초록

Apparatus for registering and imagewise exposing to actinic radiation a sequence of similar sheet substrates employing liquid applicator means to allow a photomask to contact a photosensitive layer on the substrate through a liquid.

대표청구항 ▼

A substrate exposure apparatus comprising: a framework: means for registering a photomask with respect to substrate with a photosensitive layer; optional means for displacing the registered substrate and photomask with respect to the framework to an exposure position; means for exposing the photosen

A substrate exposure apparatus comprising: a framework: means for registering a photomask with respect to substrate with a photosensitive layer; optional means for displacing the registered substrate and photomask with respect to the framework to an exposure position; means for exposing the photosensitive substrate; a laminator means for laminating the photomask to the surface of the substrate with the photosensitive layer optionally as the substrate and the photomask are displaced to the exposure position including means for applying pressure to the substrate with a photosensitive layer and the photomask to allow contact through a liquid layer; means for applying relative movement between (a) the substrate with the photosensitive layer and the photomask and (b) means for applying pressure; and an applicator for applying a liquid positioned adjacent at least one of the surfaces of the photosensitive layer and the photomask whereby an excess of liquid can be obtained at a nip where the photosensitive layer and photomask contact one another through the liquid.