초록

Actinic radiation exposes photohardenable material in two steps whereby photohardenable material not present as a solid is exposed through a photomask prior to application to a substrate and in a second step is reexposed through the photomask after application of the material to the substrate.

대표청구항 ▼

A process of applying to a substrate and exposing a photohardenable material to obtain discrete areas of photohardened material on the substrate comprising the steps of: (a) applying to a flexible photomask a photohardenable material which is deformable and which is not present as a solid with said

A process of applying to a substrate and exposing a photohardenable material to obtain discrete areas of photohardened material on the substrate comprising the steps of: (a) applying to a flexible photomask a photohardenable material which is deformable and which is not present as a solid with said material applied in excess compared to the amount necessary to form a layer in step (c); (b) exposing a portion of the photohardenable material to actinic radiation through the photomask whereby the surface of the photohardenable material which faces away from the photomask remains deformable; (c) applying exposed and unexposed material with the photomask to a substrate to form a layer whereby the surface of photohardenable material which remains deformable faces the substrate by applying pressure to the flexible photomask and advancing the pressure to remove excess photohardenable material between the photomask and substrate to form a registered preimaged laminate; and (d) reexposing the layer containing photohardenable material to actinic radiation through the photomask whereby bonded discrete areas of photohardened material are obtained on the substrate. The process of claim 1 wherein after step (d), the photomask is removed from the surface of the exposed photohardenable material and developer is applied to the surface of the photohardened material whereby unexposed unhardened discrete areas are removed.