical processing in high pressure and atmospheric plasmas produced by high frequenc.
  4. Frind Gerhard (Altamont NY) Siemers Paul A. (Clifton Park NY) Rutkowski Stephen F. (Duanesburg NY), Apparatus and method for transfer arc cleaning of a substrate in an RF plasma system.
  5. Lewis David Andrew ; Viehbeck Alfred ; Whitehair Stanley Joseph, Applicator to provide uniform electric and magnetic fields over a large area and for continuous processing.
  6. McCrary Leon E. (Scituate MA) Willey Ronald R. (Melbourne FL), Broad high current ion source.
  7. Asmussen Jes (Okemos MI), Coaxial cavity type, radiofrequency wave, plasma generating apparatus.
  8. Singh Bawa (Cherry Hill NJ) Denton Peter R. (Cherry Hill NJ), Cold cathode ion beam source.
  9. Cecil B. Shepard, Jr., Diamond film deposition on substrate arrays.
  10. Shepard ; Jr. Cecil B., Diamond film deposition on substrate arrays.
  11. Fomenkov,Igor V.; Partlo,William N.; Blumenstock,Gerry M.; Bowering,Nortbert; Oliver,I. Roger; Pan,Xiaojiang; Simmons,Rodney D., Discharge produced plasma EUV light source.
  12. Roppel Thaddeus A. (Okemos MI) Asmussen Jes (Okemos MI) Reinhard Donnie K. (East Lansing MI), Dual plasma microwave apparatus and method for treating a surface.
  13. Partlo, William N.; Sandstrom, Richard L.; Fomenkov, Igor V.; Ershov, Alexander I.; Oldham, William; Marx, William F.; Hemberg, Oscar, EUV collector debris management.
  14. Bowering,Norbert R.; Hansson,Bjorn A. M.; Simmons,Rodney D., EUV light source.
  15. Partlo,William N.; Ershov,Alexander I.; Fomenkov,Igor V., EUV light source collector erosion mitigation.
  16. Partlo,William N.; Ershov,Alexander I.; Fomenkov,Igor V.; Myers,David W.; Oldham,William, EUV light source collector erosion mitigation.
  17. Partlo,William N.; Ershov,Alexander I.; Fomenkov,Igor V.; Khodykin,Oleh, EUV light source collector lifetime improvements.
  18. Bowering,Norbert R.; Ershov,Alexander I.; Dyer,Timothy S.; Grinolds,Hugh R., EUV light source optical elements.
  19. Melnychuk, Stephan T.; Partlo, William N.; Fomenkov, Igor V.; Oliver, I. Roger; Ness, Richard M.; Bowering, Norbert; Khodykin, Oleh; Rettig, Curtis L.; Blumenstock, Gerry M.; Dyer, Timothy S.; Simmon, Extreme ultraviolet light source.
  20. Melnychuk,Stephan T.; Partlo,William N.; Fomenkov,Igor V.; Oliver,I. Roger; Ness,Richard M.; Bowering,Norbert R.; Khodykin,Oleh; Rettig,Curtis L.; Blumenstock,Gerry M.; Dyer,Timothy S.; Simmons,Rodney D.; Hoffman,Jerzy R.; Johnson,R. Mark, Extreme ultraviolet light source.
  21. Partio, William N.; Fomenkov, Igor V.; Khodykin, Oleh, Extreme ultraviolet light source.
  22. Mhl Wolfgang (Kirchheim DEX), Filamentless magnetron-ion source and a process using it.
  23. Kadrnoschka, Werner; Lebeda, Anton; Killinger, Rainer; Mueller, Johann; Weis, Stefan, High frequency generator for ion and electron sources.
  24. Guha Subhendu (Troy MI) Banerjee Arindam (Madison Heights MI), Igniter for microwave energized plasma processing apparatus.
  25. Stowell, Michael W.; Campo, Manuel D., Index modified coating on polymer substrate.
  26. Ogura Satoshi,JPX ; Ooishi Shotaro,JPX ; Hashimoto Isao,JPX ; Ichimura Satoshi,JPX, Ion beam processing apparatus for processing work piece with ion beam being neutralized uniformly.
  27. Simmons,Rodney D.; Viatella,John W.; Hoffman,Jerzy R.; Webb,R. Kyle; Bykanov,Alexander N.; Khodykin,Oleh, LPP EUV drive laser input system.
  28. Partlo,William N.; Brown,Daniel J. W.; Fomenkov,Igor V.; Ershov,Alexander I.; Myers,David W., LPP EUV light source.
  29. Ershov, Alexander I.; Bykanov, Alexander N.; Khodykin, Oleh V.; Fomenkov, Igor V., LPP EUV light source drive laser system.
  30. Ershov,Alexander I.; Bykanov,Alexander N.; Khodykin,Oleh; Fomenkov,Igor V., LPP EUV light source drive laser system.
  31. Ershov,Alexander I.; Bykanov,Alexander N.; Khodykin,Oleh; Fomenkov,Igor V., LPP EUV light source drive laser system.
  32. Bykanov, Alexander N.; Algots, J. Martin; Khodykin, Oleh V.; Hemberg, Oscar; Bowering, Norbert R., LPP EUV plasma source material target delivery system.
  33. Bykanov,Alexander N.; Algots,J. Martin; Khodykin,Oleh; Hemberg,Oscar, LPP EUV plasma source material target delivery system.
  34. Ershov, Alexander I.; Partlo, William N.; Bowering, Norbert; Hansson, Bjorn, Laser produced plasma EUV light source.
  35. Hong, Sukwon; Tran, Toan; Mallick, Abhijit; Liang, Jingmei; Ingle, Nitin K., Low shrinkage dielectric films.
  36. Kato Yasuo (Zama JPX) Ono Tetsuo (Kokubunji JPX) Watanabe Yoshio (Tokyo JPX) Murayama Seiichi (Kokubunji JPX) Mikoshiba Shigeo (Tokyo JPX) Matsuno Hiromitsu (Hachioji JPX), Low-pressure mercury vapor discharge lamp.
  37. Kato Yasuo (Zama JPX) Ono Tetsuo (Kokubunji JPX) Watanabe Yoshio (Tokyo JPX) Murayama Seiichi (Kokubunji JPX) Mikoshiba Shigeo (Tokyo JPX) Matsuno Hiromitsu (Hachioji JPX), Low-pressure mercury vapor discharge lamp.
  38. Algots,J. Martin; Hemberg,Oscar; Chung,Tae H., Method and apparatus for EUV light source target material handling.
  39. Algots, J. Martin; Fomenkov, Igor V.; Ershov, Alexander I.; Partlo, William N.; Sandstrom, Richard L.; Hemberg, Oscar; Bykanov, Alexander N.; Cobb, Dennis W., Method and apparatus for EUV plasma source target delivery.
  40. Algots,J. Martin; Fomenkov,Igor V.; Ershov,Alexander I.; Partlo,William N.; Sandstrom,Richard L.; Hemberg,Oscar; Bykanov,Alexander N.; Cobb,Dennis W., Method and apparatus for EUV plasma source target delivery.
  41. Bykanov,Alexander N., Method and apparatus for EUV plasma source target delivery target material handling.
  42. Schriever, Guido; Rebhan, Ulrich, Method and apparatus for generating high output power gas discharge based source of extreme ultraviolet radiation and/or soft x-rays.
  43. Patten ; Jr. Donald O. (Sterling MA) Simpson Matthew A. (Sudbury MA) Windischmann Henry (Northboro MA) Heuser Michael S. (Foothill Ranch CA), Method for depositing a substance with temperature control.
  44. Shepard ; Jr. Cecil B. (Laguna Niguel CA) Heuser Michael S. (Foothill Ranch CA) Raney Daniel V. (Mission Viejo CA) Quirk William A. (Lake Forest CA) Bak-Boychuk Gregory (San Juan Capistrano CA), Method for depositing a substance with temperature control.
  45. Reinhard Donnie K. ; Chakraborty Rabindra N. ; Asmussen Jes ; Goldman Paul D., Method for radiofrequency wave etching.
  46. Asmussen Jes (Okemos MI), Method for treating a material using radiofrequency waves.
  47. Vladimir Mikhailovich Borisov RU; Oleg Borisovich Khristoforov RU, Method of producing short-wave radiation from a gas-discharge plasma and device for implementing it.
  48. Asmussen Jes (Okemos MI), Microwave apparatus.
  49. Spencer John E. (Plano TX) Borel Richard A. (Garland TX) Linxwiler Kenneth E. (McKinney TX) Hoff Andrew M. (State College PA), Microwave apparatus for generating plasma afterglows.
  50. Lewis David Andrew ; Whitehair Stanley Joseph, Microwave applicator having a mechanical means for tuning.
  51. Lewis David Andrew ; Whitehair Stanley Joseph ; Viehbeck Alfred ; Yonnone Martin ; Corso William V. ; Krieger Bernard, Microwave applicator having a mechanical means for tuning.
  52. Echizen Hiroshi,JPX ; Takaki Satoshi,JPX, Microwave chemical vapor deposition apparatus.
  53. Torii Yasuhiro (Kanagawa JPX) Matsuo Seitaro (Kanagawa JPX) Watanabe Iwao (Kanagawa JPX) Shimada Masaru (Kanagawa JPX), Microwave ion source.
  54. Kamarehi Mohammad ; Pingree Richard ; Shi Jianou ; Cox Gerald, Microwave plasma discharge device.
  55. Gaudreau Marcel P. J. (Lexington MA) Smith Donald K. (Arlington MA), Microwave plasma generator.
  56. Grotjohn, Timothy A.; Asmussen, Jes; Wijaya, Andy, Microwave stripline applicators.
  57. Jacquot Bernard (Saint Egreve FRX), Multicharged ion source with several electron cyclotron resonance zones.
  58. Katzschner Werner (Kleinkahl-Grosslaudenbach DEX) Eichholz Stefan (Kiel DEX) Geisler Michael (Wachtersbach DEX) Jung Michael (Kahl DEX), Particle source for a reactive ion beam etching or plasma deposition installation.
  59. Srivastava Aseem K. ; Pingree Richard E. ; Pellicier Victor, Plasma discharge device with dynamic tuning by a movable microwave trap.
  60. Partlo William N., Plasma focus high energy photon source.
  61. Partlo William Norman, Plasma focus high energy photon source.
  62. Melnychuk, Stephan T.; Partlo, William N.; Fomenkov, Igor V.; Ness, Richard M.; Birx late of, Daniel L.; Sandstrom, Richard L.; Rauch, John E., Plasma focus light source with active and buffer gas control.
  63. Partlo, William N.; Fomenkov, Igor V.; Oliver, I. Roger; Ness, Richard M.; Birx, Daniel L., Plasma focus light source with improved pulse power system.
  64. Birx Daniel, Plasma gun and methods for the use thereof.
  65. Birx Daniel, Plasma gun and methods for the use thereof.
  66. Daniels, Stephen; Lawler, Justin; Law, Victor John, Plasma system and measurement method.
  67. Nakanishi Shigeo (Berea OH) Calco Frank S. (Olmsted Falls OH) Scarpelli August R. (Litchfield OH), Precision tunable resonant microwave cavity.
  68. Asmussen, Jes; Grotjohn, Timothy A.; Reinhard, Donnie K.; Ramamurti, Rahul; Yaran, M. Kagan; Schuelke, Thomas; Becker, Michael; King, David, Process and apparatus for diamond synthesis.
  69. Asmussen, Jes; Grotjohn, Timothy; Reinhard, Donnie; Ramamurti, Rahul; Yaran, M. Kagan; Schuelke, Thomas; Becker, Michael; King, David, Process and apparatus for diamond synthesis.
  70. Gualandris Ren (Aix en Provence FRX) Ludwig Paul (Grenoble FRX) Rocco Jean-Claude (Claix FRX) Zadworny Francois (Corenc FRX), Process and apparatus for igniting an ultra-high frequency ion source.
  71. Higman,Kumiko I., Pseudo surface microwave produced plasma shielding system.
  72. Asmussen Jes (Okemos MI) Fritz Ronald E. (Haslett MI), Radiofrequency wave treatment of a material using a selected sequence of modes.
  73. Ogawa Toshiaki (Itami JPX) Fujiwara Nobuo (Itami JPX) Kawai Kenji (Itami JPX) Shibano Teruo (Itami JPX) Morita Hiroshi (Itami JPX) Nishioka Kyusaku (Itami JPX), Semiconductor wafer treating apparatus utilizing a plasma.
  74. Bykanov,Alexander N.; Khodykin,Oleh, Source material dispenser for EUV light source.
  75. Imai, Muneyuki; Toda, Satoshi, Substrate processing method.
  76. Bykanov,Alexander N.; Marx,William F., Systems and methods for cleaning a chamber window of an EUV light source.
  77. Rettig,Curtis L.; Hoffman,Jerzy R.; Vargas,Ernesto L., Systems and methods for deflecting plasma-generated ions to prevent the ions from reaching an internal component of an EUV light source.
  78. Ershov, Alexander I.; Marx, William F.; Bowering, Norbert; Hansson, Bjorn A. M.; Khodykin, Oleh; Fomenkov, Igor V., Systems and methods for reducing the influence of plasma-generated debris on the internal components of an EUV light source.
  79. Ershov,Alexander I.; Marx,William F., Systems and methods for reducing the influence of plasma-generated debris on the internal components of an EUV light source.
  80. Bowering,Norbert; Hansson,Bjorn A. M., Systems for protecting internal components of a EUV light source from plasma-generated debris.
  81. Bowering,Norbert R.; Hansson,Bjorn A. M.; Bykanov,Alexander N.; Khodykin,Oleh; Ershov,Alexander I.; Partlo,William N., Systems for protecting internal components of an EUV light source from plasma-generated debris.
  82. Ershov,Alexander I.; Partlo,William N., Systems for protecting internal components of an EUV light source from plasma-generated debris.
섹션별 컨텐츠 바로가기

AI-Helper ※ AI-Helper는 오픈소스 모델을 사용합니다.

AI-Helper 아이콘
AI-Helper
안녕하세요, AI-Helper입니다. 좌측 "선택된 텍스트"에서 텍스트를 선택하여 요약, 번역, 용어설명을 실행하세요.
※ AI-Helper는 부적절한 답변을 할 수 있습니다.

선택된 텍스트

맨위로